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    • 1. 发明授权
    • Organic anti-reflective coating polymer and preparation thereof
    • 有机抗反射涂层聚合物及其制备方法
    • US06548613B2
    • 2003-04-15
    • US09747364
    • 2000-12-22
    • Min-Ho JungSung-Eun HongJae-Chang JungGeun-Su LeeKi-Ho Baik
    • Min-Ho JungSung-Eun HongJae-Chang JungGeun-Su LeeKi-Ho Baik
    • C08F22018
    • C08F220/34G03F7/091
    • The present invention provides a polymer that can be used as an anti-refelctive coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm), ArF (193 nm), or F2 (157 nm) laser as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching. Therefore, the polymer of the present invention can be used to produce a stable ultrafine pattern that is suitable in manufacturing of 64 M, 256 M, 1 G, 4 G and 16 G DRAM semiconductor devices. Moreover, the ARC of the present invention significantly improves the production yield, of such semiconductor devices.
    • 本发明提供可用作抗反射涂层(ARC)聚合物的聚合物,包含其的ARC组合物,其制备方法及其使用方法。 本发明的聚合物在亚微光刻工艺中特别有用,例如使用KrF(248nm),ArF(193nm)或F2(157nm)激光作为光源。 本发明的聚合物包括能够吸收在亚微光刻工艺中使用的波长的光的发色团。 因此,本发明的ARC显着地减少或防止了光的反射和由衍射光和/或反射光引起的CD改变的问题。 本发明的ARC还显着地减少或消除驻波效应和反射性切口。 因此,本发明的聚合物可用于制备适合于制造64M,256M,1G,4G和16G DRAM半导体器件的稳定超细晶格。 此外,本发明的ARC显着提高了这种半导体器件的生产成本。
    • 3. 发明授权
    • Cyclohexylalkyl (meth) acrylate ester-based resin composition
    • (甲基)丙烯酸环己基烷基酯类树脂组合物
    • US06686413B2
    • 2004-02-03
    • US09938653
    • 2001-08-27
    • Kazuhiko NakamuraYoshiyuki YokotaKunio TakahashiMasaya Yoshida
    • Kazuhiko NakamuraYoshiyuki YokotaKunio TakahashiMasaya Yoshida
    • C08F22018
    • C08F20/18C07C69/54C07C2601/14
    • The present invention provides a novel (meth)acrylate ester-based resin composition which, for example, exhibits various good properties such as weather resistance, heat resistance, water resistance, acid resistance, alkali resistance, warm water resistance, impact resistance, flexibility, processability, adhesion, hardness, and elongation when being used for various uses such as coating agents (e.g. for films, plastics, glass, paper, fibers, leather), pressure sensitive adhesives, and adhesives in addition to various paints (e.g. paints for building exteriors, paints for building materials, paints for metals, paints for plastics, heavy anticorrosive paints, waterproof paints for roofs). This resin composition comprises a (meth)acrylate ester-based polymer and an aqueous medium, wherein the (meth)acrylate ester-based polymer is obtained by a process including the step of polymerizing a monomer component including a polymerizable unsaturated monomer as an essential component wherein the polymerizable unsaturated monomer is a cyclohexylalkyl ester of (meth)acrylic acid wherein the cyclohexyl group may have a substituent, and wherein the (meth)acrylate ester-based polymer is dispersed in the aqueous medium.
    • 本发明提供一种新型(甲基)丙烯酸酯类树脂组合物,其例如具有耐候性,耐热性,耐水性,耐酸性,耐碱性,耐温水性,耐冲击性,柔软性, 用于各种用途的加工性,粘合性,硬度和伸长率,例如涂料(例如用于薄膜,塑料,玻璃,纸,纤维,皮革),压敏粘合剂和粘合剂以及各种涂料(例如建筑用涂料 外观,建筑材料涂料,金属涂料,塑料涂料,重防腐涂料,屋顶防水涂料)。 该(甲基)丙烯酸酯系聚合物和水性介质,其中,(甲基)丙烯酸酯系聚合物是通过以下工序得到的:(A) 其中所述可聚合不饱和单体是(甲基)丙烯酸的环己基烷基酯,其中环己基可以具有取代基,并且其中(甲基)丙烯酸酯类聚合物分散在水性介质中。