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    • 1. 发明授权
    • Electron microscope
    • 电子显微镜
    • US06472663B2
    • 2002-10-29
    • US09182356
    • 1998-10-29
    • Isao NagaokiHiroyuki KobayashiTakafumi Yotsuji
    • Isao NagaokiHiroyuki KobayashiTakafumi Yotsuji
    • H01J3126
    • G01N23/04H01J37/26
    • Relationship among an exciting current of each lens of an irradiation lens system including at least two stages of irradiation lenses and an electron beam aperture, an irradiation electron beam density on a sample and an area of the sample surface irradiated with an electron beam is stored in a form of a table or equations, and an exciting condition of each of the lenses of the irradiation lens system is retrieved from the relationship and set the irradiation lens system to the retrieved condition, for example, when the enlarging magnification is changed under a condition of keeping the irradiation electron beam density at a constant value. Further, trails of a region of the sample surface irradiated with the electron beam is displayed on a display unit.
    • 包括至少两级照射透镜和电子束孔径的照射透镜系统的每个透镜的激发电流与样品上的照射电子束密度以及用电子束照射的样品表面的面积之间的关系被存储在 从该关系中检索照射透镜系统的每个透镜的表格或方程式的形式以及激光条件,并将照射透镜系统设置为检索条件,例如当放大倍率在条件 将照射电子束密度保持在恒定值。 此外,在显示单元上显示用电子束照射的样品表面的区域的迹线。