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    • 34. 发明申请
    • Y2O3 FILM AND PROCESS FOR PRODUCING THE SAME
    • Y2O3薄膜及其制造方法
    • WO2007013640A1
    • 2007-02-01
    • PCT/JP2006/315082
    • 2006-07-24
    • SHOWA DENKO K.K.UEDA, TakashiKOBAYASHI, MasakazuKOJIMA, AkiraSAITO, Makoto
    • UEDA, TakashiKOBAYASHI, MasakazuKOJIMA, AkiraSAITO, Makoto
    • C23C20/02C23C26/00C04B41/50C03C17/25
    • C03C17/25C03C2217/228C03C2218/112C23C24/08C23C26/00
    • There is provided by the invention a member having high resistance to plasma corrosion required for a plasma etching chamber of a semiconductor manufacturing apparatus or a plasma treatment apparatus for a liquid crystal device or the like. An Y 2 O 3 film comprising an aggregate of Y 2 O 3 particles having a volume-average particle diameter of 10 nm to 300 nm is disclosed. An Y 2 O 3 film obtained by drying an Y 2 O 3 slurry having a volume-average particle diameter, in a dispersed state, of 10 nm to 300 nm and heat-treating the dried product is also disclosed. A dispersion medium of the Y 2 O 3 slurry is a polyhydric alcohol derivative. The Y 2 O 3 slurry contains b-diketone as a dispersant. The Y 2 O 3 slurry contains a b-diketone metal complex as a binder. The Y 2 O 3 slurry is a mixed slurry of two or more kinds of slurries having dispersed particle diameters of different volume-average particle diameters. Also disclosed is a process for producing an Y 2 O 3 film, comprising applying an Y 2 O 3 slurry having a volume-average particle diameter, in a dispersed state, of 10 nm to 300 nm and having an Y 2 O 3 concentration of 0.1% by mass to 40% by mass onto a substrate so that the film thickness based on one film-forming operation should become 10 nm to 5 mm and carrying out heat treatment at a heat treatment temperature of 100°C to 300°C for a heat treatment time of 10 minutes to 5 hours after film formation.
    • 本发明提供了一种对半导体制造装置的等离子体蚀刻室或液晶装置等离子体处理装置等所要求的等离子体腐蚀性高的构件。 包含具有体积平均粒径的Y 2 O 3 N 3颗粒的聚集体的Y 2 O 3 O 3膜 公开了10nm至300nm。 通过干燥具有体积平均粒径的Y 2 O 3 N 3浆料获得的Y 2 O 3 N 3膜 ,分散状态为10nm〜300nm,并对干燥产物进行热处理。 Y 2 O 3 N 3浆液的分散介质是多元醇衍生物。 Y 2 O 3浆料含有作为分散剂的b-二酮。 Y 2 O 3浆料含有作为粘合剂的b-二酮金属络合物。 Y 2 N 3 O 3浆料是具有不同体积平均粒径的分散粒径的两种或更多种浆料的混合浆料。 还公开了一种制备Y 2 O 3 O 3膜的方法,其包括将Y 2 O 3 O 3浆料 具有分散状态的体积平均粒径为10nm〜300nm,Y 2 O 3 O 3浓度为0.1质量%〜40体积% 使得基于一次成膜操作的膜厚度应为10nm至5mm,并在100℃至300℃的热处理温度下进行热处理10分钟的热处理时间至 成膜后5小时。
    • 39. 发明申请
    • SOLAR REFLECTIVE GLASS BLOCK AND METHOD OF PRODUCING THE SAME
    • 太阳能反射玻璃块及其制造方法
    • WO98052881A1
    • 1998-11-26
    • PCT/JP1998/002150
    • 1998-05-15
    • C03B23/24C03C17/00C03C17/25E04C1/42
    • E04C1/42C03B23/24C03C17/004C03C17/25C03C17/256C03C2217/212C03C2217/217C03C2217/23C03C2218/112
    • For providing a solar reflective glass block whose solar reflection characteristic is not lowered even if it is used for an external wall of a building over a long term and which can suppress as much as possible insufficiency of the lighting or the glare caused by reflection of the solar radiation, and a producing method thereof, a solar reflective glass block (10) is constituted of a glass press-formed body of a hollow box shape having a pair of mutually confronting transparent walls, and formed with a metal oxide film (11) on an inner side of at least one of the transparent walls. In the solar reflective glass block, the metal oxide film has a solar radiation reflectance of 15 to 60 %, a solar radiation absorptance of 5 to 60 % and a solar radiation transmittance of 20 to 70 %. For producing the foregoing solar reflective glass block, a pair of glass press-formed bodies, each having a box shape with a bottom and no top are first prepared, and then a solution containing metallic compound is sprayed onto an inner side of the bottom of at least one of the glass press-formed bodies so as to form a metal oxide film having a solar radiation reflectance of 15 to 60 %, a solar radiation absorptance of 5 to 60 % and a solar radiation transmittance of 20 to 70 %. Thereafter, open edges of the glass press-formed bodies are softened by heating, and then sealed together.
    • 为了提供一种太阳能反射玻璃块,其太阳能反射特性即使长期用于建筑物的外壁也不会降低,并且可以尽可能地抑制由于反射引起的照明或眩光的不足 太阳辐射及其制造方法,太阳能反射玻璃块(10)由具有一对相互面对的透明壁的中空箱状的玻璃压制成型体构成,并形成有金属氧化物膜(11) 在至少一个透明壁的内侧。 在太阳能反射玻璃块中,金属氧化物膜的太阳辐射反射率为15〜60%,太阳辐射吸收率为5〜60%,太阳辐射透射率为20〜70%。 为了制造上述太阳能反射玻璃块,首先制备一个具有底部且没有顶部的箱形的玻璃压制成形体,然后将含有金属化合物的溶液喷涂到底部的内侧 至少一个玻璃压制成型体,以形成具有15至60%的太阳辐射反射率,5至60%的太阳辐射吸收率和20至70%的太阳辐射透射率的金属氧化物膜。 此后,玻璃压制成形体的开口边缘通过加热软化,然后密封在一起。