专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06882704B2 Radiation source for generating extreme ultraviolet radiation 有权
标题翻译：用于产生极紫外线辐射的辐射源
公开(公告)号：US06882704B2
公开(公告)日：2005-04-19
申请号：US10697579
申请日：2003-10-30
申请人： Guido Schriever , Kai Gaebel , Uwe Stamm
发明人： Guido Schriever , Kai Gaebel , Uwe Stamm
IPC分类号： G21K5/04 , H05G2/00 , H05H35/00
CPC分类号： H05G2/003
摘要： The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation, particularly for photolithography exposure processes. The object of the invention is to find a novel possibility for realizing radiation sources for generating extreme ultraviolet (EUV) radiation which permits a uniform basic construction for ensuring beam characteristics that are reproducible over the long term and in which the source is conceived so as to be flexible with respect to specific applications. This object is met according to the invention in that any plasma generation unit is provided for introducing high energy input supplied in a pulsed manner in a vacuum chamber, and the radiation generated from the plasma is monitored by an energy monitor unit which measures the pulse energy of the emitted radiation and by a radiation diagnosis unit which detects the radiation characteristics to obtain result data for influencing the excitation conditions for the plasma and to influence the parameters of the plasma generation in an application-specific manner by means of the main control unit.
摘要翻译：本发明涉及用于产生极紫外（EUV）辐射的辐射源，特别是用于光刻曝光工艺。本发明的目的是找到一种实现用于产生极紫外（EUV）辐射的辐射源的新型可能性，该辐射源允许均匀的基本结构，以确保长期可再现的光束特性，并且其中构想源，以便对具体应用灵活。根据本发明满足本发明的目的在于提供任何等离子体产生单元，用于将以脉冲方式提供的高能量输入引入真空室，并且由等离子体产生的辐射由能量监测单元监测，该能量监测单元测量脉冲能量以及辐射诊断单元，该辐射诊断单元检测辐射特性以获得用于影响等离子体的激发条件的结果数据，并通过主控制单元以应用特定的方式影响等离子体产生的参数。

IPRDB

热门服务

关于我们

友情链接

联系方式