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21. 发明申请

WO2022058252A1 OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OPTICAL SYSTEM ARRAY, METHOD OF FOCUSING, OBJECTIVE LENS ARRANGEMENT 审中-公开
公开(公告)号：WO2022058252A1
公开(公告)日：2022-03-24
申请号：PCT/EP2021/075018
申请日：2021-09-10
申请人： ASML NETHERLANDS B.V.
发明人： WIELAND, Marco, Jan-Jaco
IPC分类号： H01J37/10 , H01J37/12
摘要： Arrangements involving objective lens array assemblies for charged-particle assessment tools are disclosed. In one arrangement, the assembly comprises an objective lens array and a control lens array. Each objective lens projects a respective sub-beam of a multi-beam onto a sample. The control lens array is associated with the objective lens array and positioned up-beam of the objective lens array. The control lenses pre-focus the sub-beams.

22. 发明申请

WO2021170482A1 ELECTROSTATIC LENS DESIGNS 审中-公开
公开(公告)号：WO2021170482A1
公开(公告)日：2021-09-02
申请号：PCT/EP2021/054008
申请日：2021-02-18
申请人： ASML NETHERLANDS B.V.
发明人： DEL TIN, Laura , STEGEMANN, Almut, Johanna , AKSENOV, German , MARTINEZ NEGRETE GASQUE, Diego , BRANDT, Pieter, Lucas
IPC分类号： H01J37/10 , H01J37/12
摘要： Disclosed herein is a manipulator lensing device for focusing a beam of charged particles, wherein the manipulator lensing device comprises a first structure (401) through which is formed an opening, wherein the path of the beam is substantially along a longitudinal axis of the opening, a second structure (402) with a surface (406) surrounding the opening, a support (403) that connects the second structure to the first structure and surrounds the second structure, and an electrode arrangement (407) provided on the surface (406) of the second structure, wherein a first surface (404) of the first structure (401) surrounds the opening, a second surface (405) of the first structure (401) surrounds the opening, the surface (406) of the second structure (402) being arranged along the longitudinal axis between the first and second surfaces of the first structure, the electrode arrangement (407) and each of the first (404) and second (405) surfaces of the first structure (401) are separated from each other by a respective gap in a direction parallel to the longitudinal axis, wherein, along the longitudinal axis, the extent of the support (403) is less than the extent of the surface (406) of the second structure and/or electrode arrangement (407). Further disclosed is a multi-array lens configured focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises said manipulator lensing device.

23. 发明申请

WO2020257518A1 APPARATUSES AND METHODS FOR MERGING ION BEAMS 审中-公开
公开(公告)号：WO2020257518A1
公开(公告)日：2020-12-24
申请号：PCT/US2020/038525
申请日：2020-06-18
申请人： PURDUE RESEARCH FOUNDATION
发明人： LASKIN, Julia , HU, Hang , SU, Pei
IPC分类号： H01J37/10
摘要： An ion beam lens and methods for combining ion beams are disclosed. Embodiments combine hyperthermal ion beams and can include layered three-dimensional electrodes with passageways through the electrodes, each electrode having a specified DC voltage and each passageway configured for passing an ion beam to an exit, the velocity vectors of the beams being primarily oriented along the lens' central axis upon exiting the passageways. Embodiments include nested electrode plates with curved ion beam passageways. In some embodiments each electrode plate has a charge different from the electrode plates adjacent to it, and in some embodiments every other electrode plate is charged with a first DC voltage and the remaining plates are charged with a second DC voltage different from the first DC voltage.

24. 发明申请

WO2020081277A1 MULTI-BEAM ELECTRON CHARACTERIZATION TOOL WITH TELECENTRIC ILLUMINATION 审中-公开
公开(公告)号：WO2020081277A1
公开(公告)日：2020-04-23
申请号：PCT/US2019/055077
申请日：2019-10-08
申请人： KLA CORPORATION
发明人： BRODIE, Alan D.
IPC分类号： H01J37/28 , H01J37/05 , H01J37/10
摘要： A multi-beam electron source is disclosed. The multi-beam source includes an electron source, a grid lens assembly, and a multi-lens array assembly. The multi-lens array assembly includes a set of lenses disposed across a substrate. The grid lens assembly is configured to cause a primary electron beam from the electron beam source to land on the multi-lens array assembly telecentrically. The multi-lens array assembly is configured to split the electron beam from the electron beam source into a plurality of primary electron beams. The grid lens assembly includes a first lens element and a second lens element, wherein the first lens element and the second lens element are separated by a gap of a selected distance. The grid lens assembly further includes a grid element including a set of apertures, wherein the grid element is disposed within the gap between the first lens element and the second lens element.

25. 发明申请

WO2019021420A1 荷電粒子線装置及び荷電粒子線装置の調整方法审中-公开
公开(公告)号：WO2019021420A1
公开(公告)日：2019-01-31
申请号：PCT/JP2017/027255
申请日：2017-07-27
申请人：株式会社日立ハイテクノロジーズ
发明人：土橋　高志 , 谷口　佳史 , 玉置　央和
IPC分类号： H01J37/10 , H01J37/09 , H01J37/147 , H01J37/153 , H01J37/26
CPC分类号： H01J37/09 , H01J37/10 , H01J37/147 , H01J37/153 , H01J37/26
摘要：荷電粒子線装置において、広がり角を押さえた平行な電子ビームを。フレネル縞を発生させることなく試料上に照射することを可能にするために、試料に１次電子ビームを照射する照射光学系と、試料を透過した透過電子を結像させて試料の像を検出する結像光学系とを備えた荷電粒子線装置において、照射光学系は、１次電子ビームを発射する電子銃と、電子銃から発射された１次電子ビームの一部を通過させる絞り穴が形成されたコンデンサ絞りと、コンデンサ絞りの絞り穴を通過した１次電子ビームの軌道を制御する第１偏向器と、第１偏向器で軌道が制御された１次電子ビームの平行度を調整するコンデンサレンズを複数備えたコンデンサレンズ部と、コンデンサレンズ部で平行光に調整された１次電子ビームによる絞り穴の像を試料上に結像させる対物レンズとを備えて構成した。

26. 发明申请

WO2018172186A1 CHARGED PARTICLE BEAM SYSTEM AND METHOD 审中-公开
公开(公告)号：WO2018172186A1
公开(公告)日：2018-09-27
申请号：PCT/EP2018/056569
申请日：2018-03-15
申请人： CARL ZEISS MICROSCOPY GMBH
发明人： RIEDESEL, Christof , ZEIDLER, Dirk
IPC分类号： H01J37/28 , H01J37/244 , H01J37/147 , H01J37/09 , H01J37/10
摘要： The present invention relates to a charged particle beam system comprising a charged particle source configured to generate a first charged particle beam, a multi beam generator configured to generate a plurality of charged particle beamlets from an incoming first charged particle beam, wherein each individual beamlet of the plurality of charged particle beamlets is spatially separated from other beamlets of the plurality of charged particle beamlets, an objective lens configured to focus incoming charged particle beamlets in a first plane in a manner that a first region in which a first individual beamlet of the plurality of charged particle beamlets impinges in the first plane is spatially separated from a second region in which a second individual beamlet of the plurality of charged particle beamlets impinges in the first plane, a projection system and a detector system comprising a plurality of individual detectors, wherein the projection system is configured to image interaction products leaving the first region within the first plane due to impinging charged particles onto a first one of the plurality of individual detectors and to image interaction products leaving the second region in the first plane due to impinging charged particles onto a second one of the plurality of individual detectors. In the charged particle beam system the projection system comprises a first subcomponent providing low frequency adjustments and a second subcomponent providing a high frequency adjustments.

27. 发明申请

WO2015174221A1 荷電粒子線装置及び当該装置を用いる検査方法审中-公开
标题翻译：充电颗粒光束装置和使用设备的检测方法
公开(公告)号：WO2015174221A1
公开(公告)日：2015-11-19
申请号：PCT/JP2015/062056
申请日：2015-04-21
申请人：株式会社日立ハイテクノロジーズ
发明人：猩々　智康 , 川野　源 , 早田　康成
IPC分类号： H01J37/10 , H01J37/09
CPC分类号： H01J37/12 , H01J37/09 , H01J37/10 , H01J37/147 , H01J37/153 , H01J37/28 , H01J2237/103 , H01J2237/21 , H01J2237/24592 , H01J2237/28 , H01J2237/2809 , H01J2237/2814 , H01J2237/2817
摘要：　荷電粒子源（１）と、荷電粒子源（１）の下流に設置された第１のコンデンサレンズ（４）と、前記第１のコンデンサレンズ（４）の下流に設置された絞り（５）と、前記絞り（５）よりも下流に設置された第２のコンデンサレンズ（６）とを有する荷電粒子線装置において、第１の荷電粒子線量より多い第２の荷電粒子線量で試料（１２）を照射する場合に、荷電粒子線が前記絞り（５）より下流で結像し、かつ、前記第１の荷電粒子線量と前記第２の荷電粒子線量とで前記第２のコンデンサレンズの焦点位置が変化しないように、前記第１及び第２のコンデンサレンズを制御する。
摘要翻译：在本发明中，带电粒子束装置具有带电粒子源（1），布置在带电粒子源（1）下游的第一聚光透镜（4），设置在第一聚光透镜以及布置在所述孔（5）的下游的第二聚光透镜（6），其中当要以大于第一带电粒子束量的第二带电粒子束量照射样品（12）时，控制第一和第二聚光透镜，使得带电粒子束形成在孔（5）的下游，并且使得第二聚光透镜的焦点在第一带电粒子束量和第二带电粒子之间不变化光束量。

28. 发明申请

WO2006009295A1 ELECTRON BEAM APPLYING APPARATUS AND DRAWING APPARATUS 审中-公开
标题翻译：电子束应用设备和绘图设备
公开(公告)号：WO2006009295A1
公开(公告)日：2006-01-26
申请号：PCT/JP2005/013683
申请日：2005-07-20
申请人： RICOH COMPANY, LTD. , CRESTEC CORPORATION , MIYAZAKI, Takeshi , OHYI, Hideyuki , OBARA, Takashi
发明人： MIYAZAKI, Takeshi , OHYI, Hideyuki , OBARA, Takashi
IPC分类号： H01J37/305 , G11B9/10 , G21K1/087 , H01J37/09 , H01J37/10 , G03F7/20
CPC分类号： H01J37/3007 , G11B7/0045 , G11B7/261 , G11B9/10 , G11B11/002 , H01J2237/3175
摘要： An electron beam applying apparatus includes: a thermal field emission type electron source (12) emitting an electron beam; an electrostatic lens (14) disposed immediately below the electron source (12) and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second angular aperture smaller than the first angular aperture; a condenser lens disposed on a downstream side of the electrostatic lens (14) and condensing the electron beam condensed in the second aperture angel by the electrostatic lends (14) in a crossover point; and an objective lens (28) disposed on a downstream side of the condenser lens (18) and condensing the electron beam condensed in the crossover point by the condenser lens (18) on the surface of the material (32).
摘要翻译：电子束施加装置包括：发射电子束的热场发射型电子源（12）; 静电透镜（14），其设置在所述电子源（12）的正下方，并且用作聚集电极，用于将电子束在由所述电子源发射的第一角孔中在小于所述第一角孔的第二角度孔中聚集; 设置在所述静电透镜（14）的下游侧的聚光透镜，并且以交叉点将由所述静电透镜（14）在第二孔径角度中聚光的电子束聚光; 以及设置在聚光透镜（18）的下游侧的物镜（28），并且将通过聚光透镜（18）在交叉点处会聚的电子束会聚在材料（32）的表面上。

29. 发明申请

WO2005071709A3 BEAM OPTICAL COMPONENT HAVING A CHARGED PARTICLE LENS 审中-公开
标题翻译：具有带电粒子透镜的光束组件
公开(公告)号：WO2005071709A3
公开(公告)日：2005-12-15
申请号：PCT/EP2004014180
申请日：2004-12-13
申请人： INTEGRATED CIRCUIT TESTING , FROSIEN JUERGEN
发明人： FROSIEN JUERGEN
IPC分类号： H01J37/12 , H01J37/14 , H01J37/15 , H01J37/10
CPC分类号： H01J37/14 , H01J37/12 , H01J37/15 , H01J2237/1501
摘要： The present invention relates to a beam optical component including a charged particle lens (1; 1000) for focusing a charged particle beam (3), the charged particle lens (1; 1000) comprising a first element (5; 1005) having a first opening (7) for focusing the charged particle beam (3); a second element (9; 1009) having a second opening (11) for focusing the charged particle beam (3); and first driving means (13) connected with at least one of the first element (5; 1005) and the second element (9; 1009) for aligning the first opening (7) with respect to the second opening (11). With the first driving means, the first opening (7) and the second opening (11) can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focussing. The present invention also relates to a charged particle beam device that uses said beam optical component for focussing the charged particle beam (3), and a method to align first opening (7) and second opening (11) with respect to each other.
摘要翻译：本发明涉及包括用于聚焦带电粒子束（3）的带电粒子透镜（1; 1000）的束光学组件，带电粒子透镜（1; 1000）包括具有第一元件（5; 1005）用于聚焦带电粒子束（3）的开口（7）; 具有用于聚焦所述带电粒子束（3）的第二开口（11）的第二元件（9; 1009）; 和与第一元件（5; 1005）和第二元件（9; 1009）中的至少一个连接的第一驱动装置（13），用于使第一开口（7）相对于第二开口（11）对准。利用第一驱动装置，在光束操作期间，第一开口（7）和第二开口（11）可以相对于彼此对准，以提供光束光学部件的优良对准以实现更好的光束聚焦。本发明还涉及一种使用所述光束光学部件来聚焦带电粒子束（3）的带电粒子束装置以及一种使第一开口（7）和第二开口（11）相对于彼此对准的方法。

30. 发明申请

WO01056056A2 OBJECTIVE LENS FOR A CHARGED PARTICLE BEAM DEVICE 审中-公开
标题翻译：用于充电颗粒光束装置的目标透镜
公开(公告)号：WO01056056A2
公开(公告)日：2001-08-02
申请号：PCT/EP2001/000857
申请日：2001-01-26
IPC分类号： G01Q70/10 , H01J37/141 , H01J37/147 , H01J37/28 , H01J37/10 , H01J29/66 , H01J37/14 , H01J37/26
CPC分类号： H01J37/1471 , H01J37/141 , H01J37/28
摘要： The present invention provides an improved objective lens for a charged particle beam device. The objective lens comprises a magnetic lens that creates a first magnetic field for focussing the charged particle beam onto the specimen. Furthermore, a deflector is integrated into the magnetic lens by providing at least one additional coil arrangement that creates a second magnetic field used to deflect the charged particle beam. Thereby, the second magnetic field is guided through at least one of the pole pieces of the magnetic lens. The present invention also provides an improved column for a charged particle beam device including the improved objective lens.
摘要翻译：本发明提供了一种用于带电粒子束装置的改进的物镜。物镜包括磁性透镜，其产生用于将带电粒子束聚焦到样本上的第一磁场。此外，偏转器通过提供至少一个额外的线圈装置而被集成到磁性透镜中，该线圈装置产生用于偏转带电粒子束的第二磁场。由此，第二磁场被引导通过磁性透镜的极片中的至少一个。本发明还提供了一种用于包括改进的物镜的带电粒子束装置的改进的列。

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