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1. 发明申请

WO2013018978A8 PHOTOACTIVE COMPOUND AND A LIGHT-SENSITIVE RESIN COMPOSITION COMPRISING SAME 审中-公开
标题翻译：光敏化合物和包含该化合物的光敏树脂组合物
公开(公告)号：WO2013018978A8
公开(公告)日：2013-10-24
申请号：PCT/KR2012003766
申请日：2012-05-14
申请人： LG CHEMICAL LTD , CHO CHANGHO , CHUNG WON JIN , KHARBASH RAISA , KIM SUNGHYUN , CHOI DONGCHANG , LEE SANG CHUL , KIM HAN SOO , HEO YOON HEE , KIM SUNHWA
发明人： CHO CHANGHO , CHUNG WON JIN , KHARBASH RAISA , KIM SUNGHYUN , CHOI DONGCHANG , LEE SANG CHUL , KIM HAN SOO , HEO YOON HEE , KIM SUNHWA
IPC分类号： G03F7/004 , G03F7/027
CPC分类号： G03F7/0045 , G03F7/0007 , G03F7/029 , G03F7/032 , G03F7/033 , G03F7/0388
摘要： The present invention relates to a photoactive compound having a novel structure and to a light-sensitive resin composition comprising same. The photoactive compound according to the present invention not only has outstanding sensitivity because of effective absorption with respect to a UV light source due to the inclusion of a nitro group and phosphonate structure, but also has outstanding residual film thickness, mechanical strength, heat resistance, chemical resistance and development resistance due to improved solubility of the light-sensitive resin composition because of outstanding compatibility of the phosphonate structure and a binder resin. Consequently, the light-sensitive resin composition of the present invention is not only advantageous in the curing of liquid-crystal-display column spacers, overcoats, passivation materials and the like but is also advantageous in terms of high-temperature processing characteristics as well.
摘要翻译：本发明涉及具有新结构的光活性化合物，并涉及包含其的光敏树脂组合物。本发明的光活性化合物不仅具有优异的灵敏度，因为由于包含硝基和膦酸酯结构而对紫外光源有效吸收，而且具有优异的残余膜厚度，机械强度，耐热性，耐化学性和耐显影性，这是因为膦酸酯结构和粘合剂树脂具有优异的相容性，因此提高了光敏树脂组合物的溶解性。因此，本发明的光敏树脂组合物不仅有利于液晶显示器柱状间隔件，外涂层，钝化材料等的固化，而且在高温处理特性方面也是有利的。

2. 发明申请

WO2012144798A3 POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME 审中-公开
标题翻译：聚合物和含有相同的光敏树脂组合物
公开(公告)号：WO2012144798A3
公开(公告)日：2013-01-10
申请号：PCT/KR2012002955
申请日：2012-04-18
申请人： LG CHEMICAL LTD , KIM SUNHWA , JI HO CHAN , CHOI DONGCHANG , KIM HAN SOO , HEO YOON HEE , CHO CHANGHO , CHUNG WON JIN
发明人： KIM SUNHWA , JI HO CHAN , CHOI DONGCHANG , KIM HAN SOO , HEO YOON HEE , CHO CHANGHO , CHUNG WON JIN
IPC分类号： C08F20/06 , C08F20/10 , C08F22/04 , C08L33/04 , G03F7/027
CPC分类号： G03F7/0007 , C08F220/06 , C08F220/18 , C08F222/40 , C08F2220/1833 , G03F7/033
摘要： The present invention relates to a polymer having a novel structure and photosensitive resin compositions containing the same. The photosensitive resin compositions containing the polymer according to the present invention are characterized with high taper angle and excellent adhesive strength. Thus, the photosensitive resin compositions containing the polymer according to the present invention can be applied to a variety of photosensitive materials, and especially applied preferably for manufacturing color filter patterns for LCD's.
摘要翻译：本发明涉及具有新颖结构的聚合物和含有该聚合物的感光性树脂组合物。含有根据本发明的聚合物的感光性树脂组合物的特征在于具有高锥角和优异的粘合强度。因此，含有根据本发明的聚合物的感光性树脂组合物可以应用于各种感光材料，特别优选用于制造LCD的滤色器图案。

3. 发明申请

WO2012099366A3 PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE MATERIAL COMPRISING SAME 审中-公开
标题翻译：光敏树脂组合物，以及包含该组合物的光敏材料
公开(公告)号：WO2012099366A3
公开(公告)日：2012-12-06
申请号：PCT/KR2012000364
申请日：2012-01-16
申请人： LG CHEMICAL LTD , JI HO CHAN , KIM SUNGHYUN , CHOI DONGCHANG , CHOI KYUNG SOO , CHA GEUN YOUNG , LEE SANG CHUL
发明人： JI HO CHAN , KIM SUNGHYUN , CHOI DONGCHANG , CHOI KYUNG SOO , CHA GEUN YOUNG , LEE SANG CHUL
IPC分类号： G03F7/027 , G03F7/00 , G03F7/004
CPC分类号： G03F7/0007 , G03F7/0048 , G03F7/027 , G03F7/032
摘要： The present invention relates to a photosensitive resin composition and to a photosensitive material comprising same. The photosensitive resin composition according to the present invention may comprise two types of polyfunctional monomers with different compositional ratios, in which the side chains of the monomers have different structures and respectively contain an unsaturated double bond. The photosensitive resin composition according to the present invention has superior processability and improves adhesion to a lower substrate after a hard-baking process, thus reducing defects caused by a burst during the sealing of an LCD substrate as well as substrate-separation defects caused by an impact applied to a completed LCD product.
摘要翻译：本发明涉及一种光敏树脂组合物和包含其的光敏材料。根据本发明的光敏树脂组合物可以包含具有不同组成比的两种类型的多官能单体，其中单体的侧链具有不同的结构并且分别含有不饱和双键。根据本发明的光敏树脂组合物具有优异的可加工性，并改善了在硬烘烤处理后对下基板的附着力，因此减少了在LCD基板的密封过程中由于爆裂而导致的缺陷以及由冲击适用于完整的LCD产品。

4. 发明申请

WO2012121534A3 APPARATUS AND METHOD FOR MANUFACTURING AT LEAST TWO PATTERNED SUBSTRATES 审中-公开
标题翻译：用于制造至少两个图案的基板的装置和方法
公开(公告)号：WO2012121534A3
公开(公告)日：2012-11-01
申请号：PCT/KR2012001629
申请日：2012-03-06
申请人： LG CHEMICAL LTD , KIM DAE HYUN , CHOI DONGCHANG , LEE SEUNG HEON , PARK MIHEE , LEE U RA , LEE WONJOO
发明人： KIM DAE HYUN , CHOI DONGCHANG , LEE SEUNG HEON , PARK MIHEE , LEE U RA , LEE WONJOO
IPC分类号： G06F3/041 , B41F13/187 , B41M5/00
CPC分类号： B41M1/00 , B41F3/36 , B41F13/187 , B41F17/26 , G06F2203/04103
摘要： The present invention relates to a method for manufacturing at least two patterned substrates, which has a simplified process and superior efficiency and an apparatus for manufacturing at least two patterned substrates. The method for manufacturing the at least two patterned substrates includes: a step of placing at least two substrates on one substrate stage; a step of placing a printing plate, including at least two engraved pattern units corresponding to a pattern unit to be formed on one substrate, on a printing plate stage; a step of applying ink on a printing roll; a step of contacting the printing roll, on which the ink is applied, on the printing plate to form at least two pattern units on the printing roll; and a step of respectively transferring the at least two pattern units disposed on the printing roll onto at least two printed substrates through one process. The apparatus for manufacturing the at least two patterned substrates includes: a printer; a coater for applying ink on a printing roll; a printing plate including at least two engraved pattern units corresponding to a pattern unit to be formed on one printed substrate, a state for supporting the printing plate; and a stage for supporting at least two printed substrates.
摘要翻译：本发明涉及一种用于制造至少两个图案化衬底的方法，其具有简化的工艺和优异的效率，以及用于制造至少两个图案化衬底的装置。用于制造所述至少两个图案化衬底的方法包括：将至少两个衬底放置在一个衬底台上的步骤; 在印版台上放置包括对应于待形成的图案单元的至少两个雕刻图案单元的印版的步骤; 在印刷辊上涂上油墨的步骤; 使印刷辊上印刷有油墨的印刷辊在印刷板上接触以在印刷辊上形成至少两个图案单元的步骤; 以及通过一个处理将设置在所述印刷辊上的所述至少两个图案单元分别转印到至少两个印刷基板上的步骤。用于制造至少两个图案化基板的装置包括：打印机; 用于在印刷辊上涂布油墨的涂布机; 印刷版，其包括至少两个雕刻图案单元，对应于要形成在一个印刷基板上的图案单元，支撑印刷版的状态; 以及用于支撑至少两个印刷基板的台。

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