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11. 发明申请

WO2006036562A3 POLYMERIZATION TECHNIQUE TO ATTENUATE OXYGEN INHIBITION OF SOLIDIFICATION OF LIQUIDS AND COMPOSITION THEREFOR 审中-公开
标题翻译：聚合技术降低氧气对液体的固化及其组成的抑制作用
公开(公告)号：WO2006036562A3
公开(公告)日：2007-03-29
申请号：PCT/US2005032804
申请日：2005-09-13
申请人： MOLECULAR IMPRINTS INC
发明人： XU FRANK Y , FLETCHER EDWARD B , LAD PANKAJ B , WATTS MICHAEL P C
IPC分类号： B05D3/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention includes a method of solidifying a polymerizable liquid to form a film (200) on a substrate surface (36) that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerization process.
摘要翻译：本发明包括固化可聚合液体以在基材表面（36）上形成薄膜（200）的方法，该方法的特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生另外的自由基以促进聚合过程。

12. 发明申请

WO2010053558A3 RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY 审中-公开
标题翻译：释放代理分割控制在印刷图
公开(公告)号：WO2010053558A3
公开(公告)日：2010-11-04
申请号：PCT/US2009005990
申请日：2009-11-05
申请人： MOLECULAR IMPRINTS INC
发明人： XU FRANK Y , LIU WEIJUN
IPC分类号： G03F7/00
CPC分类号： C07D237/24 , B82Y10/00 , B82Y40/00 , C07C233/18 , G03F7/0002
摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template (18) during separation of the template from the solidified resist (46) in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer (46) from the template (18) may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template (18) facilitates the formation of ultra-thin residual layers (48) and dense fine features (50) in nano-imprint lithography.
摘要翻译：在纳米压印光刻工艺中将模板与固化的抗蚀剂（46）分离期间，对纳米压印光刻模板表面具有增加的亲和力的脱模剂与模板（18）相互作用强烈。表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。在将图案化层（46）与模板（18）分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在固化过程中在模板刻印光刻工艺。脱模剂与模板（18）的表面的强烈缔合有利于在纳米压印光刻中形成超薄残余层（48）和致密精细特征（50）。

13. 发明申请

WO2009075793A2 CONTROLLING THICKNESS OF RESIDUAL LAYER 审中-公开
标题翻译：控制残留层的厚度
公开(公告)号：WO2009075793A2
公开(公告)日：2009-06-18
申请号：PCT/US2008013432
申请日：2008-12-05
申请人： MOLECULAR IMPRINTS INC
发明人： LABRAKE DWAYNE L , KHUSNATDINOV NIYAZ , JONES CHRISTOPHER ELLIS , XU FRANK Y
IPC分类号： C08J7/04 , B05D5/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm.
摘要翻译：描述了在基板上制造图案化表面的方法。通常，图案化表面由厚度小于约5nm的残余层限定。

14. 发明申请

WO2006084118A3 IMPRINT LITHOGRAPHY TEMPLATE AND METHOD TO FACILITATE CONTROL OF LIQUID MOVEMENT 审中-公开
标题翻译：强调液晶移动模拟和方法
公开(公告)号：WO2006084118A3
公开(公告)日：2008-01-31
申请号：PCT/US2006003821
申请日：2006-02-01
申请人： MOLECULAR IMPRINTS INC
发明人： MCMACKIN IAN M , FLETCHER EDWARD B , LAD PANKAJ B , MILLER MICHAEL N , TRUSKETT VAN N , STACEY NICHOLAS A , XU FRANK Y , MARTIN WESLEY , MACKAY CHRISTOPHER J
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed to a template that features a control surface extending from a periphery of a mold toward a recessed surface of the template forming an oblique angle between a portion of the control surface disposed proximate to the periphery. Further, the present invention is directed to a method of controlling a quantity of liquid from extruding from a volumetric gap defined between a mold included in the substrate and a region of the substrate in superimposition therewith that features varying the capillary forces between the liquid and one of the template and the substrate. To that end, the method includes generating capillary forces between the liquid and one of the template and the substrate; and varying a magnitude of the forces to create a gradient of forces.
摘要翻译：本发明涉及一种模板，其特征在于，具有从模具的周边向模板的凹入表面延伸的控制表面，所述控制表面在靠近周边设置的控制表面的一部分之间形成倾斜的角度。此外，本发明涉及一种控制液体量的方法，所述液体从在包括在基底中的模具和与其叠加的基底区域之间限定的体积间隙挤出，其特征在于改变液体和一个液体之间的毛细管力的模板和底物。为此，该方法包括在液体和模板和基板之一之间产生毛细力; 并且改变力的大小以产生力的梯度。

15. 发明申请

WO2006057843A3 METHOD AND COMPOSITION PROVIDING DESIRABLE CHARACTERISTICS BETWEEN A MOLD AND A POLYMERIZABLE COMPOSITION 审中-公开
标题翻译：提供模具和可聚合组合物之间的可用特性的方法和组合物
公开(公告)号：WO2006057843A3
公开(公告)日：2006-07-20
申请号：PCT/US2005041156
申请日：2005-11-14
申请人： MOLECULAR IMPRINTS INC
发明人： XU FRANK Y , FLETCHER EDWARD B , TRUSKETT VAN N , MILLER MICHAEL N
IPC分类号： B41N3/00 , B05D3/06 , B05D5/08 , B41D5/00 , B41F17/00 , B41F19/00 , B41K3/02 , C09D133/12 , C09D183/04
CPC分类号： G03F7/0002 , B29C33/58 , B29C33/62 , B82Y10/00 , B82Y40/00
摘要： The present invention provides a method that features improved wetting characteristics while allowing preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material (50) disposed therebetween. The method includes coating a surface of the mold with a volume of surfactant containing solution (60). The surfactant in the solution includes a hydrophobic component consisting essentially of a plurality of fluorine-containing molecules. The distribution of the plurality of the fluorine atoms in the fluorine-containing molecules, as well as the fluorine-containing molecules throughout the volume provides a desired contact angle with respect to a polymerizable composition disposed (50) on the substrate (42). The contact angle is in a range of 50 degrees or less.
摘要翻译：本发明提供一种具有改进的润湿特性的方法，同时允许相对于基材和具有设置在其间的压印材料（50）的基底和模具的优先粘附和释放特性。该方法包括用一定体积的表面活性剂包含溶液（60）涂覆模具的表面。溶液中的表面活性剂包括基本上由多个含氟分子组成的疏水组分。含氟分子中的多个氟原子的分布以及整个体积中的含氟分子相对于在基材（42）上设置（50）的可聚合组合物提供期望的接触角。接触角在50度以下的范围内。

16. 发明申请

WO2005000552A2 METHOD TO REDUCE ADHESION BETWEEN A CONFORMABLE REGION AND A PATTERN OF A MOLD 审中-公开
标题翻译：减少一个合格区域和一个模具图案之间的粘合力的方法
公开(公告)号：WO2005000552A2
公开(公告)日：2005-01-06
申请号：PCT/US2004018857
申请日：2004-06-10
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： CHOI BYUNG-JIN , XU FRANK Y , STACEY NICHOLAS A , TRUSKETT VAN N , WATTS MICHAEL P C
IPC分类号： B29C20060101 , B29C59/00 , G03F7/00 , B29C
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming a conformable material on the substrate and contacting the conformable material with the surface. A conditioned layer is formed from the conformable material. The conditioned layer has first and second sub-portions, with the first sub-portion being solidified and the second sub-portion having a first affinity for the surface and a second affinity for the first sub-portion. The first affinity is greater than the second affinity. In this fashion, upon separation of the mold from the conditioned layer, a subset of the second sub-portion maintains contact with the mold, thereby reducing the probability that a pattern formed in the conditioned layer becomes compromised.
摘要翻译：本发明提供一种降低基材上的适形区域和选择性地与适形区域接触的模具图案之间的粘附性的方法。该方法的特征在于在基底上形成适形材料并使适形材料与表面接触。由适形材料形成调理层。调理层具有第一和第二子部分，其中第一子部分被固化，第二子部分对于表面具有第一亲和力，对第一子部分具有第二亲和力。第一亲和力大于第二亲和力。以这种方式，在模具与调理层分离时，第二子部分的子集保持与模具的接触，从而降低在调理层中形成的图案变得损害的可能性。

17. 发明申请

WO2011094696A3 ULTRA-COMPLIANT NANOIMPRINT LITHOGRAPHY TEMPLATE 审中-公开
标题翻译：超可靠的纳米印刷光刻模板
公开(公告)号：WO2011094696A3
公开(公告)日：2011-10-13
申请号：PCT/US2011023193
申请日：2011-01-31
申请人： MOLECULAR IMPRINTS INC
发明人： MILLER MICHAEL N , LIU WEIJUN , XU FRANK Y
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An ultra-compliant nanoimprint lithography template having a backing layer and a nanopatterned layer adhered to the backing layer. The nanopatterned layer includes nanoscale features formed by solidifying a polymerizable material in contact with a mold. The polymerizable material includes a fluoroelastomer and a photoinitiator. The backing layer has a higher elastic modulus than the nanopatterned layer. The ultra-compliant nanoimprint lithography template can be used to form multiple high fidelity imprints.
摘要翻译：超顺应性纳米压印光刻模板，其具有粘附于背衬层的背衬层和纳米图案层。纳米图案层包括通过固化与模具接触的可聚合材料而形成的纳米级特征。可聚合材料包括含氟弹性体和光引发剂。背衬层具有比纳米图案层更高的弹性模量。超兼容的纳米压印光刻模板可用于形成多个高保真印记。

18. 发明申请

WO2011066450A2 ADHESION LAYERS IN NANOIMPRINT LITHOGRAPHY 审中-公开
标题翻译： NANOIMPRINT LITHOGRAPHY粘合层
公开(公告)号：WO2011066450A2
公开(公告)日：2011-06-03
申请号：PCT/US2010058089
申请日：2010-11-24
申请人： MOLECULAR IMPRINTS INC , YE ZHENGMAO , XU FRANK Y , LABRAKE DWAYNE L , SELINIDIS KOSTA S
发明人： YE ZHENGMAO , XU FRANK Y , LABRAKE DWAYNE L , SELINIDIS KOSTA S
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/265
摘要： Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template.
摘要翻译：在纳米压印光刻模板或双面盘上形成粘合剂层。在双面盘上形成粘合剂层包括将双面盘浸入液体粘合剂组合物中并从粘合剂组合物中除去双面盘。双面盘的外层是碳外涂层或中间层。将粘合剂组合物干燥以形成直接附着在盘的第一侧上的碳外涂层或中间层的第一粘合层，以及直接粘附在盘的第二侧上的碳外涂层或中间层的第二粘附层。在纳米压印光刻模板上形成粘合剂层包括将粘合剂材料施加到模板上，允许模板保持静止，并用溶剂从模板中漂洗一部分粘合剂材料，并干燥模板。

19. 发明申请

WO2010047837A3 STRAIN AND KINETICS CONTROL DURING SEPARATION PHASE OF IMPRINT PROCESS 审中-公开
标题翻译：印刷过程分离阶段的应变和动力学控制
公开(公告)号：WO2010047837A3
公开(公告)日：2010-10-07
申请号：PCT/US2009005803
申请日：2009-10-26
申请人： MOLECULAR IMPRINTS INC
发明人： KHUSNATDINOV NIYAZ , XU FRANK Y , MEISSL MARIO JOHANNES , MILLER MICHAEL N , THOMPSON ECRON , SCHMID GERARD , NIMMAKAYALA PAWAN K , LU XIAOMING , CHOI BYUNG-JIN
IPC分类号： G03F7/00
CPC分类号： B29C37/0003 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
摘要翻译：描述了在压印光刻工艺的分离过程期间用于改进鲁棒层分离的系统和方法。包括在待印记的底物与模板之间匹配菌株的方法，改变或修改在分离期间施加于模板和/或底物的力，或改变或修改分离过程的动力学。

20. 发明申请

WO2009082458A3 CONTACT ANGLE ATTENUATIONS ON MULTIPLE SURFACES 审中-公开
标题翻译：联系多个表面的角度衰减
公开(公告)号：WO2009082458A3
公开(公告)日：2009-12-30
申请号：PCT/US2008013827
申请日：2008-12-18
申请人： MOLECULAR IMPRINTS INC
发明人： XU FRANK Y , MCMACKIN IAN M , LAD PANKAJ B
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region.
摘要翻译：处理模板以提供表面活性剂富集区域和表面活性剂贫化区域。表面活性剂富集区域处的接触角可以大于，小于或基本上类似于表面活性剂贫化区域的接触角。

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