会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明授权
    • Soluble polyarylene ether sulfones
    • 可溶性聚亚烷基硫醚
    • US5126427A
    • 1992-06-30
    • US665492
    • 1991-03-06
    • Rudolf PfaendnerThomas KainmullerKurt HoffmannFriedrich StockingerAndreas Kramer
    • Rudolf PfaendnerThomas KainmullerKurt HoffmannFriedrich StockingerAndreas Kramer
    • C08G75/00C08G75/23C08J5/18C08L63/00C09D181/00C09D181/06
    • C08G75/23C08L63/00
    • Polyarylene ether sulfones which have a reduced viscosity of 0.1 to 2.0 dl/g, measured at 25.degree. C. in a 1% solution in N-methylpyrrolidone (NMP), and which contain, based on the total number of structural units present in the polyarylene ether sulfone resin, 99-1 mol % of a recurring structural unit of formula I ##STR1## and 1-99 mol % of a recurring structural unit of formula II--O--Ar.sub.2 --O--Ar.sub.1 -- (II)wherein the aromatic rings in the structural unit of formula I are unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, Ar.sub.1 is a radical of formula IIIa-IIIc ##STR2## wherein a is 0 or 1, ##STR3## which radical is unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, and Ar.sub.2 is a radical of formula IVa-IVe ##STR4## wherein b is 0 or 1 ##STR5## wherein c is 0 or 1 ##STR6## wherein Z is --CO--, --SO.sub.2 --, --SO--, --S--, --O--, ##STR7## wherein R is methyl or phenyl, which radical is unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, are soluble in customary organic solvents and can be processed from the solution to films or incorporated in other matrix resins.
    • 在25℃下在1%N-甲基吡咯烷酮(NMP)溶液中测定的具有0.1至2.0dl / g的比浓粘度的聚亚芳基醚砜,并且基于存在于 聚亚芳基醚砜树脂,99-1摩尔%的式I的重复结构单元(I)和1-99mol%的式II-O-Ar-O-Ar1-(II)的重复结构单元, 其中式I的结构单元中的芳环是未取代的或被一个或多个C 1 -C 4烷基,C 1 -C 4烷氧基或卤素原子取代,Ar 1是式IIIa-IIIc(IIIa)的基团,其中a是 0或1,(IIIb)或(IIIc),该基团是未取代的或被一个或多个C 1 -C 4烷基,C 1 -C 4烷氧基或卤素原子取代,Ar 2是式IVa-IVe基团 (IVa)其中b为0或1(IVb)(IVc)(IVc)其中c为0或1(IVe)其中Z为-CO-, - SO2-,-SO-,-S-,-O-, 其中R是甲基或苯基,该基团是未被取代的或被一个或多个C 1 -C 4烷基,C 1 -C 4烷氧基或卤原子取代的,可溶于常规有机溶剂中,并且可以从溶液中加工成膜或并入 其他基体树脂。