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    • 9. 发明申请
    • III-NITRIDE FIELD-EFFECT TRANSISTOR WITH DUAL GATES
    • 具有双栅极的III-氮化物场效应晶体管
    • WO2017087197A1
    • 2017-05-26
    • PCT/US2016/060863
    • 2016-11-07
    • HRL LABORATORIES, LLC
    • CHU, Rongming
    • H01L29/78H01L29/423H01L29/10
    • H01L29/2003H01L29/4236H01L29/66522H01L29/7831
    • A field effect transistor (FET) includes a III-nitride channel layer, a III-nitride barrier layer on the channel layer, a first dielectric on the barrier layer, a first gate trench extending through the first dielectric, and partially or entirely through the barrier layer, a second dielectric on a bottom and walls of the first gate trench, a source electrode on a first side of the first gate trench, a drain electrode on a second side of the first gate trench opposite the first side, a first gate electrode on the second dielectric and filling the first gate trench, a third dielectric between the first gate trench and the drain electrode, a second gate trench extending through the third dielectric and laterally located between the first gate trench and the drain electrode, and a second gate electrode filling the second gate trench.
    • 场效应晶体管(FET)包括III族氮化物沟道层,沟道层上的III族氮化物势垒层,势垒层上的第一电介质,延伸穿过第一栅极沟槽的第一栅极沟槽 并且部分地或完全地穿过所述阻挡层,在所述第一栅极沟槽的底部和壁上的第二电介质,在所述第一栅极沟槽的第一侧上的源极电极,在所述第一栅极沟槽的第二侧上的漏极电极 与所述第一侧相对,在所述第二电介质上并且填充所述第一栅极沟槽的第一栅电极,在所述第一栅极沟槽和所述漏极电极之间的第三电介质,延伸穿过所述第三电介质并且横向地位于所述第一栅极沟槽 和漏电极,以及填充第二栅极沟槽的第二栅电极。