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1. 发明申请

WO2004107042A1 METHOD FOR EVALUATING THE EFFECTS OF MULTIPLE EXPOSURE PROCESSES IN LITHOGRAPHY 审中-公开
标题翻译：评估多次曝光过程影响的方法
公开(公告)号：WO2004107042A1
公开(公告)日：2004-12-09
申请号：PCT/US2004/015693
申请日：2004-05-19
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , FONSECA, Carlos, A. , BUKOFSKY, Scott, J. , LAI, Kafai
发明人： FONSECA, Carlos, A. , BUKOFSKY, Scott, J. , LAI, Kafai
IPC分类号： G03C5/00
CPC分类号： G03F7/705 , G03F7/70466 , G03F7/70625 , G03F7/70641
摘要： A method of evaluating process effects of multiple exposure photolithographic processes by first determining a set of expected images for each exposure step or process of the multiple exposure process individually (SET1, SET2) and then obtaining a composite set of images (FINALSET) by sequentially perturbing images from a first or previous exposure step (SET1) by weighted images from the subsequent exposure step (SET2). Preferably, the expected images are determined by simulation in the form of normalized aerial images over a range of defocus for each exposure step, and the weighting factor used is the dose-ratio of the subsequent exposure dose to the prior step exposure dose. The resulting composite set of images may be used to evaluate multiple exposure processes, for example, to provide an estimate of yield for a given budget of dose and focus errors, or alternatively, to provide specifications for tool error budgets required to obtain a target yield.
摘要翻译：一种评估多次曝光光刻处理的处理效果的方法，首先通过单独确定每个曝光步骤或多次曝光处理（SET1，SET2）的每个曝光步骤或处理来确定一组预期图像，然后通过依次扰动获得一组复合图像（FINALSET）来自后续曝光步骤（SET2）的加权图像来自第一或以前的曝光步骤（SET1）的图像。优选地，通过在每个曝光步骤的散焦范围上的归一化空间图像的形式的模拟来确定预期图像，并且所使用的加权因子是随后的曝光剂量与先前阶段曝光剂量的剂量比。所得到的复合图像集合可以用于评估多个曝光过程，例如，为给定的剂量和焦点误差预算提供产量的估计，或者提供用于获得目标产量所需的工具误差预算的规格。

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