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51. 发明申请

WO2007127086A3 METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN ION BEAM 审中-公开
公开(公告)号：WO2007127086A3
公开(公告)日：2007-11-08
申请号：PCT/US2007/009272
申请日：2007-04-13
申请人： AXCELIS TECHNOLOGIES, INC. , KELLERMAN, Peter , BENEVENISTE, Victor , PEREL, Alexander , FREER, Brian , GRAF, Michael
发明人： KELLERMAN, Peter , BENEVENISTE, Victor , PEREL, Alexander , FREER, Brian , GRAF, Michael
IPC分类号： H01J37/12 , H01J37/317
摘要： A focusing particle trap system (200) for ion implantation removes unwanted particles (222) from an ion beam (202) prior to implantation. An entrance electrode (204) comprising an entrance aperture (206) and is biased to a first base voltage. A center electrode (208) is positioned a distance downstream from the entrance electrode and includes a center aperture (210). The center electrode is biased to a negative value, less than the first base voltage. An exit electrode (212) is positioned a distance downstream from the center electrode and includes an exit aperture (214). The exit electrode is biased to a second base voltage. A first electrostatic field is generated (218) from the entrance electrode toward the center electrode and a second electrostatic field (220) is generated from the exit electrode toward the center electrode in order to trap unwanted particles within an ion beam.

52. 发明申请

WO2007059197A3 TECHNIQUE FOR SHAPING A RIBBON-SHAPED ION BEAM 审中-公开
公开(公告)号：WO2007059197A3
公开(公告)日：2007-05-24
申请号：PCT/US2006/044312
申请日：2006-11-15
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： RADOVANOV, Svetlana, B. , KELLERMAN, Peter , BENVENISTE,, Victor M. , LINDBERG, Robert, c. , PURSER, Kenneth, H. , ROCKWELL, Tyler, B. , BUFF, James, S. , RENAU, Anthony
IPC分类号： H01J37/12 , H01J37/30 , H01J37/317
摘要： A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens (1100) having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements (1108, 1110, 1112) are positioned along short edges- of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.

53. 发明申请

WO2006101116A1 電子線装置审中-公开
标题翻译：电子束装置
公开(公告)号：WO2006101116A1
公开(公告)日：2006-09-28
申请号：PCT/JP2006/305688
申请日：2006-03-22
申请人：株式会社荏原製作所 , 中筋護 , 野路伸治 , 佐竹徹 , 加賀徹 , 曽布川拓司 , 村上武司 , 狩俣努
发明人：中筋護 , 野路伸治 , 佐竹徹 , 加賀徹 , 曽布川拓司 , 村上武司 , 狩俣努
IPC分类号： H01J37/153 , H01J37/04 , H01J37/12 , H01J37/29
CPC分类号： H01J37/153 , H01J37/26 , H01J2237/1534 , H01J2237/2446 , H01J2237/28
摘要： Abaxial aberration produced by an axial chromatic aberration correction lens is satisfactorily corrected. A secondary electron emitted from a sample (W) by an electron beam irradiation is deflected by a beam separator (77), and is deflected again by an aberration correction electrostatic deflector (711) to form a magnified image on the main plane of an auxiliary lens (712). Abaxial aberration is reduced by converging a secondary electron beam by the auxiliary lens (712) and allowing it to enter axial chromatic aberration correction lenses (714-717). An auxiliary lens (712) is used to form the image of an NA aperture (724) at almost the middle (718) in the light axis direction of the axial chromatic aberration correction lenses (714-717). A secondary electronic image having axial chromatic aberration corrected is magnified by a magnifying lens (719) and forms a final magnified image on the light reception surface of an EBCCD detector (722) by means of a final magnifying lens (721).
摘要翻译：由轴向色像差校正透镜产生的轴向像差令人满意地校正。通过电子束照射从样品（W）发射的二次电子被光束分离器（77）偏转，并由像差校正静电偏转器（711）再次偏转，以在辅助的主平面上形成放大图像透镜（712）。通过辅助透镜（712）会聚二次电子束并允许其进入轴向色差校正透镜（714-717）来减小外轴像差。辅助透镜（712）用于在轴向色像差校正透镜（714-717）的光轴方向的几乎中间（718）处形成NA孔径（724）的图像。具有校正的轴向色差的二次电子图像由放大透镜（719）放大，并通过最终放大透镜（721）在EBCCD检测器（722）的光接收表面上形成最终的放大图像。

54. 发明申请

WO2006097252A1 LASERBESTRAHLTER HOHLZYLINDER ALS LINSE FÜR IONENSTRAHLEN 审中-公开
标题翻译： LASERBESTRAHLTER期圆筒AS镜头离子束
公开(公告)号：WO2006097252A1
公开(公告)日：2006-09-21
申请号：PCT/EP2006/002249
申请日：2006-03-10
申请人： HEINRICH-HEINE UNIVERSITÄT DÜSSELDORF , WILLI, Oswald , FUCHS, Julien , BORGHESI, Marco , TONCIAN, Toma
发明人： WILLI, Oswald , FUCHS, Julien , BORGHESI, Marco , TONCIAN, Toma
IPC分类号： G21K1/087 , H01J37/12 , H05H15/00 , A61N5/10
CPC分类号： G21K1/087 , A61N2005/1087
摘要： Die vorliegende Erfindung betrifft ein System zur Fokussierung und/oder zur Kollimierung eines Ionenstrahles (7, 10), insbesondere eines Strahles beschleunigter Protonen (7, 10), wobei das System eine Linse mit einem für den Ionenstrahl durchgängigen Linsenkörper (8) aufweist, wobei Mittel zur Erzeugung eines innerhalb des Linsenkörpers sich ausbreitenden und den lonenstrahl fokussierenden, insbesondere elektrostatischen, Feldes vorgesehen sind, wobei der Linsenkörper eine Wandung geringer Stärke aufweist, wobei die Mittel zur Felderzeugung eine Quelle für elektromagnetische Strahlung, etwa einen Laser, umfassen, deren emittierter Stahl (9) auf die Außenseite der Wandung des Linsenkörpers gerichtet ist, wobei die Stärke der Wandung und die Qualität der elektromagnetischen Strahlung derart gewählt sind, dass die Strahlung freie Elektronen erzeugt, die aus der Wandung austreten und sich an der Austrittsseite der Wandung in einer Elektronenwolke sammeln.
摘要翻译：本发明涉及一种系统，用于聚焦和/或用于准直的离子束（7,10），特别是加速质子束（7,10），其中，所述系统包括具有连续的离子束透镜体（8），其特征在于，一个透镜装置，用于将透镜体传播和离子束聚焦内产生，特别是静电，提供字段，其中所述镜体包含小厚度的壁，其特征在于，用于产生场的装置包括电磁辐射的源，如激光器，其发射出钢（9）被引导至透镜体，的壁的外侧，其中，所述壁和所述电磁辐射的质量的厚度被选择为使得所述辐射产生自由电子，壁和在所述壁的出口侧中的电子云，其出口收集。

55. 发明申请

WO00031527A2 SILICON MICROLENS CLEANING SYSTEM 审中-公开
标题翻译：硅微波清洗系统
公开(公告)号：WO00031527A2
公开(公告)日：2000-06-02
申请号：PCT/US1999/025510
申请日：1999-10-29
IPC分类号： G01N20060101 , G01N13/12 , G01N30/00 , G12B21/00 , H01J37/12 , H01J37/26
CPC分类号： B82Y15/00
摘要： A method and system for cleaning the silicon microlenses (100) in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current (I) through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.
摘要翻译：一种用于在电子束微柱中原位清洁硅微透镜（100）的方法和系统。通过使电流（I）通过每个微透镜来单独地加热微透镜。该电流用于将微透镜加热至至少二百摄氏度以防止污染，并且偶尔达到六至七百摄氏度的温度以除去任何积聚或潜在的污染物。

56. 发明申请

WO2023016678A1 MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER 审中-公开
公开(公告)号：WO2023016678A1
公开(公告)日：2023-02-16
申请号：PCT/EP2022/064275
申请日：2022-05-25
申请人： CARL ZEISS MULTISEM GMBH
发明人： SAROV, Yanko , ZEIDLER, Dirk , SCHMID, Thomas , KURIJ, Georg , KÄSTNER, Marcus , BIHR, Ulrich , SINGER, Wolfgang
IPC分类号： H01J37/04 , H01J37/09 , H01J37/12
摘要： A multi-beam generation unit for a multi-beam system is provided with larger individual focusing power for each of a plurality of primary charged particle beamlets. The multi-beam generation unit comprise an active terminating multi-aperture plate. The terminating multi- aperture plate can be used for a larger focusing range for an individual stigmatic focus spot adjustment of each beamlet of a plurality of primary charged particle beamlets.

57. 发明申请

WO2022248138A1 CHARGED PARTICLE DEVICE AND METHOD 审中-公开
公开(公告)号：WO2022248138A1
公开(公告)日：2022-12-01
申请号：PCT/EP2022/060971
申请日：2022-04-26
申请人： ASML NETHERLANDS B.V.
发明人： MANGNUS, Albertus, Victor, Gerardus
IPC分类号： H01J37/28 , H01J37/12 , H01J37/317
摘要： The present invention provides a charged particle optical device for a charged particle system. The device projects an array of charged particle beams towards a sample. The device comprises a control lens array to control a parameter of the array of beams; and an objective lens array to project the array of beams onto the sample, the objective lens array being downbeam of the control lens. The objective lens array comprises: an upper electrode; and a lower electrode arrangement that comprises an up-beam electrode and a down-beam electrode. The device is configured to apply an upper potential to the upper electrode, an up-beam potential to the up-beam electrode and a down-beam potential to the down-beam electrode. The potentials are controlled to control the landing energy of the beams on the sample and. to maintain focus of the beams on the sample at the landing energies.

58. 发明申请

WO2022135926A1 ELECTRON LENS 审中-公开
公开(公告)号：WO2022135926A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084737
申请日：2021-12-08
申请人： ASML NETHERLANDS B.V.
发明人： STEENBRINK, Stijn, Wilem, Herman, Karel , KONING, Johan, Joost , VAN SOEST, Jurgen , WIELAND, Marco, Jan-Jaco
IPC分类号： H01J37/12 , H01J37/28
摘要： Disclosed herein is an electron-optical device, a lens assembly and an electron-optical column. The electron-optical device comprises an array substrate and an adjoining substrate and is configured to provide a potential difference between the substrates. An array of apertures is defined in each of the substrates for the path of electron beamlets. The array substrate has a thickness which is stepped so that the array substrate is thinner in the region corresponding to the array of apertures than another region of the array substrate.

59. 发明申请

WO2021249792A1 MANIPULATOR, MANIPULATOR ARRAY, CHARGED PARTICLE TOOL, MULTI-BEAM CHARGED PARTICLE TOOL, AND METHOD OF MANIPULATING A CHARGED PARTICLE BEAM 审中-公开
公开(公告)号：WO2021249792A1
公开(公告)日：2021-12-16
申请号：PCT/EP2021/064371
申请日：2021-05-28
申请人： ASML NETHERLANDS B.V.
发明人： DINU GURTLER, Laura , AKSENOV, German
IPC分类号： H01J37/12 , H01J37/317 , H01J37/147 , H01J37/153 , H01J37/28 , H01J2237/1202 , H01J2237/1205 , H01J2237/1504 , H01J2237/1516 , H01J2237/1532 , H01J37/3177
摘要： A manipulator for manipulating a charged particle beam in a projection system, the manipulator comprising a substrate having opposing major surfaces in each of which is defined an aperture and a through-passage having an interconnecting surface extending between the apertures; wherein the interconnecting surface comprises one or more electrodes; the manipulator further comprising a potential divider comprising two or more resistive elements connected in series, the potential divider comprising an intermediate node between each pair of adjacent resistive elements, wherein at least one resistive element is formed within the substrate so as to extend between the opposing major surfaces; wherein the intermediate node is electrically connected to at least one of the one or more electrodes.

60. 发明申请

WO2021204733A1 APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CHARGED PARTICLE BEAMS, AND CHARGED PARTICLE PROJECTION APPARATUS 审中-公开
公开(公告)号：WO2021204733A1
公开(公告)日：2021-10-14
申请号：PCT/EP2021/058823
申请日：2021-04-04
申请人： ASML NETHERLANDS B.V.
发明人： WIELAND, Marco, Jan-Jaco
IPC分类号： H01J37/04 , H01J37/09 , H01J37/12 , H01J37/26
摘要： The disclosure relates to apparatus and methods for manipulating charged particle beams. In one arrangement, an aperture assembly is provided that comprises a first aperture body and a second aperture body. Apertures in the first aperture body are aligned with apertures in the second aperture body. The alignment allows charged particle beams to pass through the aperture assembly. The first aperture body comprises a first electrode system for applying an electrical potential to an aperture perimeter surface of each aperture in the first aperture body. The first electrode system comprises a plurality of electrodes. Each electrode is electrically isolated from each other electrode and electrically connected simultaneously to the aperture perimeter surfaces of a different one of a plurality of groups of the apertures in the first aperture body.

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