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    • 12. 发明申请
    • APPARATUS AND METHOD FOR UNLOADING BULK MATERIALS
    • 卸载大容量材料的装置和方法
    • WO1984000948A1
    • 1984-03-15
    • PCT/US1983001349
    • 1983-09-01
    • MILLER, David, J.MILLER, Allen, R.MILLER, Charles, P.
    • B65G63/04
    • B65G67/606B65G53/48B65G65/22
    • An unloader (8) for bulk materials (3) to transfer material such as cement from a barge (2) or other bulk container. It includes a moveable and rotatable support (12) such as a crane or cantilevered arm that is adjacent the bulk container. A first conveyor (14) or auger is connected to the support for pivotal movement and extends generally horizontally. A second conveyor (16) or auger is connected to the distal end of the first conveyor for pivotal movement and is generally vertically oriented. A feeder (18) is connected to the distal end of the second conveyor for universal and rotational movement. The feeder includes an uplift portion (72) communicating with the second conveyor, the uplift portion advancing the bulk material at a rate slower than the second conveyor, and a collector portion (74) communicating with the uplift portion. The collector portion includes converging augers (80, 82) to advance the bulk material towards the uplift portion and to assist in transferring it into the uplift portion. The apparatus may further include a selectively operable energy responsive aeration system (150, 152, 154) to inject air into the bulk material while it is being handled by the unloader, a scraper (110, 112) attached to the feeder to assist in removing the last of the bulk material from its container, and a take-away mechanism (130) to transport the bulk material away from the unloader.
    • 13. 发明申请
    • MODERN HYDRIDE VAPOR-PHASE EPITAXY SYSTEM & METHODS
    • 现代氢气蒸气相外延系统与方法
    • WO2011119195A3
    • 2012-01-12
    • PCT/US2010062610
    • 2010-12-30
    • CBL TECHNOLOGIES INCSOLOMON GLENN SMILLER DAVID J
    • SOLOMON GLENN SMILLER DAVID J
    • H01L21/205
    • C30B29/406C30B25/08C30B25/10
    • Hydride vapor-phase deposition (HVPE) systems are disclosed. An HVPE hydride vapor-phase deposition system may include a reactant source chamber and a growth chamber containing a susceptor coupled to the reactant source chamber. The reactant source chamber may be configured to create a reactant gas through a chemical reaction between a solid or liquid precursor and a different precursor gas. The reactant source chamber can be configured to operate at a temperature T(M) significantly above room temperature. The reactant gas can be chemically unstable at or near room temperature. The susceptor is configured to receive a substrate and maintain the substrate at a substrate temperature T(S). The growth chamber includes walls can be configured to operate at a temperature T(C) such that T(M), T(S) are greater than T(C).
    • 公开了氢化物气相沉积(HVPE)系统。 HVPE氢化物气相沉积系统可以包括反应物源室和包含耦合到反应物源室的基座的生长室。 反应物源室可经配置以通过固体或液体前体与不同前体气体之间的化学反应产生反应气体。 反应物源室可以被配置为在明显高于室温的温度T(M)下操作。 反应物气体在室温或室温下可能化学不稳定。 基座构造成接收基板并将基板保持在基板温度T(S)。 生长室包括壁可被配置成在温度T(℃)下操作使得T(M),T(S)大于T(℃)。
    • 15. 发明申请
    • METHODS AND SYSTEMS FOR CONTROLLING AND/OR INCREASING IONTOPHORETIC FLUX
    • 用于控制和/或增加IOPOPHORETIC FLUX的方法和系统
    • WO2004077012A3
    • 2006-09-08
    • PCT/US2004004126
    • 2004-02-13
    • ACIONT INCHIGUCHI WILLIAM IMILLER DAVID JLI KEVIN S
    • HIGUCHI WILLIAM IMILLER DAVID JLI KEVIN S
    • A61N1/30A61N1/32
    • A61N1/0428A61N1/0436A61N1/30A61N1/327
    • An iontophoretic method is provided to selectively transport a compound of interest through a localized region of an individual's body tissue that exhibits a low electrical resistance and/or a high permeability. The method involves placing a permselective material, typically having a resistance comparable or higher than the resistance of the localized region, in ion-conducting relation to the localized region. An electrical current is then applied through the permselective material to the localized region, thereby transporting the compound of interest iontophoretically through the localized region. When the permselective material is capable of hindering iontophoretic transport of a competing ion, the transference efficiency of the compound of interest is increased during iontophoresis. As a result, the compound of interest is delivered into or extracted from the localized region at an enhanced rate. As transport efficiencies approach unity, absolute predictivity of transport also becomes possible. Also provided are electrode assemblies and iontophoretic systems capable of carrying out the iontophoretic method.
    • 提供离子电渗疗法以选择性地将感兴趣的化合物输送通过显示低电阻和/或高渗透性的个体身体组织的局部区域。 该方法包括将通常具有与局部区域的电阻相当或更高的电阻的选择性选择材料置于与局部区域的离子传导关系中。 然后通过选择选择材料将电流施加到局部区域,从而通过局部区域输送离子电渗透的化合物。 当选择选择性材料能够阻碍竞争离子的离子电渗转运时,在离子电渗中增加感兴趣的化合物的转移效率。 结果,感兴趣的化合物以增强的速率被递送到局部区域或从局部区域提取。 随着运输效率达到统一,运输的绝对预测也成为可能。 还提供了能够进行离子电渗法的电极组件和离子电渗系统。
    • 16. 发明申请
    • METHODS AND SYSTEMS FOR CONTROLLING AND/OR INCREASING IONTOPHORETIC FLUX
    • 用于控制和/或增加IOPOPHORETIC FLUX的方法和系统
    • WO2004077012A2
    • 2004-09-10
    • PCT/US2004/004126
    • 2004-02-13
    • ACIONT, INC.HIGUCHI, William, I.MILLER, David, J.LI, Kevin, S.
    • HIGUCHI, William, I.MILLER, David, J.LI, Kevin, S.
    • G01N
    • A61N1/0428A61N1/0436A61N1/30A61N1/327
    • An iontophoretic method is provided to selectively transport a compound of interest through a localized region of an individual's body tissue that exhibits a low electrical resistance and/or a high permeability. The method involves placing a permselective material, typically having a resistance comparable or higher than the resistance of the localized region, in ion-conducting relation to the localized region. An electrical current is then applied through the permselective material to the localized region, thereby transporting the compound of interest iontophoretically through the localized region. When the permselective material is capable of hindering iontophoretic transport of a competing ion, the transference efficiency of the compound of interest is increased during iontophoresis. As a result, the compound of interest is delivered into or extracted from the localized region at an enhanced rate. As transport efficiencies approach unity, absolute predictivity of transport also becomes possible. Also provided are electrode assemblies and iontophoretic systems capable of carrying out the iontophoretic method.
    • 提供离子电渗疗法以选择性地将感兴趣的化合物输送通过显示低电阻和/或高渗透性的个体身体组织的局部区域。 该方法包括将通常具有与局部区域的电阻相当或更高的电阻的选择性选择材料置于与局部区域的离子传导关系中。 然后通过选择选择材料将电流施加到局部区域,从而通过局部区域输送离子电渗透的化合物。 当选择选择性材料能够阻碍竞争离子的离子电渗转运时,在离子电渗中增加感兴趣的化合物的转移效率。 结果,感兴趣的化合物以增强的速率被递送到局部区域或从局部区域提取。 随着运输效率达到统一,运输的绝对预测也成为可能。 还提供了能够进行离子电渗法的电极组件和离子电渗系统。
    • 18. 发明申请
    • MODERN HYDRIDE VAPOR-PHASE EPITAXY SYSTEM & METHODS
    • 现代氢气蒸气相外延系统与方法
    • WO2011119195A2
    • 2011-09-29
    • PCT/US2010/062610
    • 2010-12-30
    • CBL TECHNOLOGIES, INC.SOLOMON, Glenn S.MILLER, David J.
    • SOLOMON, Glenn S.MILLER, David J.
    • C30B29/406C30B25/08C30B25/10
    • Hydride vapor-phase deposition (HVPE) systems are disclosed. An HVPE hydride vapor-phase deposition system may include a reactant source chamber and a growth chamber containing a susceptor coupled to the reactant source chamber. The reactant source chamber may be configured to create a reactant gas through a chemical reaction between a solid or liquid precursor and a different precursor gas. The reactant source chamber can be configured to operate at a temperature T(M) significantly above room temperature. The reactant gas can be chemically unstable at or near room temperature. The susceptor is configured to receive a substrate and maintain the substrate at a substrate temperature T(S). The growth chamber includes walls can be configured to operate at a temperature T(C) such that T(M), T(S) are greater than T(C).
    • 公开了氢化物气相沉积(HVPE)系统。 HVPE氢化物气相沉积系统可以包括反应物源室和包含耦合到反应物源室的基座的生长室。 反应物源室可经配置以通过固体或液体前体与不同前体气体之间的化学反应产生反应气体。 反应物源室可以被配置为在明显高于室温的温度T(M)下操作。 反应物气体在室温或室温下可能化学不稳定。 基座构造成接收基板并将基板保持在基板温度T(S)。 生长室包括壁可被配置成在温度T(℃)下操作使得T(M),T(S)大于T(℃)。