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    • 26. 发明申请
    • LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM
    • 激光薄膜聚硅氧烷退火光学系统
    • WO2005053893A3
    • 2005-07-07
    • PCT/US2004037618
    • 2004-11-12
    • CYMER INCPARTLO WILLIAM NDAS PALASH PHUDYMA RUSSELTHOMAS MICHAEL
    • PARTLO WILLIAM NDAS PALASH PHUDYMA RUSSELTHOMAS MICHAEL
    • B23K26/06B23K26/073C30B1/02C30B13/24H01L21/20H01S3/22H01S3/223B23K26/00
    • B23K26/0732B23K26/0622B23K26/0738C30B1/023C30B13/24H01L21/2026
    • A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 µm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep side walls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level 2. The apparatus may also have a high average power in the laser output light pulse beam as delivered to the workpiece and a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The line width due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.
    • 公开了一种高能量,高重复率的工件表面加热方法和装置,其可以包括在4000Hz以上工作的脉冲XeF激光器,并在约351nm的中心波长处产生激光输出光脉冲光束; 将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20μm的光学系统,并且扩大激光输出光脉冲光束以形成长轴的光束工件覆盖范围的长轴 ; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍率来允许场停止在工件处保持足够陡峭的光束轮廓而不阻挡光束轮廓 在太高的强度水平2.该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率,以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值,以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构,其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。