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    • 1. 发明申请
    • HEAT SHIELD AND FILTER
    • 热屏蔽和过滤器
    • WO2012010359A1
    • 2012-01-26
    • PCT/EP2011/058850
    • 2011-05-30
    • SOLMATES B.V.BROEKMAAT, Joska JohannesDEKKERS, Jan MatthijnJANSSENS, Jan ArnaudVAN ZALK, Maarten
    • BROEKMAAT, Joska JohannesDEKKERS, Jan MatthijnJANSSENS, Jan ArnaudVAN ZALK, Maarten
    • C23C14/28C23C14/54
    • C23C14/28C23C14/54
    • The invention relates to a device for pulsed laser deposition, which device comprises: - a substrate mount with a substrate mounting surface for a substrate; - a target mount for a piece of target material arranged substantially parallel to and at a distance from the substrate mount; - a laser device for directing a laser beam on a piece of target material mounted on the target mount, such that a plasma plume of target material is generated and deposits on the substrate; and - a first shield arranged between the substrate mount and the target mount for shielding the target, wherein the first shield comprises at least one passage opening for passage of at least the generated plasma plume; and - a rotating wheel having at least one passage opening extending from one side of the wheel to the opposite side, wherein, seen in the direction perpendicular to shield surface with the passage opening, the wheel overlaps with the passage opening in the shield and the path of the passage opening in the wheel overlaps with the passage opening in the shield.
    • 本发明涉及一种用于脉冲激光沉积的器件,该器件包括: - 衬底安装件,具有用于衬底的衬底安装表面; - 用于基本上平行于基板安装件并且距离基板安装件一定距离的目标材料的目标安装件; - 激光装置,用于将激光束引导到安装在目标支架上的目标材料上,使得产生靶材料的等离子体羽毛并沉积在基板上; 以及 - 布置在所述基板安装件和所述目标安装座之间用于屏蔽所述目标的第一屏蔽件,其中所述第一屏蔽件包括用于至少所述产生的等离子体羽流通过的至少一个通道开口; 以及 - 具有至少一个通道开口的旋转轮,所述至少一个通道开口从所述车轮的一侧延伸到相对侧,其中,在与所述通道开口垂直于屏蔽表面的方向上看到,所述车轮与所述护罩中的通道开口重叠, 车轮中的通道开口的路径与护罩中的通道开口重叠。
    • 3. 发明申请
    • DEVICE FOR DEPOSITING A MATERIAL BY PULSED LASER DEPOSITION AND A METHOD FOR DEPOSITING A MATERIAL WITH THE DEVICE
    • 用于通过脉冲激光沉积沉积材料的装置和用于将材料沉积在材料上的方法
    • WO2015124589A1
    • 2015-08-27
    • PCT/EP2015/053356
    • 2015-02-18
    • SOLMATES B.V.
    • DEKKERS, Jan MatthijnJANSSENS, Jan Arnaud
    • C23C14/28C23C14/50
    • C23C14/28C23C14/50
    • The invention relates to a device for depositing a material by pulsed laser deposition, the device comprising: - a vacuum chamber; - at least one substrate holder with a substrate, arranged inside the vacuum chamber, the substrate having a first, second and third direction, each of the three directions perpendicular to each other, wherein the substrate is movable by the substrate holder in the first direction; - a target holder with a target, arranged inside the vacuum chamber and wherein the target extends over substantially the full length in the second direction of the substrate and parallel to the substrate; - at least one laser for irradiating the target, thereby creating a plasma of material that deposits on the substrate, wherein the position of incidence of the laser on the target is moveable parallel to the second direction of the substrate; and - a controller for controlling the movement of the substrate holder and the movement of the position of incidence of the laser on the target.
    • 本发明涉及一种用于通过脉冲激光沉积沉积材料的装置,该装置包括: - 真空室; - 至少一个具有衬底的衬底保持器,布置在所述真空室内,所述衬底具有第一,第二和第三方向,所述三个方向中的每一个垂直于彼此,其中所述衬底可以通过所述衬底保持器沿第一方向移动 ; - 具有靶的目标支架,布置在所述真空室内,并且其中所述目标在所述基板的所述第二方向上基本上全长延伸并平行于所述基板; - 用于照射所述靶的至少一个激光器,从而产生沉积在所述基板上的材料的等离子体,其中所述激光在所述靶上的入射位置可平行于所述基板的第二方向移动; 以及 - 控制器,用于控制衬底保持器的运动和激光在目标上的入射位置的移动。