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    • 53. 发明申请
    • METHODS FOR MAKING ULTRA-LOW EXPANSION SILICA-TITANIA GLASSES
    • 制造超低膨胀二氧化硅玻璃的方法
    • WO99054259A1
    • 1999-10-28
    • PCT/US1999/008777
    • 1999-04-21
    • C03B8/04C03B19/14C03C3/06C03B20/00
    • C03C3/06C03B19/1415C03B2201/02C03B2201/42C03B2207/32C03B2207/34C03B2207/85C03C2201/42C03C2203/40
    • Ultra-low expansion silica-titania glasses are produced by flame deposition of a mixture of vaporized octamethylcyclotetrasiloxane (OMCTS) and vaporized titanium isopropoxide (Ti-Ipox). Ti-Ipox is vaporized by nitrogen bubbled from conduit (16) into tank (12) and OMCTS is vaporized by nitrogen bubbled from conduit (14) in tank (10). Before being mixed with the Ti-Ipox, the OMCTS is dried so that its water content is less than 2 ppm and preferably less than 1 ppm. In this way, the formation of a precipitate on the glass making equipment (e.g., burners (28), distribution manifold (26), static mixer (18), joint (13), and conduits (20, 22, 24 and 30)) is avoided. Such a precipitate if allowed to form will result in premature shutdown of the glass making process and can result in undesirable variations in the composition of the silica-titania glass being produced.
    • 通过火焰沉积蒸发的八甲基环四硅氧烷(OMCTS)和蒸发的异丙醇钛(Ti-Ipox)的混合物来生产超低膨胀二氧化硅 - 二氧化钛玻璃。 通过从管道(16)鼓泡到罐(12)中的氮气气化Ti-Ipox,并且通过从罐(10)中的导管(14)鼓泡的氮气将OMCTS汽化。 在与Ti-Ipox混合之前,将OMCTS干燥,使其含水量小于2ppm,优选小于1ppm。 以这种方式,在玻璃制备设备(例如燃烧器(28),分配歧管(26)),静态混合器(18),接头(13)和导管(20,22,24和30)上形成沉淀物, )。 如果允许形成这种沉淀将导致玻璃制造过程的过早关闭,并且可能导致所生产的二氧化硅 - 二氧化钛玻璃的组成的不期望的变化。
    • 54. 发明申请
    • SYNTHETIC SILICA GLASS USED WITH UV-RAYS AND METHOD PRODUCING THE SAME
    • 使用紫外线的合成二氧化硅玻璃及其制造方法
    • WO98052879A1
    • 1998-11-26
    • PCT/EP1998/002965
    • 1998-05-20
    • C03B19/14C03B23/047C03B32/00C03C3/06C03C23/00G02B1/00
    • C03C3/06C03B19/1453C03B23/047C03B32/00C03B2201/07C03B2201/075C03B2201/20C03B2201/21C03B2201/23C03B2207/32C03C2201/11C03C2201/21C03C2201/23C03C2203/52
    • An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe2 excimer lamps, and to provide a method for producing the same. A synthetic silica glass optical material for high output power vacuum ultraviolet rays made from ultra high purity synthetic silica glass for use in the wavelength region of from 165 to 195 nm, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation width in OH group concentration ( DELTA OH/cm) of 10 wtppm or less, containing hydrogen molecules at a concentration of from 1 x 10 to 1 x 10 molecule/cm with a fluctuation width in hydrogen molecule concentration ( DELTA H2/cm) of 1 x 10 molecule/cm or lower, and containing chlorine at a concentration of 50 wtppm or lower. Also claimed is a method for producing the same.
    • 本发明的目的是提供一种合成二氧化硅玻璃光学材料,其从例如ArF准分子激光器和Xe2准分子灯发射的高输出功率的真空紫外线具有优异的透射率和耐久性,并提供 其制造方法 一种用于高浓度合成石英玻璃的高输出功率真空紫外线的合成二氧化硅玻璃光学材料,用于波长范围为165至195nm的OH基,其浓度为5至300重量ppm,具有波动宽度 在OH分子浓度(DELTA OH / cm)为10重量ppm以下,含有浓度为1×10 17〜1×10 19分子/ cm 3的氢分子,氢分子的波动宽度 浓度(DELTA H2 / cm)为1×10 17分子/ cm 3以下,含有浓度为50重量ppm以下的氯。 还要求保护其的方法。