专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

WO2007131769A1 BACKSIDE IMMERSION LITHOGRAPHY 审中-公开
标题翻译：后置倾斜图
公开(公告)号：WO2007131769A1
公开(公告)日：2007-11-22
申请号：PCT/EP2007/004304
申请日：2007-05-15
申请人： MICRONIC LASER SYSTEMS AB , LJUNGBLAD, Ulric , GUSTAFSSON, Per-Erik
发明人： LJUNGBLAD, Ulric , GUSTAFSSON, Per-Erik
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F1/54 , G03F1/76
摘要： The present disclosure relates to formation of latent images in a radiation sensitive layer applied to a substrate (210) that is transparent to or transmissive of radiation at the exposing wavelength. In particular, it relates to so-called backside lithography, in which the final lens (101) of an exposing system is positioned to project electromagnetic radiation through a first side of the transparent substrate (110) and expose a radiation sensitive layer (214) that overlays a second side of the transparent substrate that is opposite the first side. Five alternative embodiments for further treatment to form a radiation opaque layer corresponding to the latent image (the image or its inverse) are described. These methods and corresponding devices are useful for producing masks (sometimes called reticles), for producing latent images in semiconductor devices and for forming features of semiconductor devices using masks.
摘要翻译：本公开涉及在施加到对曝光波长的透射透射或透射的衬底（210）的辐射敏感层中的潜像的形成。特别地，本发明涉及所谓的背面光刻技术，其中曝光系统的最终透镜（101）定位成将电磁辐射投影穿过透明基板（110）的第一侧并暴露辐射敏感层（214）覆盖透明基板的与第一侧相对的第二面。描述了用于进一步处理以形成对应于潜像（辐射不透明层）的替代实施例（图像或其倒数）。这些方法和相应的装置可用于制造掩模（有时称为掩模版），用于在半导体器件中产生潜像并使用掩模形成半导体器件的特征。

12. 发明申请

WO2006110070A1 IMAGE ENHANCEMENT TECHNIQUE 审中-公开
标题翻译：图像增强技术
公开(公告)号：WO2006110070A1
公开(公告)日：2006-10-19
申请号：PCT/SE2005/000543
申请日：2005-04-15
申请人： MICRONIC LASER SYSTEMS AB , LJUNGBLAD, Ulric
发明人： LJUNGBLAD, Ulric
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70041
摘要： The present invention relates to a method to improve at least one feature edge steepness in an image to be exposed onto a moving workpiece, comprising the actions of: moving the image in essentially the same direction relative to the direction of movement of the workpiece, synchronizing said moving of the image with a pulse length of an exposure radiation source. The invention also relates to a pattern generator for creating patterns on a workpiece
摘要翻译：本发明涉及一种改善要暴露在移动工件上的图像中的至少一个特征边缘陡度的方法，包括以下动作：相对于工件的移动方向以基本上相同的方向移动图像，同步所述图像以曝光辐射源的脉冲长度移动。本发明还涉及用于在工件上产生图案的图案发生器

13. 发明申请

WO2003079090A1 IMPROVED ADDRESSING METHOD OF MOVABLE ELEMENTS IN A SPATIAL LIGHT MODULATOR (slm) 审中-公开
标题翻译：空调光调制器（slm）中可移动元件的改进寻址方法
公开(公告)号：WO2003079090A1
公开(公告)日：2003-09-25
申请号：PCT/SE2003/000427
申请日：2003-03-14
申请人： MICRONIC LASER SYSTEMS AB , LJUNGBLAD, Ulric
发明人： LJUNGBLAD, Ulric
IPC分类号： G02B26/08
CPC分类号： G02B26/0841
摘要： The present invention relates to a method for modulating at least one pulse of electromagnetic radiation with a spatial light modulator. At least one mechanically movable modulator element is provided. At least one actuating element is provided capable to produce forces on said modulator element. An address signal to said at least one movable element is provided. A first amplifying signal is provided to at least one first electrode belonging to said at least one movable element shaping and timing said amplifying signal for creating a mechanical response in the modulator element representing a desired modulation state for said electromagnetic radiation pulse when impinging onto said modulator element.
摘要翻译：本发明涉及用空间光调制器调制至少一个电磁辐射脉冲的方法。提供至少一个机械可移动的调制器元件。提供能够在所述调制器元件上产生力的至少一个致动元件。提供到所述至少一个可移动元件的地址信号。第一放大信号被提供给属于所述至少一个可移动元件整形的至少一个第一电极和定时所述放大信号，用于在调制器元件中产生表示当所述电磁辐射脉冲入射到所述调制器上时所述电磁辐射脉冲的期望调制状态的机械响应元件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式