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1. 发明申请

US20230140032A1 APPARATUS FOR THERMALLY PROCESSING A SUBSTRATE 有权
公开(公告)号：US20230140032A1
公开(公告)日：2023-05-04
申请号：US17555484
申请日：2021-12-19
申请人： United Semiconductor (Xiamen) Co., Ltd.
发明人： Xin Zhi He , WEN YI TAN
IPC分类号： H01L21/67 , H05B31/02
摘要： An apparatus for thermally processing a substrate includes a substrate support for holding the substrate and lamps disposed above the substrate support. The lamps are grouped into concentric lamp zones including a center zone comprised of a center lamp and peripheral lamps surrounding the center lamp. A center sleeve is coupled to the center lamp and peripheral sleeves are coupled to the peripheral lamps, respectively, for directing radiated heat to the substrate during thermal processing. The center sleeve has a higher surface roughness than that of the peripheral sleeves.

2. 发明申请

US20100187998A1 ABNORMAL DISCHARGE SUPPRESSING DEVICE FOR VACUUM APPARATUS 有权
标题翻译：用于真空装置的异常放电抑制装置
公开(公告)号：US20100187998A1
公开(公告)日：2010-07-29
申请号：US12670265
申请日：2008-07-14
申请人： Itsuo Yuzurihara , Atsushi Takayanagi
发明人： Itsuo Yuzurihara , Atsushi Takayanagi
IPC分类号： H05B31/02
CPC分类号： H05H1/46 , H01J37/32009 , H01J37/32935 , H01J37/3299 , H01J2237/0206
摘要： The present invention is directed to an apparatus for suppressing abnormal electrical discharge used for vacuum equipment which supplies power from a high-frequency power source to a plasma reaction chamber and executes a film formation process, provided with a power controller for controlling the high-frequency power source based on a deviation between a power command value and a power feedback value, and a cutoff controller for cutting off the power supply from the high-frequency power source to the plasma reaction chamber, based on a detection of the abnormal electrical discharge within the plasma reaction chamber. The cutoff controller exercises a first handling cutoff control and a second handling cutoff control, each having a different cutoff time. The first handling cutoff allows ions to remain in the plasma reaction chamber, and exercises the cutoff control over the high-frequency power source within a time duration which allows an arcing element to disappear. On the other hand, the second handling cutoff control exercises cutoff control over the high-frequency power source within a time range which allows abnormal arc ions to disappear. Accordingly, it is possible to supply power to plasma stably.
摘要翻译：本发明涉及一种用于抑制从高频电源向等离子体反应室供电的真空设备的异常放电的装置，并且执行成膜处理，该装置设置有用于控制高频电源的高频基于功率指令值和功率反馈值之间的偏差的电源，以及基于检测到高频电源对等离子体反应室的电源的切断控制器，等离子体反应室。截止控制器执行第一处理截止控制和第二处理截止控制，每个具有不同的截止时间。第一处理截止允许离子保留在等离子体反应室中，并且在允许电弧元件消失的持续时间内对高频电源进行切断控制。另一方面，第二处理截止控制在允许异常电弧离子消失的时间范围内对高频电源进行切断控制。因此，可以稳定地向等离子体供给电力。

3. 发明申请

US20120038277A1 POWER SUPPLY CONTROL DEVICE, PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD 有权
标题翻译：电源控制装置，等离子体处理装置和等离子体处理方法
公开(公告)号：US20120038277A1
公开(公告)日：2012-02-16
申请号：US13198356
申请日：2011-08-04
申请人： Hideo ETO , Nobuyasu Nishiyama , Makoto Saito , Keiji Suzuki
发明人： Hideo ETO , Nobuyasu Nishiyama , Makoto Saito , Keiji Suzuki
IPC分类号： H05B31/02 , H01L21/3065
CPC分类号： H01J37/32091 , H01J37/32183 , H01J37/32935
摘要： According to one embodiment, a power supply control device of a plasma processing device having a plasma generation unit which generates plasma in a process chamber. The power supply control device includes a radio frequency power supply, a storage unit, and a matching circuit. The radio frequency power supply supplies a power to the plasma generation unit. The storage unit stores matching information including a first matching value, a second process condition, and a third matching value. The first matching value corresponds to process information of a first process condition. The second matching value corresponds to process information of a second process condition. The third matching value corresponds to process information of a transient state where the first process condition is being switched to the second process condition. The matching circuit matches impedances based on the matching information.
摘要翻译：根据一个实施例，一种具有在处理室中产生等离子体的等离子体产生单元的等离子体处理装置的电源控制装置。电源控制装置包括射频电源，存储单元和匹配电路。射频电源为等离子体发生单元供电。存储单元存储包括第一匹配值，第二处理条件和第三匹配值的匹配信息。第一匹配值对应于第一处理条件的处理信息。第二匹配值对应于第二处理条件的处理信息。第三匹配值对应于将第一处理条件切换到第二处理条件的过渡状态的处理信息。匹配电路根据匹配信息匹配阻抗。

4. 发明授权

US06954036B2 Circuit having global feedback for promoting linear operation 失效
标题翻译：具有促进线性运行的全局反馈的电路
公开(公告)号：US06954036B2
公开(公告)日：2005-10-11
申请号：US10685781
申请日：2003-10-15
申请人： Mihail S. Moisin
发明人： Mihail S. Moisin
IPC分类号： H05B31/02 , H05B41/28 , H05B37/00
CPC分类号： H05B41/28 , Y10S315/05 , Y10S315/07
摘要： A resonant circuit includes a global feedback path from a load to diode elements and an LC notch filter at an input terminal to block energy from the feedback signal going back out on the line. The LC notch filter is tuned to about the frequency of the feedback signal.
摘要翻译：谐振电路包括从负载到二极管元件的全局反馈路径和在输入端子处的LC陷波滤波器，以阻止来自线路上的反馈信号的能量。 LC陷波滤波器调谐到反馈信号的频率。

5. 发明授权

US5955841A Ballast circuit for fluorescent lamp 失效
标题翻译：荧光灯镇流器电路
公开(公告)号：US5955841A
公开(公告)日：1999-09-21
申请号：US905165
申请日：1997-08-01
申请人： Mihail Moisin , Mark E. Martich
发明人： Mihail Moisin , Mark E. Martich
IPC分类号： H05B41/28 , H05B41/298 , H05B41/392 , H05B31/02
CPC分类号： H05B41/28 , H05B41/2985 , H05B41/2988 , H05B41/3925 , Y02B20/19 , Y10S315/04 , Y10S315/05 , Y10S315/07
摘要： An improved ballast circuit for use with a compact fluorescent lamp includes an EMI filter, a rectifier and voltage amplification stage, an active resonant circuit and power factor correction stage which is connected in parallel to a lamp load. The ballast circuit includes a feedback capacitor which provides a feedback path for a portion of the high frequency current to the rectifier and voltage amplification stage. The feedback capacitor of the improved ballast circuit reduces the non-linear characteristics of the diode, thus providing almost a linear load on the input power supply and therefore achieving an improved power factor, on the order of 0.95 or greater. The improved ballast circuit may also include a dimming stage which works with the active resonant circuit to vary the amount of power that is supplied to the lamp load. The dimming stage does not require the addition of parasitic active stages and thus provides a lamp with high electrical efficiency.
摘要翻译：用于紧凑型荧光灯的改进的镇流器电路包括EMI滤波器，整流器和电压放大级，与灯负载并联连接的有源谐振电路和功率因数校正级。镇流器电路包括反馈电容器，其为整流器和电压放大级的高频电流的一部分提供反馈路径。改进的镇流器电路的反馈电容器降低了二极管的非线性特性，从而在输入电源上几乎提供了线性负载，因此实现了0.95或更大量级的改善的功率因数。改进的镇流器电路还可以包括调光级，其与有源谐振电路一起工作以改变供应给灯负载的功率量。调光阶段不需要添加寄生有源级，从而提供具有高电效率的灯。

6. 发明授权

US09113539B2 Radiation source 有权
标题翻译：辐射源
公开(公告)号：US09113539B2
公开(公告)日：2015-08-18
申请号：US13597754
申请日：2012-08-29
申请人： Hendrikus Gijsbertus Schimmel , Johan Frederik Dijksman , Dzmitry Labetski
发明人： Hendrikus Gijsbertus Schimmel , Johan Frederik Dijksman , Dzmitry Labetski
IPC分类号： G01N21/01 , G03B27/52 , G03B27/54 , H05B31/02 , H05G2/00 , G03F7/20
CPC分类号： H05G2/005 , G03F7/70033 , G03F7/70883 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.
摘要翻译：辐射源包括储存器，喷嘴，激光器和正透镜。储存器构造成保持一定体积的燃料。与储存器流体连接的喷嘴被配置成将沿着轨迹的燃料流引导到等离子体形成位置。激光器被配置为在等离子体形成位置处的流处引导激光辐射，以在使用中产生辐射产生等离子体。正透镜装置被配置为将燃料流的轨迹的至少势能扩散聚焦到等离子体形成位置，该透镜包括电场产生元件和/或磁场产生元件。

7. 发明申请

US20120235066A1 DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE 有权
标题翻译：用于EUV光源的驱动激光输送系统
公开(公告)号：US20120235066A1
公开(公告)日：2012-09-20
申请号：US13050198
申请日：2011-03-17
申请人： Alexander I. Ershov
发明人： Alexander I. Ershov
IPC分类号： G01J3/10 , H05B31/02
CPC分类号： H05G2/008 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/10061 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
摘要： An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.
摘要翻译：本文公开了一种EUV光源，其可以包括产生目标材料液滴流的液滴发生器，第一光学增益介质，在第一光束路径上放大光，而没有提供种子激光器输出到第一光束路径的种子激光器，第二光学增益介质光学增益介质，在第二光束路径上放大光，而没有提供种子激光器输出到第二光束路径的种子激光器;以及光束组合器，其组合来自第一光束路径和第二光束路径的光，以与靶材料液滴相互作用 EUV发光等离子体。

8. 发明申请

US20100320916A1 Plasma Generator and Discharge Device and Reactor Using Plasma Generator 有权
标题翻译：等离子发生器和等离子发生器的放电装置和电抗器
公开(公告)号：US20100320916A1
公开(公告)日：2010-12-23
申请号：US12812589
申请日：2009-01-19
申请人： Takashige Yagi , Hiroshi Makino , Shingo Sato
发明人： Takashige Yagi , Hiroshi Makino , Shingo Sato
IPC分类号： H05B31/02 , H01J61/28 , H05B37/00
CPC分类号： B01J19/088 , B01J2219/0869 , H05H1/2406 , H05H2001/2418
摘要： A plasma generator has a first member 2 containing a dielectric material, and an electrode group composed of a plurality of electrodes and including a first assembly 6 partially including a plurality of electrodes and a second assembly 7 partially including a plurality of electrodes. In accordance with an AC voltage, the first assembly 6 generates a plasma in a first space 23 contacting the first member 2. In accordance with a DC voltage, the second assembly 7 generates an electric field in a second space 24 contacting the first member 2 and communicating with the first space 23. At least one or more electrodes of a portion of the first assembly 6 and at least one or more electrodes of a portion of the second assembly 7 are provided on the surface of or in the inside of the first member 2.
摘要翻译：等离子体发生器具有包含介电材料的第一构件2和由多个电极组成的电极组，并且包括部分地包括多个电极的第一组件6和部分地包括多个电极的第二组件7。根据AC电压，第一组件6在与第一构件2接触的第一空间23中产生等离子体。根据DC电压，第二组件7在接触第一构件2的第二空间24中产生电场并且与第一空间23连通。第一组件6的一部分的至少一个或多个电极和第二组件7的一部分的至少一个或多个电极设置在第一组件6的第一面会员2。

9. 发明授权

US07407617B2 Free radical polymerization method having reduced premature termination, apparatus for performing the method, and product formed thereby 有权
标题翻译：具有减少过早终止的自由基聚合方法，用于进行该方法的装置以及由此形成的产品
公开(公告)号：US07407617B2
公开(公告)日：2008-08-05
申请号：US11332302
申请日：2006-01-17
申请人： Jeffrey K. Okamitsu , A. David P. Harbourne , Sonny Jõnsson , Rong Bao
发明人： Jeffrey K. Okamitsu , A. David P. Harbourne , Sonny Jõnsson , Rong Bao
IPC分类号： C08F2/46 , B29C35/08 , G21G1/12 , H05B31/00 , H05B31/02 , H05B33/04 , H05B33/00
CPC分类号： B01J19/126 , B01J19/123 , B01J19/124 , B01J2219/0877 , C08F2/48 , C08F216/1416 , C08F220/18 , C08F222/1006 , C08F222/40 , C08F299/04
摘要： A method of polymerizing by a free radical polymerization mechanism, product formed thereby, and apparatus for performing this method, are disclosed. The composition to be polymerized by the free radical polymerization mechanism is irradiated by a substantially constant radiation, the radiation being substantially without pulsation. The use of the substantially constant radiation without pulsation reduces premature termination of the polymerization. The substantially constant radiation can be the output of a lamp powered by a constant current, direct current power supply.
摘要翻译：公开了一种通过自由基聚合机理聚合的方法，由此形成的产物和用于实施该方法的装置。通过自由基聚合机理聚合的组合物被基本恒定的辐射照射，辐射基本上没有脉动。无脉动地使用基本上恒定的辐射减少聚合的过早终止。基本恒定的辐射可以是由恒定电流的直流电源供电的灯的输出。

10. 发明申请

US20130026918A1 Self-Igniting Long Arc Plasma Torch 有权
标题翻译：自熄长弧等离子火炬
公开(公告)号：US20130026918A1
公开(公告)日：2013-01-31
申请号：US13193927
申请日：2011-07-29
申请人： Alexander Filippovich Rutberg , Philipp Grigorevich Rutberg , Sergei Dmitrievich Popov , Valentin Anatolevich Spodobin
发明人： Alexander Filippovich Rutberg , Philipp Grigorevich Rutberg , Sergei Dmitrievich Popov , Valentin Anatolevich Spodobin
IPC分类号： H05B31/02
CPC分类号： H05B31/20 , H05B31/52 , H05H1/44 , H05H2001/2456 , H05H2001/3431 , H05H2001/4695
摘要： A plasma torch is formed from a hollow electrode forming a first gap to an isolated plasma tube, the isolated plasma tube forming a second gap with a plasma outlet tube having electrically common plasma tubes which terminate into a plasma outlet. The first gap and second gap of the isolated plasma tubes are fed by a source of plasma gas such that when a voltage is applied across the electrodes, plasmas initially form across the first plasma gap and second plasma gap. The formed plasmas spread laterally until the plasmas are formed entirely from electrode to electrode and self-sustaining. Plasma gasses which are fed to the plasma torch can be metered on both sides of the electrodes to steer the plasma arc attachment axially over the extent of the hollow electrodes, thereby reducing surface wear and increasing electrode life.
摘要翻译：等离子体焰炬由形成与隔离等离子体管的第一间隙的中空电极形成，隔离等离子体管与等离子体出口管形成第二间隙，该等离子体出口管具有终端于等离子体出口的电气公共等离子体管。隔离等离子体管的第一间隙和第二间隙由等离子体气体源馈送，使得当跨越电极施加电压时，等离子体最初形成在第一等离子体间隙和第二等离子体间隙之间。形成的等离子体横向扩展，直到等离子体完全由电极到电极形成并且自维持。馈送到等离子体焰炬的等离子体气体可以在电极的两侧进行计量，以将等离子体电弧附件轴向引导到中空电极的范围上，从而减少表面磨损和增加电极寿命。

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