会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 61. 发明申请
    • SPRAY NOZZLE WITH IMPROVED ASYMMETRICAL FLUID DISCHARGE DISTRIBUTION
    • 喷雾喷嘴与改进的非对称流体排放分配
    • WO01054821A2
    • 2001-08-02
    • PCT/US2001/002516
    • 2001-01-25
    • B05B1/02B05B1/04B05B13/06B05B
    • B05B13/069B05B1/04B05B13/0627Y10T137/9682
    • A spray nozzle (10) for producing an asymmetrically distributed fluid discharge pattern such as for use in a container coating application is provided. The spray nozzles includes a body portion having an internal fluid passageway which terminates in a substantially hemispherical dome shaped end wall (42). A discharge orifice (36) is provided in the end wall which is produced by superimposing on each other an approximately round opening and an elongated opening having opposed rounded ends. The elongated opening having a length greater than a diameter of the round opening and the round opening and the elongated opening defining respective edges of the discharge orifice which extend at different angles relative to a longitudinal axis (18) of the fluid passageway. The resulting orifice produces a fluid discharge pattern wherein the amount of fluid discharged tapers in a continuous, non-linear manner from the location of maximum discharge to points of minimum flow at either end of the discharge pattern.
    • 提供了一种用于产生不对称分布的流体排放图案的喷嘴(10),例如用于容器涂布应用中。 喷嘴包括具有内部流体通道的主体部分,该内部流体通道终止于基本上半球状的圆顶形端壁(42)。 排出孔(36)设置在端壁中,该端壁通过彼此重叠而形成大致圆形的开口和具有相对的圆形端部的细长开口。 所述细长开口的长度大于所述圆形开口的直径,并且所述圆形开口和所述细长开口限定所述排放孔的相应边缘,其相对于所述流体通道的纵向轴线(18)以不同的角度延伸。 所产生的孔口产生流体排放图案,其中排出的流体量以连续的非线性方式从放电图案的任一端处的最大排放位置到最小流量点逐渐变细。
    • 62. 发明申请
    • SPRAY TECHNOLOGY IMPROVEMENT
    • 喷雾技术改进
    • WO01032317A1
    • 2001-05-10
    • PCT/GB2000/004252
    • 2000-11-06
    • B05B1/00B05B1/02B05B1/04B05B15/02
    • B05B1/00B05B1/02B05B1/04B05B15/525
    • A spray nozzle having a spray orifice (16) formed by meeting surfaces (10, 12) of at least first (6) and second (8) members, the meeting surfaces (10, 12) of the members being so shaped that the shape of the orifice (16) formed by their meeting is substantially constant despite any misalignment of the members (6, 8) during their mutual approach. Such a nozzle is particularly applicable to self-cleaning spray nozzles in which the members (6, 8) temporarily come together, but is applicable to embodiments in which the members are adhered to one another.
    • 一种喷嘴,其具有通过与至少第一(6)和第二(8)构件的表面(10,12)相遇而形成的喷射孔(16),所述构件的会合表面(10,12)被成形为使得形状 尽管在它们相互接近的过程中构件(6,8)发生任何未对准,但通过它们的会合而形成的孔口(16)基本上是恒定的。 这种喷嘴特别适用于其中构件(6,8)临时聚集在一起的自清洁喷嘴,但是可应用于构件彼此粘合的实施例。
    • 63. 发明申请
    • SPIN, RINSE, AND DRY STATION WITH ADJUSTABLE NOZZLE ASSEMBLY FOR SEMICONDUCTOR WAFER BACKSIDE RINSING
    • 旋转,冲洗和干燥站,可调节喷嘴组件,用于半导体波背面冲洗
    • WO01003165A1
    • 2001-01-11
    • PCT/US2000/017923
    • 2000-06-28
    • B05B1/02B05C11/08B05C11/10H01L21/00H01L21/304
    • H01L21/67051H01L21/67028Y10S134/902
    • A nozzle assembly (116) includes a connector tube (128) having a first end and a second end. An outer surface of the connector tube (128) is threaded. A first cap (132a) having an opening therethrough is threaded onto the first end of the connector tube (128). A second cap (132b) having an opening therethrough is threaded onto the second end of the connector tube (128). Each of the first and second caps has a top surface and a threaded inner surface. The nozzle assembly further includes a nozzle (134) having a tubular portion (134b) defining a channel (134a). The tubular portion (134b) is disposed in the opening of the first connector cap (132a) so that a position of the nozzle (134) can be axially and rotationally adjusted. A spin, rinse, and dry station including the adjustable nozzle assembly and a method for spin rinsing the bottom side, i.e., the backside, of a semiconductor wafer also are described.
    • 喷嘴组件(116)包括具有第一端和第二端的连接管(128)。 连接管(128)的外表面是螺纹的。 具有穿过其中的开口的第一盖(132a)被拧到连接管(128)的第一端上。 具有穿过其中的开口的第二盖(132b)被拧到连接管(128)的第二端上。 第一和第二盖中的每一个具有顶表面和螺纹内表面。 喷嘴组件还包括具有限定通道(134a)的管状部分(134b)的喷嘴(134)。 管状部分(134b)设置在第一连接器帽(132a)的开口中,使得喷嘴(134)的位置可以轴向和旋转地调节。 还描述了包括可调喷嘴组件的旋转,冲洗和干燥站以及用于旋转冲洗半导体晶片的底侧,即背面的方法。
    • 64. 发明申请
    • METHOD FOR VALIDATING PRE-PROCESS ADJUSTMENTS TO A WAFER CLEANING SYSTEM
    • 用于将预处理调整用于清洗系统的方法
    • WO01003164A1
    • 2001-01-11
    • PCT/US2000/017901
    • 2000-06-28
    • B05B1/02B05C11/08B05C11/10H01L21/00H01L21/304H01L21/66
    • H01L21/67051H01L21/67028
    • A method for validating pre-process adjustments to a wafer cleaning system includes the operations of: (a) making pre-process adjustments to a wafer cleaning system (200), (b) loading a substantially transparent wafer into the wafer cleaning system (202), and (c) observing the substantially transparent wafer as the substantially transparent wafer moves along a wafer transfer path in the wafer cleaning system (204). In the event undesirable contact between the substantially transparent wafer and components of the wafer cleaning system is observed (206), the method further includes (d) making adjustments to the wafer cleaning system formulated to avoid undesirable contact between semiconductor wafers to be processed and components of the wafer cleaning system (208), and (e) repeating operations (b) through (d) until the substantially transparent wafer moves along the wafer transfer path without undesirable contact with components of the wafer cleaning system. The method also may include observing the substantially transparent wafer to confirm that liquid sprayed from below the wafer during rinsing operations properly contacts the bottom side of the wafer.
    • 一种用于验证晶片清洁系统的预处理调整的方法包括以下操作:(a)对晶片清洁系统(200)进行预处理调整,(b)将基本上透明的晶片加载到晶片清洁系统(202) ),以及(c)当基本上透明的晶片沿着晶片清洁系统(204)中的晶片传送路径移动时,观察基本上透明的晶片。 在观察到基本上透明的晶片和晶片清洁系统的部件之间的不期望的接触的情况下(206),该方法还包括(d)调整晶片清洁系统,以便避免要处理的半导体晶片与部件之间的不期望的接触 的晶片清洁系统(208),和(e)重复操作(b)至(d),直到基本透明的晶片沿着晶片传送路径移动,而不会与晶片清洁系统的部件不期望地接触。 该方法还可以包括观察基本透明的晶片以确认在漂洗操作期间从晶片下方喷射的液体适当地接触晶片的底侧。
    • 65. 发明申请
    • BLOWING APPARATUS IN A PAPER MACHINE OR THE LIKE
    • 纸机中的吹制装置或类似物
    • WO00050693A1
    • 2000-08-31
    • PCT/FI2000/000130
    • 2000-02-21
    • F26B13/20B05B1/02D21F5/04
    • D21F5/042D21F5/046
    • The blowing device comprises a blow box (30) which is arranged at the opening nip (22) between the wire and the cylinder and which is provided with at least two nozzles (36; 44, 46) or the like arranged close to the wire or the like. The first nozzle (36) is arranged at the opening nip (22) between the wire and the cylinder, for blowing air away from the gap (34) between the wire and the blowing device. The second nozzle (44, 46) is arranged at a distance from said opening nip, in the wire travel direction. The air jets discharged from the nozzles maintain a negative pressure in the space between the blowing device and the wire. In the blowing device, at a short distance from the opening nip, there is further arranged a throttling means (50) projecting toward the wire, the throttling means dividing the negative pressure space formed between the first nozzle and the second nozzle into an intensified negative pressure region (34') bordering to the location of the opening nip and into a second lower negative pressure region (34", 20').
    • 吹风装置包括吹风箱(30),其布置在线和气缸之间的开口压区(22)处,并且设置有至少两个布置成靠近线材的喷嘴(36; 44,46)等 或类似物。 第一喷嘴(36)布置在线和气缸之间的开口压区(22)处,用于将空气从电线和吹风装置之间的间隙(34)吹出。 第二喷嘴(44,46)在丝线行进方向上与所述打开压区一定距离设置。 从喷嘴排出的空气射流在吹风装置和电线之间的空间中保持负压。 在吹风装置中,在与打开压区短距离的位置处,还设置有朝向线突出的节流装置(50),节流装置将形成在第一喷嘴和第二喷嘴之间的负压空间分成强化负 压力区域(34'),其与开口压区的位置相邻并且进入第二较低负压区域(34“,20')。