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11. 发明申请

WO2015054357A1 RUBBERY POLYSILOXANES CARRYING CYANOACRYLATE FUNCTIONS AND RELATED METHODS FOR THEIR PREPARATION AND USES THEREFOR 审中-公开
标题翻译：携带氰基丙烯酸酯官能团的橡胶聚硅氧烷及其制备及其用途的相关方法
公开(公告)号：WO2015054357A1
公开(公告)日：2015-04-16
申请号：PCT/US2014/059643
申请日：2014-10-08
申请人： THE UNIVERSITY OF AKRON , KENNEDY, Joseph , SZANKA, Istvan , SZANKA, Amalia
发明人： KENNEDY, Joseph , SZANKA, Istvan , SZANKA, Amalia
IPC分类号： C07C255/23
CPC分类号： C08G77/388 , A61K31/74 , A61L24/001 , A61L24/046 , A61L26/0019 , A61L26/0061 , C08G77/20 , C08G77/22 , C08L83/04
摘要： A family of silicone rubbers (e.g., polydimethylsiloxane) carrying one or more cyanoacrylate groups and their methods of production are provided. These silicone rubbers endowed with cyanoacrylate groups are useful in a variety of wound care applications, including wound closures, adhesives, sealants and skin protectors. The silicone rubber moiety provides oxygen and moisture permeability (i.e., "breathability"), biocompatibility, optical transparency, and good mechanical properties, while the cyanoacrylate group imparts instantaneous adhesion/attachment to living tissues such as skin on par with that of contemporary cyanoacrylate-based wound care products.
摘要翻译：提供携带一个或多个氰基丙烯酸酯基团的硅橡胶（例如聚二甲基硅氧烷）族及其制备方法。这些具有氰基丙烯酸酯基团的硅橡胶可用于各种伤口护理应用，包括伤口闭合物，粘合剂，密封剂和皮肤保护剂。硅橡胶部分提供氧和透湿性（即“透气性”），生物相容性，光学透明性和良好的机械性能，而氰基丙烯酸酯基团将活性组织例如皮肤的瞬时粘附/附着与当代氰基丙烯酸酯 - 基于伤口护理产品。

12. 发明申请

WO2005109148A1 DISTRIBUTED LOOP COMPONENTS 审中-公开
标题翻译：分布式环路组件
公开(公告)号：WO2005109148A1
公开(公告)日：2005-11-17
申请号：PCT/US2005/012075
申请日：2005-04-08
申请人： INTEL CORPORATION , KENNEDY, Joseph , MOONEY, Stephen
发明人： KENNEDY, Joseph , MOONEY, Stephen
IPC分类号： G06F1/10
CPC分类号： H03L7/0812
摘要： A chip includes a chip interface to accept a delay control signal from outside the chip. The chip also includes a controllable delay line to delay an input signal responsive to the delay control signal to provide an output signal with a particular phase relationship to the input signal.
摘要翻译：一个芯片包括一个芯片接口，用于接受来自芯片外部的延迟控制信号。芯片还包括可控延迟线，以响应于延迟控制信号来延迟输入信号，以提供具有与输入信号的特定相位关系的输出信号。

13. 发明申请

WO2005041255A2 COATING COMPOSITION OPTIMIZATION FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：涂料组合物通过薄膜和光刻胶应用的优化及其制备方法
公开(公告)号：WO2005041255A2
公开(公告)日：2005-05-06
申请号：PCT/US2004/025231
申请日：2004-08-04
申请人： HONEYWELL INTERNATIONAL, INC. , KENNEDY, Joseph , STUCK, Jason
发明人： KENNEDY, Joseph , STUCK, Jason
IPC分类号： H01L
CPC分类号： H01L21/3122 , C09D183/04 , C09D183/16 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/3124 , H01L21/31695 , H01L21/76808
摘要： A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials.
摘要翻译：牺牲涂层材料包括：至少一种无机化合物和至少一种材料改性剂，其中牺牲涂层材料可溶于碱性化学或氟基化学。制造牺牲涂料的方法包括：提供至少一种无机化合物，提供至少一种材料改性剂，将至少一种无机化合物与至少一种材料改性剂组合以形成牺牲涂料，其中牺牲涂料可溶于碱性化学物质或氟基化学物质，但不溶于有机BARC材料中通常使用的有机浇铸溶剂。

14. 发明申请

WO2005037907A1 COATINGS AND HARD MASK COMPOSITIONS FOR INTEGRATED CIRCUIT APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
标题翻译：用于集成电路应用的涂层和硬掩模组合物，其生产方法及其用途
公开(公告)号：WO2005037907A1
公开(公告)日：2005-04-28
申请号：PCT/US2004/032789
申请日：2004-10-05
申请人： HONEYWELL INTERNATIONAL INC. , KENNEDY, Joseph , HUANG, Wei, T. , DO, Kim, N. , STUCK, Jason
发明人： KENNEDY, Joseph , HUANG, Wei, T. , DO, Kim, N. , STUCK, Jason
IPC分类号： C08K3/22
CPC分类号： C09D183/04
摘要： A coating material is described herein that includes at least one inorganic compound, and at least one densifying agent, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound. A method of producing a coating material is described herein that includes: providing at least one inorganic compound, providing at least one densifying agent, combining the at least one inorganic compound with the at least one densifying agent to form the coating material, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound.
摘要翻译：本文描述了包括至少一种无机化合物和至少一种致密化剂的涂层材料，其中与至少一种无机化合物的密度相比，致密化剂增加了涂层材料的密度。本文描述了制备涂料的方法，其包括：提供至少一种无机化合物，提供至少一种致密化剂，将至少一种无机化合物与至少一种致密化剂结合以形成涂层材料，其中致密化与至少一种无机化合物的密度相比，增加了涂层材料的密度。

15. 发明申请

WO2005017617A1 PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC APPLICATIONS AND DEVICES AND METHODS OF PRODUCTION THEREOF 审中-公开
标题翻译：用于高级微电子应用的平面薄膜及其制造方法
公开(公告)号：WO2005017617A1
公开(公告)日：2005-02-24
申请号：PCT/US2003/034347
申请日：2003-10-27
申请人： HONEYWELL INTERNATIONAL INC , HUANG, Wei , KENNEDY, Joseph , KATSANES, Ronald
发明人： HUANG, Wei , KENNEDY, Joseph , KATSANES, Ronald
IPC分类号： G03C1/00
CPC分类号： H01L21/02118 , C04B26/12 , C04B2111/00482 , C08J7/02 , C08J2361/00 , C23F1/10 , C23F1/44 , C23F3/00 , C23F3/04 , H01L21/31051 , H01L21/312 , Y10T428/31942 , C04B2103/0093 , C04B2103/40
摘要： A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.
摘要翻译：本文公开了一种平面化组合物，其包括：a）结构成分; 和b）溶剂体系，其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的至少一种分子间力或表面力组分。还公开了包含该平坦化组合物的膜。此外，本文公开了另外的平坦化组合物，其包括：a）甲酚基聚合物化合物; 和b）包含至少一种醇和至少一种乙酸乙烯酯类溶剂的溶剂体系。还公开了包含该平坦化组合物的膜。本文还公开了一种分层组件，其包括：a）具有表面形貌的衬底; 和b）平面化组合物或诸如本文所述的那些的膜，其中所述组合物与所述基材偶联。本文还公开了形成平坦化组合物的方法，其包括：a）提供结构成分; b）提供溶剂体系，其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的分子间力或表面力组分中的至少一种; 和c）将结构成分和溶剂体系混合以形成平坦化组合物。还公开了形成膜的方法，其包括：a）提供诸如本文公开的那些的平坦化组合物; 和b）蒸发至少部分溶剂系统以形成膜。

16. 发明申请

WO2019018495A1 HIGH-STRENGTH LOW-CREEP THERMOPLASTIC ELASTOMER 审中-公开
公开(公告)号：WO2019018495A1
公开(公告)日：2019-01-24
申请号：PCT/US2018/042636
申请日：2018-07-18
申请人： KENNEDY, Joseph , NUGAY, Turgut , NUGAY, Nihan , THE UNIVERSITY OF AKRON
发明人： KENNEDY, Joseph , NUGAY, Turgut , NUGAY, Nihan
IPC分类号： C07C13/32 , C07C13/44 , C07C23/18
摘要： A polystyrene- g -(polyisobutylene-b-polystyrene) is taught. The polystyrene- g -(polyisobutylene- b -polystyrene) is synthesized by first providing a polystyrene backbone. Once the polystyrene backbone is provided, the polystyrene backbone is acetylated to provide acetyl groups on the polystyrene backbone. Next, the acetyl groups are converted to -C(CH 3 ) 2 OH groups. Finally, the living polymerization of isobutylene is initiated, which is then followed by the living block polymerization of styrene. A polymer network of polystyrene- g -(polyisobutylene- b -polystyrene)s is also provided.

17. 发明申请

WO2017132106A1 POLYISOBUTYLENE-BASED POLY(URETHANE-UREA)S 审中-公开
标题翻译：聚异丁烯基聚（尿烷脲）S
公开(公告)号：WO2017132106A1
公开(公告)日：2017-08-03
申请号：PCT/US2017/014649
申请日：2017-01-24
申请人： KENNEDY, Joseph , TOTH, Kalman , NUGAY, Nihan , DOLLINGER, Susan , THE UNIVERISTY OF AKRON
发明人： KENNEDY, Joseph , TOTH, Kalman , NUGAY, Nihan , DOLLINGER, Susan
IPC分类号： A61L27/00 , A61L27/16 , C08G18/10 , C08L75/04 , C09J175/04
CPC分类号： C08G18/10 , C08G18/6204 , C08G18/7671 , C08G18/3206 , C08G18/3271
摘要： In one or more embodiments, the present invention provide a polyisobutylene-based polyurethane-urea, and related method of preparation, wherein PIB-diols form the soft segment and a diisocyanate along with a well-defined combinations low molecular weight diol chain extenders and amino alcohol as co-chain extenders form the hard segments. In one or more embodiments, the present invention is directed to the use of judiciously chosen chain extender/co-chain extender combinations to enhance the strength of PUs by partially replacing urethane groups with urea groups by the use of amino alcohols to improve strength, while maintaining good processability. These thermoplastic PIB-PUU elastomers exhibit heretofore unattainable combinations of mechanical properties and processability.
摘要翻译：在一个或多个实施方案中，本发明提供聚异丁烯基聚氨酯 - 脲和相关的制备方法，其中PIB-二醇形成软链段和二异氰酸酯以及明确限定的组合低分子量二醇扩链剂和氨基醇作为共链增量剂形成硬链段。在一个或多个实施方案中，本发明涉及使用明智选择的扩链剂/共扩链剂组合来通过使用氨基醇部分地用尿素基团取代氨基甲酸酯基团以提高强度同时增强PU的强度，而保持良好的加工性。这些热塑性PIB-PUU弹性体表现出迄今为止无法实现的机械性能和可加工性的组合。

18. 发明申请

WO2014138017A1 PREPARATION OF POLYISOBUTYLENE-BASED POLYMER NETWORKS BY THIOL-ENE CHEMISTRY 审中-公开
标题翻译：通过THIOL-ENE化学制备基于聚异丁烯的聚合物网络
公开(公告)号：WO2014138017A1
公开(公告)日：2014-09-12
申请号：PCT/US2014/020208
申请日：2014-03-04
申请人： KENNEDY, Joseph , NUGAY, Turgut , NUGAY, Nihan , THE UNIVERSITY OF AKRON
发明人： KENNEDY, Joseph , NUGAY, Turgut , NUGAY, Nihan
IPC分类号： C08F110/10 , C08G75/04
CPC分类号： C08F110/10 , C08F10/10 , C08F299/00 , C08G75/04 , C08G75/045 , C08K5/37 , C08F4/16 , C08F2/10
摘要： A PIB-based polymer network includes at least one sulfur containing segment and at least two PIB polymer segments. The at least two PIB polymer segments each include a core and at least two polyisobutylene polymer chains extending therefrom. The at least one sulfur containing segment includes at least one sulfur atom that is located between any two polyisobutylene polymer chains from two different PIB polymer segments, so that the sulfur containing segment connects those two different PIB polymer segments together. The PIB-based polymer network is produced by the thiol-ene reaction in the presence of light or heat. The reaction products include at least two polyisobutylene polymer precursor moieties, each polyisobutylene polymer precursor moiety having at least two end group selected from the end groups -CH 2 -CH(CH 3 )=CH 2 , -CH 2 =C(CH 3 ) 2 , and -CH 2 -CH=CH 2 ;and at least one multi-functional thiol.
摘要翻译：基于PIB的聚合物网络包括至少一个含硫段和至少两个PIB聚合物链段。所述至少两个PIB聚合物链段各自包含芯和从其延伸的至少两个聚异丁烯聚合物链。至少一个含硫部分包含位于来自两个不同PIB聚合物链段的任何两个聚异丁烯聚合物链之间的至少一个硫原子，使得含硫链段将那两个不同的PIB聚合物链段连接在一起。基于PIB的聚合物网络通过在光或热存在下的硫醇 - 烯反应制备。反应产物包括至少两个聚异丁烯聚合物前体部分，每个聚异丁烯聚合物前体部分具有至少两个选自端基-CH 2 -CH（CH 3）= CH 2，-CH 2 = C（CH 3）2和-CH 2 -CH = CH 2;和至少一个多官能硫醇。

19. 发明申请

WO2008106379A1 COMPOSITIONS, COATINGS AND FILMS FOR TRI-LAYER PATTERNING APPLICATIONS AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：三层布置方法的组合物，涂料和薄膜及其制备方法
公开(公告)号：WO2008106379A1
公开(公告)日：2008-09-04
申请号：PCT/US2008/054814
申请日：2008-02-23
申请人： HONEYWELL INTERNATIONAL INC. , KENNEDY, Joseph , XIE, Songyuan , DO, Kim , MUKHOPADHYAY, Sudip
发明人： KENNEDY, Joseph , XIE, Songyuan , DO, Kim , MUKHOPADHYAY, Sudip
IPC分类号： C08L83/04 , C08G77/18 , C08G77/20 , C09D183/04 , G03F7/09 , H01L21/312 , C08K3/28 , C08K5/101 , C08K5/17 , C08K5/18 , C08K5/3432
CPC分类号： G03F7/0752 , C08G77/20 , C08G77/70 , C08L83/04 , C08L83/06 , C09D183/04 , G03F7/091 , G03F7/11 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , C08L2666/44
摘要： Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, at least one condensation catalyst, and at least one solvent.. Tri-layer structures are also contemplated herein that comprise an organic underlayer (first layer), antireflective compositions and/or films contemplated herein (second layer) and a photoresist material (third layer) that are coupled to one another. Methods of producing a composition for tri-layer patterning applications includes: providing a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, providing at least one condensation catalyst, providing at least one solvent, providing at least one pH modifier, blending the formulated polymer and part of the at least one solvent in a reaction vessel to form a reactive mixture; and incorporating the at least one pH modifier, the at least one condensation catalyst and the remaining at least one solvent into the reactive mixture to form the composition.
摘要翻译：本文描述了用于三层应用的组合物，其中所述组合物具有基质，并且包括：配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，多个与基质偶联的乙烯基聚合物的多个苯基，以及耦合到聚合物基质，多个至少一个缩合催化剂和至少一种溶剂的多个苯基。本文还涵盖三层结构，其包含有机底层（第一层），抗反射本文考虑的组合物和/或膜（第二层）和彼此耦合的光致抗蚀剂材料（第三层）。制备用于三层图案化应用的组合物的方法包括：提供配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，与聚合物基体偶联的多个乙烯基，以及多个提供至少一种缩合催化剂，提供至少一种溶剂，提供至少一种pH调节剂，将配制的聚合物和部分至少一种溶剂混合在反应容器中以形成反应性混合物并将至少一种pH调节剂，至少一种缩合催化剂和剩余的至少一种溶剂掺入到反应混合物中以形成组合物。

20. 发明申请

WO2004044025A2 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：用于光刻的抗反射涂层及其制备方法
公开(公告)号：WO2004044025A2
公开(公告)日：2004-05-27
申请号：PCT/US2003/036354
申请日：2003-11-12
申请人： HONEYWELL INTERNATIONAL INC , BALDWIN, Teresa , KENNEDY, Joseph , IWAMOTO, Nancy , NAKANO, Tadashi , BEDWELL, William , STUCK, Jason , SUEDEMEYER, Arlene , HEBERT, Mello , LI, Bo
发明人： BALDWIN, Teresa , KENNEDY, Joseph , IWAMOTO, Nancy , NAKANO, Tadashi , BEDWELL, William , STUCK, Jason , SUEDEMEYER, Arlene , HEBERT, Mello , LI, Bo
IPC分类号： C08G
CPC分类号： C08G77/14 , C08G77/22 , C09D183/06 , C09D183/08 , G03F7/0757 , G03F7/091
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
摘要翻译：用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种致密剂，至少一种封端剂，至少一种流平剂，至少一种催化剂，至少一种置换溶剂，至少一种pH调节剂和/或其组合和/或掺入无机基材料或无机组合物和/ 或化合物。合适的吸收化合物是吸收可用于光刻法的波长例如365nm，248nm，193nm和157nm附近的吸收化合物。

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