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    • 2. 发明申请
    • PROCESS FOR PREPARING WATERBORNE DISPERSION
    • US20220098353A1
    • 2022-03-31
    • US17426799
    • 2020-01-29
    • COVESTRO (NETHERLANDS) B.V.
    • Michael Arnoldus Jacobus SCHELLEKENSJohannes Hendrikus DE BONTGerardus Cornelis OVERBEEK
    • C08F293/00C08F4/80C09D153/00C09J153/00C09D133/04C09J133/04C08F2/38
    • The present invention relates to a process for preparing a waterborne dispersion comprising amphiphilic block copolymer comprising at least blocks [A] and [B], and polymer P comprising ethylenically unsaturated monomer(s) different from monomer(s) (i) (monomer(s) (iii)), whereby the amount of block copolymer is higher than 0.5 and lower than 50 wt. %, based on the total weight of monomers used to prepare the block copolymer and polymer P, wherein the process comprises at least the following steps: (I) subjecting at least ethylenically unsaturated monomer(s) (i) bearing acid-functional groups to a free-radical polymerization process in an aqueous medium in the presence of a free radical initiator and a cobalt chelate complex to obtain block [A], (II) subjecting at least ethylenically unsaturated monomer(s) (ii) different from monomer(s) (i) to an emulsion polymerization process in aqueous medium in the presence of block [A] and a free radical initiator, whereby the amount of ethylenically unsaturated monomer(s) (ii) in block [B] is at least 70 wt. %, relative to the total weight amount of monomers used to prepare block [B] and whereby the ethylenically unsaturated monomer(s) (ii) is (are) selected from the group consisting of methacrylic acid esters, dialkyl esters of itaconic acid, methacrylonitrile, α-methyl styrene and any mixture thereof, (III) subjecting at least ethylenically unsaturated monomer(s) (iii) different from monomer(s) (i) to an emulsion polymerization process in aqueous medium at a pH in the range of from 5 to 10 in the presence of the amphiphilic block copolymer to obtain the block copolymer-polymer P, and the process further comprises deactivating the cobalt chelate complex, which remains from step (I), prior to and/or during step (II).
    • 10. 发明授权
    • Process for the preparation of (co) polymers of conjugated dienes in the presence of a catalytic system comprising a bis-imine complex of cobalt
    • US09617360B2
    • 2017-04-11
    • US14443093
    • 2013-12-19
    • Versalis S.P.A.
    • Giovanni RicciAnna SommazziGiuseppe LeoneFrancesco MasiAldo Boglia
    • C08F4/80C08F36/00C08F36/06C08F136/06C08F4/70
    • C08F36/06C08F4/7096C08F136/06C08F4/7006
    • Process for the preparation of (co) polymers of conjugated dienes which comprises polymerizing at least one conjugated diene in the presence of a catalytic system comprising at least one bis-imine complex of cobalt having general formula (I) wherein: —n is 0 or 1; —Y represents a group —CR′R″— wherein R′ and R″, equal to or different from each other, represent a hydrogen atom; or a linear or branched C1-C20, preferably C1-C15, alkyl group; or a divalent aromatic group optionally substituted; —R1 and R2, equal to or different from each other, represent a hydrogen atom; or they are selected from a linear or branched Ci-C2o/preferably C1-C15, alkyl group optionally halogenated, cycloalkyl groups optionally substituted; or R1 and R2 can be optionally bound to each other to form, together with the other atoms to which they are bound, a cycle containing from 4 to 6 carbon atoms, saturated, unsaturated, or aromatic, optionally substituted with linear or branched C1-C20, preferably C1-C15, alkyl groups, said cycle optionally containing heteroatoms such as, for example, oxygen, sulfur, nitrogen, silicon, phosphorous, selenium; R3 and R4, equal to or different from each other, represent a hydrogen atom; or they are selected from a linear or branched Ci-C20, preferably C1-C15, alkyl groups optionally halogenated, cycloalkyl groups optionally substituted, aryl groups optionally substituted; or R2 and R4 can be optionally bound to each other to form, together with the other atoms to which they are bound, a cycle containing from 3 to 6 carbon atoms, saturated, unsaturated, or aromatic, optionally substituted with linear or branched Ci-C2o, preferably C1-C15 alkyl groups, said cycle optionally containing other heteroatoms such as, for example, oxygen, sulfur, nitrogen, silicon, phosphorous, selenium; or R1 and R3 can be optionally bound to each other to form, together with the other atoms to which they are bound, a cycle containing from 3 to 6 carbon atoms, saturated, unsaturated, or aromatic, optionally substituted with linear or branched C1-C20, preferably C1-C15, alkyl groups, said cycle optionally containing other heteroatoms such as, for example, oxygen, sulfur, nitrogen, silicon, phosphorous, selenium; X1 and X2, equal to or different from each other, represent a halogen atom such as, for example, chlorine, bromine, iodine; or they are selected from linear or branched C1-C20 preferably C1-C15, alkyl groups, —OCOR5 groups or —OR3 groups wherein R5 is selected from linear or branched C1-C20, preferably C1-C15, alkyl groups.