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1. 发明申请

WO2010134741A3 CERIUM OXIDE PRODUCTION METHOD AND A SLURRY COMPOSITION COMPRISING THE SAME 审中-公开
标题翻译：氧化铈生产方法和包含其的浆料组合物
公开(公告)号：WO2010134741A3
公开(公告)日：2011-03-24
申请号：PCT/KR2010003131
申请日：2010-05-18
申请人： DONGJIN SEMICHEM CO LTD , KIM JONG-WON , LEE HO KYU , SHIN JONG CHUL , KONG HYUN GOO , PARK JONG DAI
发明人： KIM JONG-WON , LEE HO KYU , SHIN JONG CHUL , KONG HYUN GOO , PARK JONG DAI
IPC分类号： C01F17/00 , C09K3/14
CPC分类号： C09K3/1463 , C01F17/0043 , C01P2004/04 , C01P2004/30 , C09K3/1409
摘要： Disclosed are a production method for cerium oxide (ceria) powder and a slurry composition comprising the same. The slurry composition allows a high polishing rate and high polishing selectively and can reduce micro scratches in chemical-mechanical polishing. The production method for cerium oxide powder comprises the steps of: rapidly heating a cerium compound to between 700 and 1,000°C; calcining the cerium compound at between 700 and 1,000°C in order to produce calcined cerium oxide; and rapidly cooling the calcined cerium oxide to between 15 and 30°C. Here, the step of calcining the cerium compound is carried out for between 10 minutes and 2 hours and, in the rapid heating step, the cerium compound is heated at a heating rate of between 20 and 900°C/minute while, in the rapid cooling step, the calcined cerium oxide is preferably cooled at a cooling rate of between 20 and 400°C/minute.
摘要翻译：公开了一种氧化铈（二氧化铈）粉末的制造方法和包含该方法的浆料组合物。浆料组合物允许高抛光速率和高抛光选择性，并且可以减少化学机械抛光中的微小刮痕。氧化铈粉末的制造方法包括以下步骤：将铈化合物快速加热至700〜1000℃; 在700和1000℃之间煅烧铈化合物以产生煅烧的氧化铈; 并将煅烧的氧化铈快速冷却至15至30℃。这里，煅烧铈化合物的步骤进行10分钟至2小时，并且在快速加热步骤中，铈化合物以20-900℃/分钟的加热速率加热，而在快速加热冷却步骤中，煅烧的氧化铈优选以20-400℃/分钟的冷却速度冷却。

2. 发明申请

WO2010140788A3 CHEMICAL-MECHANICAL POLISHING SLURRY COMPOSITION COMPRISING NONIONIZED HEAT-ACTIVATED NANOCATALYST, AND POLISHING METHOD USING SAME 审中-公开
标题翻译：化学机械抛光浆料组合物，其包含非活化的活化纳米催化剂和使用其的抛光方法
公开(公告)号：WO2010140788A3
公开(公告)日：2011-03-31
申请号：PCT/KR2010003349
申请日：2010-05-27
申请人： DONGJIN SEMICHEM CO LTD , PARK JONG DAI , LIM JIN HYUK , CHOI JUNG MIN , KONG HYUN GOO , KIM JAE HYUN , PARK HYE JUNG
发明人： PARK JONG DAI , LIM JIN HYUK , CHOI JUNG MIN , KONG HYUN GOO , KIM JAE HYUN , PARK HYE JUNG
IPC分类号： C09K3/14 , H01L21/304
CPC分类号： H01L21/3212 , C09G1/02
摘要： The invention relates to a polishing slurry composition which comprises a nonionized heat-activated nanocatalyst, and which is useful for a chemical-mechanical planarization process, and to a polishing method using the composition. The chemical-mechanical polishing slurry composition comprises: a nonionized heat-activated nanocatalyst which discharges electrons and holes by the energy generated during a chemical-mechanical polishing process; an abrasive; and an oxidizing agent. The nonionized heat-activated nanocatalyst and the abrasive are different from each other. Preferably, the nonionized heat-activated nanocatalyst is a semiconductor substance which discharges, in an aqueous solution state, electrons and holes at a temperature of 10 to 100°C. Preferably, transition metal silicide selected from a group consisting of CrSi, MnSi, CoSi, ferrosilicon (FeSi) and a mixture thereof can be used as the nonionized heat-activated nanocatalyst. More preferably, a semiconductor substance such as nanoferrosilicon can be used as the nonionized heat-activated nanocatalyst. The content of the nonionized heat-activated nanocatalyst is 0.00001 to 0.1 wt % with respect to the total slurry composition.
摘要翻译：本发明涉及一种抛光浆料组合物，其包含非离子热活化纳米催化剂，并且其可用于化学机械平面化工艺，以及使用该组合物的抛光方法。化学机械抛光浆料组合物包括：非化学热活化纳米催化剂，其通过在化学机械抛光过程中产生的能量而排出电子和空穴; 研磨剂和氧化剂。非活性热活化纳米催化剂和研磨剂彼此不同。优选地，非离子化热活化纳米催化剂是在10〜100℃的温度下以水溶液状态排出电子和空穴的半导体物质。优选地，可以使用选自CrSi，MnSi，CoSi，硅铁（FeSi）及其混合物的过渡金属硅化物作为非离子化热活化纳米催化剂。更优选地，可以使用诸如纳米铁的半导体物质作为非离子化热活化纳米催化剂。非离子化热活化纳米催化剂的含量相对于总淤浆组成为0.00001〜0.1重量％。

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