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1. 发明申请

WO2007142397A9 GAS WIPING APPARATUS 审中-公开
标题翻译：气体擦拭装置
公开(公告)号：WO2007142397A9
公开(公告)日：2008-10-30
申请号：PCT/KR2006005650
申请日：2006-12-22
申请人： POSCO , OH KI-JANG , SHIN KI-TAE , PARK HYOUNG-KUK , SEON PAN-WOO , KIM SANG-JOON
发明人： OH KI-JANG , SHIN KI-TAE , PARK HYOUNG-KUK , SEON PAN-WOO , KIM SANG-JOON
IPC分类号： C23C2/16
CPC分类号： C23C2/20
摘要： A gas wiping apparatus is a type of equipment for coating a molten metal such as molten zinc onto a steel strip. In the gas wiping apparatus, a lip defines a gas outlet for ejecting a high- pressure gas to adjust a coating amount on a steel strip. A metal chip removing unit includes a metal chip remover disposed inside the lip to remove metal chips from the gas outlet and a drive unit associated with the metal chip remover to drive the metal chip remover along the gas outlet. A metal deposition prevention layer is formed on a surface of the lip around the gas outlet, the metal deposition prevention layer having a surface roughness up to 0.5µm. Thus, the gas wiping apparatus including the metal chip removing unit or the metal deposition prevention layer prevents the steel strip from defective coating caused by the metal chip. The gas wiping apparatus effectively removes zinc chips (metal chips) which are splashed from the surface of the steel strip and deposited on a gas outlet. Also, the gas wiping apparatus has a metal chip removing unit installed therein and prevents a lip around the gas outlet from con¬ tamination by metal chips. This eventually prevents non-uniform coating of the steel strip and shortening in useful life of the apparatus due to the metal chips.
摘要翻译：气体擦拭装置是一种用于将诸如熔融锌的熔融金属涂覆到钢带上的设备。在气体擦拭装置中，唇缘限定用于喷射高压气体的气体出口，以调节钢带上的涂覆量。金属屑去除单元包括设置在唇部内部以从气体出口除去金属屑的金属屑去除器和与金属屑去除器相关联的驱动单元，以沿着气体出口驱动金属屑去除器。金属沉积防止层形成在气体出口周围的唇缘的表面上，金属沉积防止层具有高达0.5μm的表面粗糙度。因此，包括金属屑去除单元或金属沉积防止层的气体擦拭装置防止钢带由金属屑引起的有缺陷的涂层。气体擦拭装置有效地除去从钢带表面飞溅并沉积在气体出口上的锌屑（金属屑）。此外，气体擦拭装置具有安装在其中的金属屑去除单元，并且防止气体出口周围的唇缘被金属碎片分离。这最终防止了钢带的不均匀涂覆，并且由于金属屑而缩短了设备的使用寿命。

2. 发明申请

WO2007142397A1 GAS WIPING APPARATUS 审中-公开
标题翻译：气体擦拭装置
公开(公告)号：WO2007142397A1
公开(公告)日：2007-12-13
申请号：PCT/KR2006/005650
申请日：2006-12-22
申请人： POSCO , OH, Ki-Jang , SHIN, Ki-Tae , PARK, Hyoung-Kuk , SEON, Pan-Woo , KIM, Sang-Joon
发明人： OH, Ki-Jang , SHIN, Ki-Tae , PARK, Hyoung-Kuk , SEON, Pan-Woo , KIM, Sang-Joon
IPC分类号： C23C2/16
CPC分类号： C23C2/20
摘要： A gas wiping apparatus is a type of equipment for coating a molten metal such as molten zinc onto a steel strip. In the gas wiping apparatus, a lip defines a gas outlet for ejecting a high- pressure gas to adjust a coating amount on a steel strip. A metal chip removing unit includes a metal chip remover disposed inside the lip to remove metal chips from the gas outlet and a drive unit associated with the metal chip remover to drive the metal chip remover along the gas outlet. A metal deposition prevention layer is formed on a surface of the lip around the gas outlet, the metal deposition prevention layer having a surface roughness up to 0.5D. Thus, the gas wiping apparatus including the metal chip removing unit or the metal deposition prevention layer prevents the steel strip from defective coating caused by the metal chip. The gas wiping apparatus effectively removes zinc chips (metal chips) which are splashed from the surface of the steel strip and deposited on a gas outlet. Also, the gas wiping apparatus has a metal chip removing unit installed therein and prevents a lip around the gas outlet from contamination by metal chips. This eventually prevents non-uniform coating of the steel strip and shortening in useful life of the apparatus due to the metal chips.
摘要翻译：气体擦拭装置是一种用于将诸如熔融锌的熔融金属涂覆到钢带上的设备。在气体擦拭装置中，唇缘限定用于喷射高压气体的气体出口，以调节钢带上的涂覆量。金属屑去除单元包括设置在唇部内部以从气体出口除去金属屑的金属屑去除器和与金属屑去除器相关联的驱动单元，以沿着气体出口驱动金属屑去除器。在气体出口周围的表面上形成金属沉积防止层，金属沉积防止层的表面粗糙度高达0.5D。因此，包括金属屑去除单元或金属沉积防止层的气体擦拭装置防止钢带由金属屑引起的有缺陷的涂层。气体擦拭装置有效地除去从钢带表面飞溅并沉积在气体出口上的锌屑（金属屑）。此外，气体擦拭装置具有安装在其中的金属屑去除单元，并且防止气体出口周围的唇缘被金属屑污染。这最终防止了钢带的不均匀涂覆，并且由于金属屑而缩短了设备的使用寿命。

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