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    • 2. 发明授权
    • Ice detection sensor
    • 冰检测传感器
    • US5886256A
    • 1999-03-23
    • US45960
    • 1998-03-18
    • Russell DeAnna
    • Russell DeAnna
    • B64D15/20G01N2/00
    • B64D15/20
    • An ice detection sensor for placement on a surface of a body subject to ig includes a Pyrex glass or silicon block for disposal on the body surface, the block having a cavity therein, a diaphragm bonded to the silicon block and covering the cavity, a drive electrode disposed in the cavity and operable to deflect the diaphragm upon application of voltage between the drive electrode and the diaphragm, and a second electrode operable to detect motion of the diaphragm. The diaphragm is movable by the drive electrode when there is water covering the diaphragm and when the diaphragm is not covered and the diaphragm is not movable by the drive electrode when there is ice covering the diaphragm. The second electrode is adapted to detect movement and non-movement of the diaphragm, whereby to detect whether ice covers the diaphragm.
    • 用于放置在经受结冰的身体表面上的冰检测传感器包括用于在身体表面处置的Pyrex玻璃或硅块,其中具有腔的块,与硅块结合并覆盖空腔的光阑,驱动 电极,其设置在所述腔中并且可操作以在施加所述驱动电极和所述隔膜之间的电压时偏转所述隔膜;以及第二电极,其可操作以检测所述隔膜的运动。 当覆盖隔膜的水分和膜片未被覆盖时,隔膜可以通过驱动电极移动,并且当覆盖隔膜的冰块时,隔膜不能被驱动电极移动。 第二电极适于检测隔膜的运动和不运动,从而检测冰盖是否覆盖隔膜。
    • 3. 发明授权
    • Method and apparatus for inspecting slight defects in a photomask pattern
    • 用于检查光掩模图案中的轻微缺陷的方法和装置
    • US5812259A
    • 1998-09-22
    • US748898
    • 1996-11-15
    • Hisakazu YoshinoAkihiko SekineToru TojoMitsuo Tabata
    • Hisakazu YoshinoAkihiko SekineToru TojoMitsuo Tabata
    • G01N21/956G03F1/26G03F1/32G03F1/84G01N2/00
    • G03F1/26G01N21/956G03F1/84G03F1/32
    • A photomask defect inspection method is provided by which defects of pin holes with the diameter equal to or less than 0.35 .mu.m can be detected with certainty. According to the inspection method, a pattern whose image is projected onto an imaging position by the use of illumination light (P1) for exposure consists of light transmitting portions (41) formed on a glass base (2) and light intercepting portions (42) which transmit part of the illumination light (P1) in such a way that a phase of the part of the illumination light (P1) passing through the light intercepting portions (42) is delayed with respect to a phase of the illumination light (P1) passing through the light transmitting portions (41). Slight defects in the photomask pattern are detected on the basis of a signal obtained by illuminating the pattern with inspection light having an inspection wavelength in which the transmittance (T) of the light intercepting portions (42) is defined in the following formula on the basis of a signal detection limit (Thr). When the signal detection limit (Thr) of an inspection circuit is calculated on the supposition that a signal level of the inspection light passing through the light transmitting portions (41) is equal to 1, the relational expression is T.gtoreq.(Thr-0.01).sup.1/1,8.
    • 提供一种光掩模缺陷检查方法,可以确定地检测直径等于或小于0.35μm的销孔的缺陷。 根据检查方法,通过使用用于曝光的照明光(P1)将图像投影到成像位置的图案由形成在玻璃基座(2)和遮光部分(42)上的透光部分(41)组成, 其以照明光(P1)的相位延迟照明光(P1)的通过遮光部(42)的一部分的相位的方式透射部分照明光(P1) 穿过透光部分(41)。 基于通过用具有检测波长的检查光照射图案获得的信号来检测光掩模图案中的轻微缺陷,其中遮光部分(42)的透射率(T)在下列公式中被定义: 的信号检测限(Thr)。 当考虑通过透光部(41)的检查光的信号电平等于1来计算检查电路的信号检测限(Thr)时,关系式为T> / =(Thr- 0.01)1 / 1.8。