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1. 发明授权

US5728879A Bisguanidine salts and a method for releasing a base using the same salts 失效
标题翻译：双胍盐和使用相同盐释放碱的方法
公开(公告)号：US5728879A
公开(公告)日：1998-03-17
申请号：US829814
申请日：1997-03-25
申请人： Jiro Tsukahara , Kiyoshi Takeuchi , Hideaki Satoh , Shun-ichi Ishikawa , Keizo Ogawa , Tomomi Ishino
发明人： Jiro Tsukahara , Kiyoshi Takeuchi , Hideaki Satoh , Shun-ichi Ishikawa , Keizo Ogawa , Tomomi Ishino
IPC分类号： B41M5/323 , B41M5/30 , C07C279/12 , C07C317/44 , C07D233/48 , C07D295/12 , C07D295/215 , C09K3/00 , G03C1/43 , G03C1/498 , G03C1/61 , G03C8/40 , C07C277/00 , C07D241/00
CPC分类号： C07D295/215 , B41M5/30 , C07C279/12 , C07C317/44 , C07D233/48 , G03C1/43 , G03C1/49845 , G03C1/615 , G03C8/4086
摘要： A bisguanidine salt selected from the group consisting of a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis(1,3-diethylguanyl)ethylenediamine, a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis(1,3-diisopropylguanyl)ethylenediamine, a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis-(imidazoline-2-yl)ethylenediamine, a 4-(phenylsulfonyl)-phenylsulfonylacetic acid salt of 1,4-bis(1,3-diisopropylguanyl)piperazine, a 4-(phenylsulfonyl)phenylsulfonylacetic acid salt of 1,4-bis(1,3-diethylguanyl)piperazine, a 4-(4-methylphenylsulfonyl)phenylsulfonylacetic acid salt of N,N'-bis(1,3-diethylguanyl)ethylenediamine and a 4-(4-ethylphenylsulfonyl)phenylsulfonylacetic acid salt of 1,4-bis(1,3-diethylguanyl)piperazine which can be used as a base precursor which is rapidly decomposed by heat treatment at 120.degree. C. or less to release a base.
摘要翻译：选自N，N'-双（1,3-二乙基鸟苷基）乙二胺的4-（苯基磺酰基）苯基磺酰基乙酸盐，N，N'-双（1,3-二异丙基脒基）乙二胺，N，N'-双 - （咪唑啉-2-基）乙二胺的4-（苯基磺酰基）苯磺酰基乙酸盐，1,4- 哌嗪，1,4-双（1,3-二乙基鸟嘌呤）哌嗪的4-（苯基磺酰基）苯基磺酰基乙酸盐，N，N'的4-（4-甲基苯基磺酰基）苯基磺酰基乙酸盐，（1,3-二乙基鸟苷基）乙二胺和1,4-双（1,3-二乙基鸟苷基）哌嗪的4-（4-乙基苯基磺酰基）苯磺酰基乙酸盐，其可用作通过热快速分解的基础前体在120℃或更低温度下处理以释放碱。

2. 发明授权

US5679494A Heat-sensitive recording material comprising a diazonium salt, a coupler and a benzotriazole compound 失效
标题翻译：包含重氮盐，偶合剂和苯并三唑化合物的热敏记录材料
公开(公告)号：US5679494A
公开(公告)日：1997-10-21
申请号：US389652
申请日：1995-02-16
申请人： Kazumori Minami , Ken Iwakura
发明人： Kazumori Minami , Ken Iwakura
IPC分类号： G03C1/52 , G03C1/61 , G03C1/72 , G03F7/016
CPC分类号： G03C1/52 , G03C1/61
摘要： A heat-sensitive recording material comprising a support having thereon a heat-sensitive recording layer and a protective layer in this sequence, said heat-sensitive recording material containing a compound represented by formula (1), (2), (3), or (4): ##STR1##
摘要翻译：一种热敏记录材料，包括其上具有热敏记录层和保护层的载体，所述热敏记录材料含有式（1），（2），（3）或（4）：（1）（2）（3）

3. 发明授权

US5518860A Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound 失效
标题翻译：含有羟基烷基取代的吡啶化合物的正性醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5518860A
公开(公告)日：1996-05-21
申请号：US463887
申请日：1995-06-05
申请人： Satoshi Niikura , Jun Koshiyama , Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Satoshi Niikura , Jun Koshiyama , Tetsuya Kato , Kouichi Takahashi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/022 , G03F7/085 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226
摘要： A positive-working photoresist composition comprising a cresol novolac resin as the film-forming agent and a quinonediazido group-containing compound as the photosensitizing agent is admixed with a limited amount of a hydroxyalkyl-substituted pyridine compound so that great improvements can be obtained in the adhesive bonding of the resist layer to the substrate surface and in the stability of the composition by storage still without the problem due to the sublimed material from the resist layer during the patterning process.
摘要翻译：将包含作为成膜剂的甲酚酚醛清漆树脂和含有醌二叠氮基的化合物作为光敏剂的正性光致抗蚀剂组合物与有限量的羟烷基取代的吡啶化合物混合，从而可以在通过存储，抗蚀剂层与基材表面的粘合粘合和组合物的稳定性，在图案化工艺期间由于来自抗蚀剂层的升华材料而没有问题。

4. 发明授权

US5434031A Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive 失效
标题翻译：含有特定羟基化合物添加剂的正性萘醌二叠氮光致抗蚀剂组合物
公开(公告)号：US5434031A
公开(公告)日：1995-07-18
申请号：US153100
申请日：1993-11-17
申请人： Taku Nakao , Remi Numata , Kousuke Doi , Nobuo Tokutake , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Taku Nakao , Remi Numata , Kousuke Doi , Nobuo Tokutake , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03C1/61 , G03F7/022 , G03F7/023
CPC分类号： G03F7/0226 , G03C1/61
摘要： Disclosed is a positive-working photoresist composition suitable for use in the photolithographic fine patterning work in the manufacture of electronic devices such as VLSIs. The composition comprises, in addition to an alkali-soluble novolac resin as a film-forming ingredient and an esterification product of naphthoquinone-1,2-diazide sulfonic acid as a photosensitive ingredient, a unique additive compound which is an alkyl or aralkyl ester of 2-hydroxy benzoic acid, such as benzyl salicylate, or a phenol compound substituted at least one alkyl group such as 2-tert-butyl-4-methyl phenol. By virtue of the addition of this unique additive, the inventive photoresist composition exhibits an excellent performance of suppressing the standing wave effect in addition to the excellent photosensitivity, resolving power and depth of focusing in the patterning exposure to light as well as good heat resistance of the patterned resist layer.
摘要翻译：公开了一种适用于制造诸如VLSI的电子设备的光刻精细图案化工作中的正性光致抗蚀剂组合物。除了作为成膜成分的碱溶性酚醛清漆树脂和萘醌-1,2-二叠氮磺酸作为感光成分的酯化产物之外，组合物还包含作为感光成分的独特的添加剂化合物，其为烷基或芳烷基酯 2-羟基苯甲酸，如水杨酸苄酯，或取代至少一个烷基的酚化合物如2-叔丁基-4-甲基苯酚。通过添加这种独特的添加剂，本发明的光致抗蚀剂组合物除了在图案曝光中具有优异的光敏性，分辨能力和聚焦深度以及良好的耐热性外，还表现出优异的抑制驻波效应的性能图案化的抗蚀剂层。

5. 发明授权

US5336583A Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone 失效
标题翻译：使用乳酸乙酯和2-庚酮的混合溶剂的正醌二叠氮化物抗蚀剂组合物
公开(公告)号：US5336583A
公开(公告)日：1994-08-09
申请号：US161440
申请日：1993-12-06
申请人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
发明人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
IPC分类号： G03F7/022 , G03F7/004 , G03F7/039 , G03F7/22 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0048 , G03F7/0226
摘要： A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of ethyl lactate and at least one solvent selected from the group consisting of (a) n-amyl acetate and (b) 2-heptanone in a weight ratio of 5:95 to 80:20, which composition has a good coating properties and provides an improved profile and a large depth of focus.
摘要翻译：一种正极抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和乳酸乙酯与至少一种选自（a）乙酸正戊酯和（b）2- 庚酮，重量比为5:95至80:20，该组合物具有良好的涂层性能并提供改进的轮廓和较大的聚焦深度。

6. 发明授权

US5314783A Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound 失效
标题翻译：对于含有苯并三唑紫外线吸收化合物的365nm波长的光敏醌二叠氮化物和具有高吸收性的树脂组合物
公开(公告)号：US5314783A
公开(公告)日：1994-05-24
申请号：US970031
申请日：1992-11-02
申请人： Shigeru Koibuchi , Asao Isobe , Michiaki Hashimoto
发明人： Shigeru Koibuchi , Asao Isobe , Michiaki Hashimoto
IPC分类号： G03C1/00 , G03C1/72 , G03F7/004 , G03F7/022 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226
摘要： A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.
摘要翻译：一种感光性树脂组合物，其包含（A）碱性水溶性溶液型酚醛清漆树脂，（B）通过使多羟基化合物与1,2-萘醌 - （2） - 叠氮基-5（或4） - 磺酰氯反应而得到的光敏剂，和（C）2-（2'-羟基-5'-甲基苯基） - 苯并三唑等紫外线吸收剂对波长365nm的光具有很强的吸收性，适用于制造半导体元件等。

7. 发明授权

US5093229A Heat developable light-sensitive material containing an amidine based precursor 失效
标题翻译：含有脒基前体的热显影感光材料
公开(公告)号：US5093229A
公开(公告)日：1992-03-03
申请号：US236491
申请日：1988-08-25
申请人： Yoshiharu Yabuki , Hiroyuki Hirai
发明人： Yoshiharu Yabuki , Hiroyuki Hirai
IPC分类号： G03C8/40 , G03C1/498 , G03C1/61
CPC分类号： G03C1/49845 , G03C1/615 , Y10S430/156
摘要： A heat developable light-sensitive material comprising a support having thereon at least one layer containing a base precursor, a lgiht-sensitive silver halide, a binder, and a dye-providing substance which produces or releases a diffusible dye in correspondence or countercorrespondence to the reduction of the light-sensitive silver halide to silver at an elevated temperature, the base precursor comprising a salt of a carboxylic acid and a diacidic, triacidic or tetraacidic organic base comprising a hydrocarbon group or a heterocyclic group substituted with 2 to 4 amidine groups represents by formula (I-2): ##STR1## wherein R.sup.15, R.sup.16 and R.sup.17 are as defined in the specification. The heat developable light-sensitive material has excellent age preservability and provides a high sensitivity and low-fog image.
摘要翻译：一种可热显影的感光材料，其包括其上具有至少一层的载体，所述至少一层含有碱性前体，敏感的卤化银，粘合剂和提供染料的物质，其产生或释放对应于或对应于包含羧基酸的碱前体和包含被2〜4个脒基取代的烃基或杂环基的二酸，三元酸或四元酸有机碱的碱前体代表的基础前体代表（I-2）：其中R 15，R 16和R 17如说明书中所定义。可热显影的感光材料具有优异的保存时间，并提供高灵敏度和低雾图像。

8. 发明授权

US4824759A Method for forming an image 失效
标题翻译：图像形成方法
公开(公告)号：US4824759A
公开(公告)日：1989-04-25
申请号：US827139
申请日：1986-02-07
申请人： Kozo Sato , Hiroshi Kitaguchi , Masashi Takeuchi , Masaaki Tsukase , Masatoshi Kato
发明人： Kozo Sato , Hiroshi Kitaguchi , Masashi Takeuchi , Masaaki Tsukase , Masatoshi Kato
IPC分类号： G03C7/00 , G03C1/498 , G03C1/61 , G03C8/40 , G03C1/06 , G03C
CPC分类号： G03C1/49845 , G03C1/61 , Y10S430/156 , Y10S430/158 , Y10S430/161
摘要： A method for forming an image, which comprises heating a light-sensitive material in the presence of a compound capable of forming a 2-mercaptobenzazole ring by a ring closing reaction when heated.In accordance with the method of the present invention, development is stopped at an appropriate time of development whereby an image having a high maximum density and low fog is obtained.A heat-developable light-sensitive material containing the compound is also disclosed.
摘要翻译：一种形成图像的方法，其包括在加热时通过闭环反应在能够形成2-巯基吲唑环的化合物的存在下加热感光材料。根据本发明的方法，在合适的显影时间停止显影，从而获得具有高的最大浓度和低雾度的图像。还公开了含有该化合物的可热显影的感光材料。

9. 发明授权

US4652512A Heat and light-sensitive recording materials with dialonium compound, coupler, and heat fusible amidine or diamidine compound 失效
标题翻译：热敏和光敏记录材料与二盐化合物，成色剂和热熔脒或脒化合物
公开(公告)号：US4652512A
公开(公告)日：1987-03-24
申请号：US823561
申请日：1986-01-29
申请人： Katsuhiko Ishida , Masaharu Nojima , Tosaku Okamoto
发明人： Katsuhiko Ishida , Masaharu Nojima , Tosaku Okamoto
IPC分类号： G03C1/52 , G03C1/61 , G03C1/60 , G01D9/00
CPC分类号： G03C1/52 , G03C1/615
摘要： This invention provides a heat-sensitive recording material comprising a substrate and a heat-sensitive recording layer which is formed over the substrate and which contains a diazonium salt, a coupler and at least one of specific heat-fusible basic amidine and diamidine compounds in which the nitrogen atom(s) of ##STR1## moiety(moieties) has(have) a substituent and the nitrogen atom(s) or ##STR2## moiety(moieties) has(have) at least one substituent, the substituent being independently selected from the group consisting of phenyl, naphthyl, phenyl-C.sub.1 -C.sub.4 alkyl and naphthyl-C.sub.1 -C.sub.4 alkyl, each optionally substituted with C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, phenyloxy, nitro or halogen, and in which amidine compounds are other than formamidines. The heat-sensitive recording material is especially excellent in storage stability.
摘要翻译：本发明提供了一种热敏记录材料，其包括基材和热敏记录层，其形成在该基材上并且包含重氮盐，成色剂和至少一种比热溶性碱性脒和脒化合物，其中部分（部分）的氮原子具有（具有）取代基并且氮原子或部分（部分）具有（具有）至少一个取代基，所述取代基独立地选自苯基，萘基，苯基-C 1 -C 4烷基和萘基-C 1 -C 4烷基，各自任选被C 1 -C 4烷基，C 1 -C 4烷氧基，苯氧基，硝基或卤素取代，其中脒化合物不同于甲脒热敏记录材料的储存稳定性特别优异。

10. 发明授权

US4584256A Diazotype materials which can be developed by heat and contain an activator precursor having 2-carboxy carboxamide group releasing a strong base during heating 失效
标题翻译：可以通过加热显影并含有具有2-羧基羧酰胺基团的活化剂前体在加热过程中释放强碱的二嗪型材料
公开(公告)号：US4584256A
公开(公告)日：1986-04-22
申请号：US674347
申请日：1984-11-21
申请人： Claude Ceintrey , Michel Crochemore
发明人： Claude Ceintrey , Michel Crochemore
IPC分类号： G03C20060101 , G03C1/52 , G03C1/61 , G03C7/14 , G03C1/60
CPC分类号： G03C1/615 , G03C1/61
摘要： The invention relates to new diazotype materials of which the sensitive layer contains, as a base generator, a compound comprising a basic part and an acid part, the acid part being a 2-carboxycarboxamide group and the basic part consisting of an alkali metal cation or alkaline earth metal cation or a tetraalkylammonium cation.These diazotype materials develop rapidly and possess an excellent resistance to ageing.
摘要翻译： PCT No.PCT / FR81 / 00151 Sec。 371日期1982年7月30日 102（e）1982年7月30日PCT PCT 1991年11月19日PCT公布。出版物WO82 / 01944 日本1982年6月10日。本发明涉及新的二氮类材料，其敏感层含有作为碱产生剂的包含碱性部分和酸性部分的化合物，酸部分为2-羧基羧酰胺基团和碱性部分由碱金属阳离子或碱土金属阳离子或四烷基铵阳离子组成。这些二嗪类材料发展迅速，具有优异的耐老化性。

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