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    • 7. 发明申请
    • RADIATION-CURABLE COMPOSITION BY ANIONIC POLYMERIZATION
    • US20220089804A1
    • 2022-03-24
    • US17544389
    • 2021-12-07
    • Henkel AG & Co. KGaA
    • Kenji Ito
    • C08F283/00C08K5/31C09J151/08C09D151/08
    • The present invention refers to a radiation-curable composition comprising or consisting of A) at least one photo-base generator, which can generate a super base; B) (macro)monomers which are able to undergo an anionic polymerization via Michael addition comprising or consisting of B1) at least one (macro)monomer having at least one Michael donor group and at least one Michael acceptor group; and/or B2) at least one (macro)monomer having at least two Michael donor groups and at least one (macro)monomer having at least two Michael acceptor groups; C) optionally at least one polyethylenimine; D) optionally at least one additive. Furthermore, the present invention pertains to an adhesive, sealant or coating obtainable by radiation-curing the radiation-curable composition according to the present invention and a method of radiation-curing the radiation-curable composition according to the present invention, comprising the steps: providing a radiation-curable composition according to the present invention and exposing the radiation-curable composition to radiation, for 10 seconds to 5 minutes. The radiation-curable compositions of the present invention do not require that irradiation is continuously applied until the curing is completed. Once the curing of the compositions is initiated, they are able to continue to cure in parts of the compositions which are in the dark/shadow.