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1. 发明授权

US07119348B2 Charged beam writing apparatus and writing method 失效
标题翻译：带电波束写入装置和写入方式
公开(公告)号：US07119348B2
公开(公告)日：2006-10-10
申请号：US10972710
申请日：2004-10-26
申请人： Masato Saito
发明人： Masato Saito
IPC分类号： H01J37/08 , G12G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3023 , H01J2237/21 , H01J2237/30455 , H01J2237/31776
摘要： A charged beam writing apparatus is disclosed, which comprises a shaped beam forming unit which shapes a charged beam radiated from a charged beam source into a beam of a desired shape by using at least two shaping masks each having a shaping aperture to form a shaped beam, a figure dividing unit which divides a contour portion of a pattern to be formed on an object layer into a plurality of figure portions having a predetermined area, a writing unit which writes the figure portions of the contour portion by using a shaped beam of the predetermined area, and a focus control unit which performs focusing of the beam radiated from the charged beam source, by using a shaped beam having the same area as that of the shaped beam which has the predetermined area and is used in writing of the figure portions of the contour portion.
摘要翻译：公开了一种带电波束写入装置，其包括成形波束形成单元，该成形波束形成单元通过使用至少两个具有成形孔以形成成形梁的成形掩模，将从带电波束源辐射的带电波束成形为所需形状的波束，图形分割单元，其将要形成在对象层上的图案的轮廓部分划分成具有预定区域的多个图形部分;写入单元，其通过使用所述轮廓部分的成形光束来写入轮廓部分的图形部分; 以及聚焦控制单元，其通过使用具有与具有预定区域的成形光束相同的面积的成形光束并且在图形部分的书写中使用从被充电的光束源辐射的光束进行聚焦的聚焦控制单元的轮廓部分。

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