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91. 发明申请

WO01032361A1 METHOD AND APPARATUS FOR LAPPING OF WORKPIECES 审中-公开
标题翻译：用于工作的方法和装置
公开(公告)号：WO01032361A1
公开(公告)日：2001-05-10
申请号：PCT/RU2000/000251
申请日：2000-06-26
IPC分类号： B24B37/02 , B24B37/04 , B24B37/08 , B24B41/06 , B24B49/10
CPC分类号： B24B37/08 , B24B37/013 , B24B41/061 , B24B49/10
摘要： A lapping assembly (10) for lapping a group of workpieces (14) including a pair of lapping discs and a cassette (12) for positioning the workpieces between the lapping discs (16, 18). The lapping discs are provided with two-component translational oscillations at the appropriate cutting speed, parallel to their working planes. This motion is effected using crank (21, 22) pins rotating about a coaxially positioned axis and elastic members (20a, 20b) (or swivel-supporting members) coupled to the body of the lapping machine to prevent the lapping discs from rotating. The cassette has an opening having a curvilinear shape for holding the workpieces, and protrusions (26) which extend into the opening. The cassette is mounted on a support element and equipped with a drive to rotate it about a stationary axis. Alternatively, the cassette can be fixed during treatment and the lapping discs can be rotated at a speed less than the cutting speed. The combination of the curvilinear shape of the opening, the oscillations provided to the cassette and the relative rotation of the cassette in relation to the lapping discs cause workpieces to circulate within opening in a pseudo-random manner. The apparatus may also be adapted to finish workpieces to differing heights through the use of a sensor (74) coupled to one lapping disc (16) to detect the pre-set proximity of the other lapping disc (18).
摘要翻译：一种用于研磨一组工件（14）的研磨组件（10），包括一对研磨盘和用于将工件定位在研磨盘（16,18）之间的盒（12）。研磨盘在适当的切割速度下平行于其工作平面提供双组分平移振荡。该运动通过绕同轴定位的轴线旋转的曲柄（21,22）和与研磨机的主体相连的弹性构件（或旋转支撑构件）来实现，以防止研磨盘旋转。盒具有用于保持工件的曲线形状的开口和延伸到开口中的突起（26）。盒式磁带安装在支撑元件上，并配有驱动器，以使其围绕静止轴线旋转。或者，盒可在处理期间固定，并且研磨盘可以以小于切割速度的速度旋转。开口的曲线形状，提供给盒的振荡和相对于研磨盘的相对旋转的组合使得工件以伪随机的方式在开口内循环。该装置还可以适于通过使用耦合到一个研磨盘（16）的传感器（74）来完成工件到不同的高度，以检测另一研磨盘（18）的预设接近度。

92. 发明申请

WO00067958A1 GRINDING WORKBENCH THAT CAN BE SUBJECTED TO SUCTION 审中-公开
标题翻译： Vacuumable磨削BANK
公开(公告)号：WO00067958A1
公开(公告)日：2000-11-16
申请号：PCT/DE2000/001457
申请日：2000-05-05
IPC分类号： B08B15/04 , B24B41/06 , B24B55/06 , B25H1/18 , B23Q1/25 , B23Q11/00
CPC分类号： B08B15/04 , B24B41/06 , B24B55/06
摘要： The present invention relates to a grinding workbench that can be subjected to suction. Said workbench is provided with one or more vacuum tensioning device/s, a supporting grid (13), an integrated connection (9) for external suction, a complete energy rail (current, compressed air) and an integrated connection for high-vacuum suction used in manual workplaces in order to process workpieces on manual machines. It is possible to lower just the support grid (13) in order to provide a circumferential stop for processing workpieces.
摘要翻译：本发明提供与一个或多个真空夹具（n）的，支撑机架（13），集成终端制备的vacuumable研磨工作台（9），用于将外部抽吸装置，一个完整的能量棒（电力，压缩空气）和集成的高真空抽吸终端配备手动工作站为在场机床的工件的处理，其中，所述支撑格栅（13）单独被降低以提供用于加工工件的周向止动。

93. 发明申请

WO00054933A2 CHEMICAL MECHANICAL POLISHING HEAD HAVING FLOATING WAFER RETAINING RING AND WAFER CARRIER WITH MULTI-ZONE POLISHING PRESSURE CONTROL 审中-公开
标题翻译：具有多区域抛光压力控制的浮选式保持环和滚子载体的化学机械抛光头
公开(公告)号：WO00054933A2
公开(公告)日：2000-09-21
申请号：PCT/IB2000/000508
申请日：2000-02-24
IPC分类号： B24B37/30 , B24B37/32 , B24B41/06 , B24B49/16 , H01L21/304 , B24B37/00
CPC分类号： B24B37/30 , B24B37/32 , B24B41/061 , B24B49/16
摘要： In one aspect the invention provides a polishing apparatus (101) including a housing (120) a carrier (160) for mounting a substrate (113) to be polished, a retaining ring (134) circumscribing the carrier (113) for retaining the substrate (113), a first coupling (162) attaching the retaining ring (134) to the carrier (160) such that the retaining ring (134) may move relative to the carrier (160), a second coupling (145) attaching the carrier (160) to the housing (120) the housing (120) and the first coupling (162) defining a first pressure chamber (131) to exert a pressure force against the retaining ring (134), and the housing (120) and the second coupling (145) defining a second pressure chamber (132) to exert a pressure force against the subcarrier (160). In one embodiment, the couplings are diaphragms. In another embodiment, the invention includes a single- or multiple-chambered wafer carrier or subcarrier capable of modifying a differential polishing pressure across the surface of the wafer or other substrate.
摘要翻译：一方面，本发明提供了一种抛光装置（101），其包括：壳体（120），用于安装待抛光的基底（113）的载体（160）;围绕所述载体（113）的保持环（134），用于保持所述基底（113），将所述保持环（134）附接到所述载体（160）的第一联接器（162），使得所述保持环（134）可相对于所述载体（160）移动;第二联接器（145）（160）到所述壳体（120），所述壳体（120）和所述第一联接器（162）限定第一压力室（131）以对所述保持环（134）施加压力，并且所述壳体（120）和第二联接器（145）限定第二压力室（132）以对所述副载体（160）施加压力。在一个实施例中，联接器是隔膜。在另一个实施例中，本发明包括能够改变晶片或其它基板的表面上的差分抛光压力的单腔或多腔晶片载体或副载波。

94. 发明申请

WO00002705A1 ABRASIVE MACHINE 审中-公开
标题翻译：抛光机
公开(公告)号：WO00002705A1
公开(公告)日：2000-01-20
申请号：PCT/SE1999/001086
申请日：1999-06-17
IPC分类号： B24B7/16 , B24B33/055 , B24B41/06 , B24B49/10 , B24B5/10
CPC分类号： B24B7/16 , B24B33/055 , B24B41/067 , B24B49/10
摘要： An abrasive machine (10) comprises a rotatably driven tool (35), chucking equipment (27) for holding the work piece and feeding means (20, 21) for effecting relative displacement between the work piece (28) and the rotatably driven tool (35). The machine (10) further comprises: a tubular cylindrical housing (13); a shaft (17) provided with a recess; a rotatable outer casing (15) peripherally enclosing the housing (13); a lid member (30) connected to the casing (15), and extending radially over a first end of said tubular cylindrical housing (13) such that an inner surface (33) of said lid member faces said first end of said housing, wherein said rotatably driven tool (35) comprises abrasive material carried on said inner surface (33) of said lid member (30), and in that said shaft (17) is arranged such that when said shaft executes an angular displacement, said work piece (28) held by said chucking equipment (27) is caused to approach and contact said abrasive material.
摘要翻译：研磨机（10）包括可旋转驱动的工具（35），夹持设备（27），用于保持工件和进给装置（20,21），用于在工件（28）和可旋转驱动的工具（ 35）。机器（10）还包括：管状圆柱形壳体（13）; 设有凹部的轴（17）围绕外壳（13）的可旋转外壳（15）; 连接到所述壳体（15）的盖构件（30），并且径向延伸穿过所述管状圆柱形壳体（13）的第一端，使得所述盖构件的内表面（33）面向所述壳体的所述第一端，其中所述可旋转驱动的工具（35）包括承载在所述盖构件（30）的所述内表面（33）上的研磨材料，并且所述轴（17）布置成使得当所述轴执行角位移时，所述工件 28）由所述夹持设备（27）保持接触并接触所述研磨材料。

95. 发明申请

WO99067055A1 APPARATUS AND METHOD FOR GRINDING COMPOSITE WORKPIECES 审中-公开
标题翻译：用于研磨复合工件的装置和方法
公开(公告)号：WO99067055A1
公开(公告)日：1999-12-29
申请号：PCT/GB1999/001906
申请日：1999-06-16
IPC分类号： B24B5/42 , B24B19/12 , B24B41/06 , B24B51/00
CPC分类号： B24B51/00 , B24B5/42 , B24B19/12 , B24B41/067
摘要： A grinding machine has a wheelhead (30) movable under computer control perpendicular to the axis of a composite workpiece, mounted between a headstock (16) and a tailstock (20), and workrests (36 to 42) slidable along front and rear rails (128, 126). Between the workrests are sandwiched rigid cover-spacers (50 to 58) to protect the rails and prevent lateral movement of the workrests. A spring-operated thrust bar (60) may be supported against a fixed dressing wheelhead (14) to clamp the stack of cover-spacers and workrests together, in order to accurately locate and space apart the workrests.
摘要翻译：研磨机具有安装在头架（16）和尾架（20）之间的垂直于复合工件的轴线的计算机控制下的砂轮头（30），以及可沿前后轨道滑动的工作台（36至42） 128,126）。在工作台之间夹有刚性盖子间隔件（50至58），以保护导轨并防止工作台的横向移动。弹簧操作的推杆（60）可以被支撑在固定的修整砂轮头（14）上，以将叠层的间隔件和工作台夹在一起，以便精确地定位和分开工作台。

96. 发明申请

WO99060429A1 PRECISION DOUBLE-SIDED ASPHERIC ELEMENT 审中-公开
标题翻译：精密双面平面元件
公开(公告)号：WO99060429A1
公开(公告)日：1999-11-25
申请号：PCT/IL1999/000201
申请日：1999-04-15
IPC分类号： G02B5/18 , B24B13/005 , B24B13/04 , B24B41/06 , G02B3/00 , G02B3/04 , G02B3/08 , G02B13/14 , G02B27/00
CPC分类号： G02B5/189 , B24B13/005 , B24B13/046 , B24B41/061 , G02B3/04 , G02B13/14 , G02B27/0037 , G02B27/4211 , G02B27/4216 , G02B27/4227 , G02B27/4277 , Y10T82/10 , Y10T82/122 , Y10T82/125 , Y10T82/148 , Y10T82/149
摘要： A precision optical element (62) is described, such as is used in thermal imaging systems in the infrared, manufactured by means of single point machining, with both of its surfaces having an aspheric form, with or without the addition of a diffractive optics pattern. The element (62) is produced while held in a novel vacuum chuck (50), whose support surface (52) has a width in the radial direction significantly less than the size of the element (62), and which is aspherically machined to match the aspheric first surface of the element (62). A method whereby such an element (62) can be produced by means of single point machining, such as diamond turning or fly cutting, is also described. Also described are new optical system designs and applications using such double-sided aspheric elements, thereby providing significant improvement over currently available optical systems.
摘要翻译：描述了精密光学元件（62），例如用于通过单点加工制造的红外热成像系统，其两个表面具有非球面形式，具有或不添加衍射光学图案。元件（62）被保持在新的真空吸盘（50）中，其支撑表面（52）在径向方向上的宽度明显小于元件（62）的尺寸，并且被非机械加工以匹配元件（62）的非球面第一表面。还描述了通过单点加工（例如金刚石车削或飞切）可以制造这种元件（62）的方法。还描述了使用这种双面非球面元件的新的光学系统设计和应用，从而对现有的光学系统提供了显着的改进。

97. 发明申请

WO99034957A1 WORKPIECE CARRIER WITH MONOPIECE PRESSURE PLATE AND LOW GIMBAL POINT 审中-公开
标题翻译：具有单极压力板和低GIMBAL点的工作载体
公开(公告)号：WO99034957A1
公开(公告)日：1999-07-15
申请号：PCT/US1999/000063
申请日：1999-01-05
IPC分类号： B24B37/30 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30
摘要： A carrier for semiconductor wafers to be polished comprises a rigid upper housing, a rigid pressure plate and a gimbal mechanism connecting the plate and housing which permits the plate to gimbal or wobble relative to the housing. The pressure plate is a one-piece component and has a central cut-out portion in which the gimbal mechanism is disposed, thereby establishing a low gimbal point and reducing the incidence of tilting. The gimbal mechanism has an inner bearing ring which is fastened to the underside of the housing, and an outer bearing ring which is fastened to an outer portion of the pressure plate.
摘要翻译：要抛光的半导体晶片的载体包括刚性上壳体，刚性压板和连接板和壳体的万向节机构，其允许板相对于壳体万向架或摇摆。压板是一体式部件，具有设置万向架机构的中央切口部，由此形成低的万向节点，并减少倾斜的发生。万向架机构具有固定在壳体下侧的内部轴承环和紧固在压力板外部的外部轴承环。

98. 发明申请

WO99033614A1 A CARRIER HEAD WITH A REMOVABLE RETAINING RING FOR A CHEMICAL MECHANICAL POLISHING APPARATUS 审中-公开
标题翻译：具有化学机械抛光装置的可拆卸保持环的承载头
公开(公告)号：WO99033614A1
公开(公告)日：1999-07-08
申请号：PCT/US1998/023733
申请日：1998-11-06
IPC分类号： B24B37/30 , B24B37/32 , H01L21/304 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30 , B24B37/32
摘要： A carrier head for a chemical mechanical polishing apparatus includes a detachable retaining ring which may be used for centering the substrate during substrate loading.
摘要翻译：用于化学机械抛光装置的承载头包括可拆卸的保持环，其可以用于在衬底加载期间使衬底居中。

99. 发明申请

WO99001254A1 INTERNAL ABRASIVE MACHINE 审中-公开
标题翻译：内置磨床
公开(公告)号：WO99001254A1
公开(公告)日：1999-01-14
申请号：PCT/SE1998/001311
申请日：1998-07-03
IPC分类号： B24B5/10 , B24B19/06 , B24B41/06 , B24B53/053
CPC分类号： B24B53/053 , B24B5/10 , B24B19/06 , B24B41/06
摘要： An internal abrasive machine for inner surfaces of annular work pieces, and comprising a rotated driven spindle (16) carrying a tool (18), chucking equipment (14) for a work piece (15) to be machined, and feeding means (10, 11) for relative movement between work piece and tool, the motor (17) being arranged in a recess (7a) in a shaft (7) provided in a tubular cylindrical housing (3), having a longitudinal cylindrical inner space, having its longitudinal axis offset from the longitudinal housing axis, said shaft being angularly moveable in said space, the housing (3) being enclosed by a rotatably driven outer casing (5) firmly connected to a lid member (19), the chucking equipment (14) and the lip member (19) being arranged to retain a work piece (15) to be treated, and to cause this to rotate together with the lid member (19) about its axis, said shaft (7) when moved in said space displacing the tool (18) in a path allowing the tool surface to approach and contact the inner periphery of a chucked work piece.
摘要翻译：一种用于环形工件的内表面的内部研磨机，包括一个承载工具（18）的旋转从动轴（16），用于待加工的工件（15）的夹紧设备（14）和进给装置 11），用于工件和工具之间的相对移动，电动机（17）被布置在设置在管状圆柱形壳体（3）中的轴（7）中的凹部（7a）中，具有纵向圆柱形内部空间，其纵向所述轴可在所述空间中成角度地移动，所述壳体由可旋转地驱动的外壳（5）包围，所述外壳牢固地连接到盖构件（19），所述夹紧设备（14）和所述唇缘构件（19）被布置成保持待处理的工件（15），并且使其与盖构件（19）一起围绕其轴线旋转，所述轴（7）在所述空间移动时移动工具（18）在允许工具表面接近和接触内周边的路径中一个夹紧的工件。

100. 发明申请

WO1994009946A1 LENS BLOCKING AND CONSTANT CENTER THICKNESS SYSTEM 审中-公开
标题翻译：镜头闭锁和恒定中心厚度系统
公开(公告)号：WO1994009946A1
公开(公告)日：1994-05-11
申请号：PCT/US1993010011
申请日：1993-10-20
申请人： D.A.C., INC. , VERNON, Edward, W.
发明人： D.A.C., INC.
IPC分类号： B24B41/06
CPC分类号： B24B13/005
摘要： A base lens blocking system comprises a blocking member (200) formed of a flange (202) with a rearward directed shank (204) received in a collet (232) of a spindle (236), preferably, a dead length, recessed collet. The front surface of the flange contains a lens blank engaging region (208) which can be recessed. The lens blank is applied to the flat, front surface of the flange by means of a disc of adhesive tape (307), either a thermoplastic adhesive or a double-sided pressure sensitive adhesive tape or a very thin film of wax applied to a heated surface of the flange under a pressure from 5-20 pounds. A batch of blocked lens blanks can be cut with base curves and processed to finished lenses without measuring the center thickness of the base curves of each lens.
摘要翻译：基镜透镜遮挡系统包括由凸缘（202）形成的阻挡构件（200），其具有容纳在心轴（236）的夹头（232）中的向后指向的柄部（204），优选地，死角凹陷的夹头。凸缘的前表面包含可以凹进的透镜毛坯接合区域（208）。透镜毛坯通过粘合带（307）的盘，即热塑性粘合剂或双面压敏粘合带或非常薄的蜡施加到法兰的平坦的前表面上，该薄膜施加到加热的表面的法兰在5-20磅的压力下。可以用基本曲线切割一批封闭的镜片毛坯，并且在不测量每个镜片的基础曲线的中心厚度的情况下处理成完成的镜片。

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