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    • 2. 发明申请
    • PROCESS FOR PRODUCING NICKEL-PLATED MOULDINGS
    • 制造镀镍模具的工艺
    • WO1993015241A1
    • 1993-08-05
    • PCT/EP1993000063
    • 1993-01-14
    • BASF AKTIENGESELLSCHAFTSCHWENDEMANN, VolkerGLASER, KlausTSCHANG, Chung-JiBURKHART, BerndOFTRING, AlfredDUNG, Bernhard
    • BASF AKTIENGESELLSCHAFT
    • C25D03/16
    • C25D3/14
    • Production of nickel-plated mouldings by the galvanic separation of nickel from aqueous-acidic baths containing as the essential components one or more nickel salts, one or more inorganic acids and at least two brighteners, in that the brightener consists of amixture of: A) 2 to 98 % wt. of one or more cyclic N-allyl or N-vinyl ammonium compounds (I) in which the N-atom is a component of a pyridine, quinoline or isoquinoline ring system which can also carry one or two C1 to C4-alkyl substituents or halogen atoms, R , R and R are hydrogen or C1 to C4-alkyl, R is hydrogen or methyl, m is a number from 0 to 4, n is a number from 1 to 4 and X is an n-valent inorganic or organic anion which promotes solubility in water; and B) 98 to 2 % wt. of one or more acetylenically unsaturated compounds (II): R -C=C-R in which the radicals R and R are the same or different and are hydroxyl, sulpho, amino, C1 to C4-alkylamino or di(C1 to C4-alkyl)amino-substitued C1 to C4-alkyl, in which hydroxyl groups can be caused to react with 1 to 10 mol of a C1 to C4-alkylene oxide or a mixture of such alkylene oxides and one of the radicals R or R may also be hydrogen or C1 to C4-alkyl.
    • 通过从含有一种或多种镍盐,一种或多种无机酸和至少两种增白剂的主要组分的酸性水浴中电镀镍来制备镀镍模制品,其中增白剂由以下混合物组成:A) 2〜98重量% 的一种或多种环状N-烯丙基或N-乙烯基铵化合物(I),其中N-原子是吡啶,喹啉或异喹啉环系的组分,其还可以携带一个或两个C1-C4烷基取代基或卤素 原子,R 1,R 3和R 4为氢或C 1至C 4烷基,R 2为氢或甲基,m为0至4的数,n为1至 4和X - 是促进在水中溶解度的n价无机或有机阴离子; 和B)98〜2重量% 的一种或多种炔属不饱和化合物(II):R 4 -C = CR 5,其中基团R 4和R 5相同或不同,为羟基,磺基,氨基,C 1至 C 1 -C 4 - 烷基氨基或二(C 1至C 4 - 烷基)氨基取代的C 1至C 4 - 烷基,其中可使羟基与1至10摩尔的C1至C4-烯化氧或这些烯化氧的混合物 基团R 4或R 5之一也可以是氢或C 1至C 4烷基。
    • 4. 发明申请
    • USE OF THIOUREA SALTS AS BRIGHTENERS FOR AQUEOUS-ACID GALVANIC NICKEL BATHS
    • USE硫脲盐的ALS增白剂用于水性-ACID GALVANIC镍BATHS
    • WO1994013862A1
    • 1994-06-23
    • PCT/EP1993003383
    • 1993-12-02
    • BASF AKTIENGESELLSCHAFTBURKHART, BerndOFTRING, AlfredSCHWENDEMANN, VolkerSCHROEDER, UlrichGLASER, Klaus
    • BASF AKTIENGESELLSCHAFT
    • C25D03/12
    • C07C335/32C25D3/12
    • Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R to R stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y stands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R , -CO-OH, -CO-OR , -CO-NR R , -CO-CH2-CO-OR , -O-CO-H, -O-CO-R , -NR -CO-R , -NR -CO-R , -OR , -SO2-R , -SO2-OH, -SO2-OR , -PO(PH)2, -PO(OH)(OR ), -PO(OR )2, OPO(OH)2, -OPO(PH)(PR ) or -OPO(OR )2 in which R stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R and R stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X stands for a water solubility-promoting, n-valent inorganic or organic anion.
    • 6. 发明申请
    • FILTER UNIT FILTER DEVICE AND FILTRATION PROCESS FOR FLUIDS
    • 过滤装置,过滤装置和用于流体的过滤过程
    • WO2006089944A2
    • 2006-08-31
    • PCT/EP2006060252
    • 2006-02-24
    • MANN & HUMMEL GMBHTHALMANN CHRISTIANRODEWALDT THOMASBURKHART BERND
    • THALMANN CHRISTIANRODEWALDT THOMASBURKHART BERND
    • B01D25/001B01D25/26
    • The invention relates to filter units (10) and a filter device for the purification of a fluid, in particular, process fluids such as required for machining process methods. The filter units (10) comprise a frame (11) and a filter medium (16). The frame (11) has support webs (12), which reinforce the frame (11) and support the filter medium (16). Said support webs (12) are arranged on the downstream side (18) of the filter medium (16), to prevent a choking on the upstream side (17) and permit a simple removal of the filter cake. The filter units (10) are stacked on each other such that the upstream sides (17) of the individual filter units (10) face each other. The same is true for the downstream sides (18) of the filter units (10). Unpurified and purified throughflow nozzles (13), (14) are formed through the frame (11) through which the fluid for purification or the purified fluid can flow.
    • 本发明涉及过滤器单元(10)和用于清洁流体特别是过程流体的过滤器装置,如在机加工过程中所要求的那样。 为此目的,过滤单元(10)具有框架(11)和过滤介质(16)。 框架(11)具有支撑腹板(12),其一方面加强框架(11)并且另一方面支撑过滤介质(16)。 这些支撑腹板12布置在过滤介质16的流出侧18上,从而防止了流入侧17的堵塞,并且使得滤饼的简单分离成为可能。 此外,过滤单元(10)彼此堆叠,使得各个过滤单元(10)的流入侧(17)彼此面对。 这同样适用于过滤器单元(10)的流出侧(18)。 通过框架(11)的原始或纯净的通过管(13),形成(14),待清洁的流体或纯净的流体可通过其流动。
    • 10. 发明申请
    • METHOD OF PRODUCING MIXTURES OF LOW-FOAMING NON-IONIC SURFACTANTS WITH AN ACETAL STRUCTURE
    • 用于生产混合工低发泡非离子与乙缩醛的表面活性剂
    • WO1995013260A1
    • 1995-05-18
    • PCT/EP1994003631
    • 1994-11-04
    • BASF AKTIENGESELLSCHAFTWOLF, GerhardBURKHART, BerndOFTRING, Alfred
    • BASF AKTIENGESELLSCHAFT
    • C07C43/315
    • C11D3/0026B01F17/0028C07C41/54C07C43/315C08G65/34C08L71/02C11D1/721C11D1/825C11D1/8255C08L2666/14
    • The invention concerns the production of mixtures of low-foaming non-ionic surfactants with an acetal structure, the mixtures containing: A) 70 to 99 % by wt. of one or more unsymmetrical acetals (I) in which R is a C1-C30 alkyl group, a C3-C30 alkenyl group or a C7-C30 aralkyl or alkaryl group, R is a C1-C10 alkyl group, A is a 1,2-alkylene group with 2 to 4 C-atoms and x can take values from 1 to 50; and B) 1 to 30 % by wt. of one or more symmetrical acetals (II) in which R , A and x are as defined above, by reacting alkoxylates (III) R -(OA)x-OH with vinyl ethers (IV) H2C=CH-O-R in the presence of protonic acids or Lewis acids as catalysts, the reaction being carried out in the presence of one or more acetaldehyde dialkylacetals (V), in which R is a C1-C10 alkyl group and R and R may be the same or different, in an amount corresponding to 0.1 to 20 moles of the compounds of formula (V) per mole of the compounds of formula (III) or in the presence of protonic acids as catalysts, the catalysts used being organic acids with a pKs-value of 1 to 7 for the first dissociation stage of the acids in water.
    • 的低发泡-具有缩醛结构的非离子表面活性剂,含有A)70至99重量的一个或多个不对称缩醛(I),%混合物的制备,其中R <1> C1至C30烷基,C3至C30链烯基或 C7-C30芳烷基或烷芳基为R <2>表示C1〜C10烷基,a表示具有2至4个碳原子和x可以假设值从1〜50的1,2-亚烷基, 和B)1〜30重量的一个或多个对称的缩醛(II),其中%变量R <1>,A和X具有上述含义,由烷氧基化物(III)R <1>反应 - (OA )X-OH(与乙烯基醚IV)H2C = CH-或<2>中的质子酸或路易斯酸作为催化剂的存在下,通过在一个或多个乙醛二烷基缩醛(V),其中R <3>一个的存在下的反应 C1至C10烷基,和R表示可以具有<2>和R <3>相同或不同的含义,在所述化合物的0.1〜20摩尔的量( V)(每III摩尔)进行,或者在质子酸作为催化剂的存在下,通过使用作为具有催化剂的1的pKa,以7的基础上,氨基酸水中的第一解离,使用有机酸。