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1. 发明申请

WO2011025180A2 A PHOTORESIST STRIPPING COMPOSITION FOR MANUFACTURING LCD 审中-公开
标题翻译：用于制造LCD的光刻胶剥离组合物
公开(公告)号：WO2011025180A2
公开(公告)日：2011-03-03
申请号：PCT/KR2010/005494
申请日：2010-08-19
申请人： LTC CO., LTD. , CHOI, Ho Sung
发明人： CHOI, Ho Sung
IPC分类号： G03F7/42
CPC分类号： G03F7/422 , C11D11/0047 , G03F7/425
摘要： The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
摘要翻译：本发明涉及用于制造LCD的所有方法的光致抗蚀剂剥离组合物，更具体地涉及水基联合光致抗蚀剂剥离组合物，作为包含叔链烷醇胺，水和有机溶剂。根据本发明的组合物防止了在制造LCD的过程中Al和Cu金属布线的腐蚀，具有良好的去除光刻胶的能力，并且适用于所有Al工艺，Cu工艺，有机薄膜工艺和COA工艺。

2. 发明申请

WO2007074990A1 COMPOSITION FOR REMOVING POLYMER RESIDUE OF PHOTOSENSITIVE ETCHING-RESISTANT LAYER 审中-公开
标题翻译：用于去除光致抗蚀层的聚合物残留物的组合物
公开(公告)号：WO2007074990A1
公开(公告)日：2007-07-05
申请号：PCT/KR2006/005563
申请日：2006-12-19
申请人： LIQUID TECHNOLOGY CO., LTD. , CHOI, Ho Sung , KIM, Deok Ho
发明人： CHOI, Ho Sung , KIM, Deok Ho
IPC分类号： G03F7/32
CPC分类号： G03F7/425
摘要： Provided is a composition for removing polymer residue of a photosensitive etching-resistant layer. The composition includes 0.1 to 80 % by weight of a corrosion inhibitor shown in Formula 1 ; 10 to 80 % by weight of a pH control agent of which hydrogen ion concentration is in a weak basic range; 0.1 to 2 % by weight of ammonium fluoride; and the remaining percentage by weight of water. The composition for removing the polymer residue can effectively remove insoluble residue generated during a semiconductor fabrication process without inflicting damage on an underlying layer and contains environment-friendly components.
摘要翻译：提供了用于除去感光性耐蚀层的聚合物残渣的组合物。该组合物包含0.1至80重量％的式1所示的缓蚀剂; 10〜80重量％的氢离子浓度处于弱碱性范围的pH控制剂; 0.1〜2重量％的氟化铵; 和剩余的重量百分比的水。用于除去聚合物残余物的组合物可以有效地去除半导体制造过程中产生的不溶性残留物，而不会对下层产生损害，并含有环境友好的组分。

3. 发明申请

WO2014148826A8 APPARATUS FOR CULTIVATING MUSHROOMS 审中-公开
标题翻译：用于培养肌肉的装置
公开(公告)号：WO2014148826A8
公开(公告)日：2014-12-24
申请号：PCT/KR2014002324
申请日：2014-03-20
申请人： CHOI HO SUNG
发明人： CHOI HO SUNG
IPC分类号： A01G1/04 , A01G1/00 , A01G7/06
CPC分类号： A01G1/042 , A01G9/00
摘要： The present invention relates to an apparatus which is installed in an indoor living space such as a home or an office to cultivate mushrooms and, more specifically, to an apparatus for cultivating mushrooms capable of reducing energy consumption, cultivating various species of mushrooms, being utilized for study or ornament, and improving mushroom growing efficiency, by comprising: a housing forming an external appearance; a mushroom medium located inside the housing; and a humidifier for receiving water, vaporizing the water, and supplying generated steam into the housing, thereby controlling the humidity inside the housing.
摘要翻译：本发明涉及一种安装在诸如家庭或办公室的室内生活空间中以培育蘑菇的装置，更具体地，涉及一种用于培养能够降低能量消耗的蘑菇的设备，培养各种蘑菇，被利用用于研究或装饰，并且通过包括形成外观的外壳来改善蘑菇生长效率。位于壳体内的蘑菇介质; 以及加湿器，用于接收水分，蒸发水，并将生成的蒸汽供应到壳体中，由此控制壳体内的湿度。

4. 发明申请

WO2011025180A3 A PHOTORESIST STRIPPING COMPOSITION FOR MANUFACTURING LCD 审中-公开
标题翻译：一种用于制造LCD的光电离子组合物
公开(公告)号：WO2011025180A3
公开(公告)日：2011-07-07
申请号：PCT/KR2010005494
申请日：2010-08-19
申请人： LTC CO LTD , CHOI HO SUNG
发明人： CHOI HO SUNG
IPC分类号： G03F7/42
CPC分类号： G03F7/422 , C11D11/0047 , G03F7/425
摘要： The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
摘要翻译：本发明涉及用于制造LCD的所有工艺的光致抗蚀剂剥离组合物，更具体地说，涉及一种水性合成光致抗蚀剂剥离组合物，作为包含叔烷醇胺，水和有机溶剂的弱碱性复合材料。根据本发明的组合物防止在制造LCD的过程中Al和Cu金属布线的腐蚀，具有良好的除去光致抗蚀剂的能力，并且适用于所有Al工艺，Cu工艺，有机膜工艺和COA工艺。

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