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1. 发明申请

US20230121024A1 MULTIFUNCTION SECURITY ELEMENT 有权
公开(公告)号：US20230121024A1
公开(公告)日：2023-04-20
申请号：US17596406
申请日：2020-06-30
申请人： FASE S.R.L.
发明人： Orazio AUDINO , Francesco BERARDI , Geremino CAMMISA , Luca CIMATTI
IPC分类号： B42D25/328 , B42D25/351 , B42D25/373 , B42D25/387 , B42D25/445 , B42D25/364 , B42D25/369 , B42D25/47
摘要： A security element includes a first transparent film, on which a holographic layer is formed having a holographic surface structure, a reflective layer arranged in contact with the holographic layer having a pattern of non-transparent regions and transparent regions, a color changing layer, and a photoactive layer having dark regions and transparent regions. In first regions, parts of the non-transparent regions of the reflective layer are not overlapped by the dark regions of the photoactive layer. In second regions, the color changing layer is backed by the dark regions of the photoactive layer. In third regions, the transparent regions of the photoactive layer are at least partly in register with the transparent regions of the reflective layer so that the third regions are continuous when passing from patterns outside the non-transparent regions of the reflective layer to patterns outside the dark regions of the photoactive layer.

2. 发明申请

US20220388329A1 AUTHENTICATION OF METALLIC OBJECTS 有权
公开(公告)号：US20220388329A1
公开(公告)日：2022-12-08
申请号：US17819334
申请日：2022-08-12
申请人： SECURITY MATTERS LTD. , SOREQ NUCLEAR RESEARCH CENTER
发明人： Yair GROF , Tzemah KISLEV , Nadav YORAN , Yaara BONDY , Haggai ALON
IPC分类号： B42D25/373 , B42D25/445 , B42D25/47 , C09D7/61 , C09D7/63 , C09D5/02 , C09D133/04 , C09K11/00 , C09K11/08 , G01N23/083 , B42D25/378 , G01N23/223
摘要： The present invention provides an anti-counterfeit marking technique for verifying authenticity of objects using x-rays fluorescence (XRF) analysis.

3. 发明申请

US20220184992A1 OPTICAL ANTI-COUNTERFEITING ELEMENT AND MANUFACTURING METHOD THEREOF 有权
公开(公告)号：US20220184992A1
公开(公告)日：2022-06-16
申请号：US17594579
申请日：2020-04-03
申请人： ZHONGCHAO SPECIAL SECURITY TECHNOLOGY CO., LTD , CHINA BANKNOTE PRINTING AND MINTING CORP.
发明人： Weiwei Zhang , Kai Sun , Jun Zhu
IPC分类号： B42D25/373 , B42D25/324 , B42D25/328 , B42D25/351 , B42D25/45 , B42D25/445 , G02B5/28 , G02B5/18
摘要： The disclose provides an optical anti-counterfeiting element and a manufacturing method of the optical anti-counterfeiting element, the optical anti-counterfeiting element includes: a substrate, the substrate has a first surface and a second surface which are opposite to each other; and an interference color layer located on the first surface of the substrate, the interference color layer is located in a non-hollow area of the optical anti-counterfeiting element and is not located in a hollow area, the interference color layer is a Fabry-Perot filter structure, an absorbing layer of the Fabry-Perot filter structure is in contact with the substrate, and a material of the absorbing layer is an alloy.

4. 发明授权

US11059319B2 Security devices and methods of manufacturing image patterns for security devices 有权
公开(公告)号：US11059319B2
公开(公告)日：2021-07-13
申请号：US16093132
申请日：2017-04-19
申请人： DE LA RUE INTERNATIONAL LIMITED
发明人： Adam Lister
IPC分类号： B42D25/00 , B42D25/23 , B42D25/24 , B42D25/29 , B42D25/324 , B42D25/342 , B42D25/351 , B42D25/373 , B42D25/41 , B42D25/415 , B42D25/42 , B42D25/435 , B42D25/445 , B42D25/355
摘要： A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.

5. 发明授权

US10703126B2 Optical device that provides flicker-like optical effects 有权
公开(公告)号：US10703126B2
公开(公告)日：2020-07-07
申请号：US15993327
申请日：2018-05-30
申请人： Crane & Co., Inc.
发明人： Benjamin E. Bleiman , Samuel M. Cape , Paul F. Cote , Jonathan D. Gosnell , Gregory R. Jordan , Scott K. Palm
IPC分类号： B42D25/324 , B42D25/00 , B42D25/378 , B42D25/445 , B42D25/45 , B42D25/355 , B42D25/29
摘要： An optical security device suitable for securing or authenticating high security or high value articles of manufacture when affixed thereto, is provided. The inventive security device produces optically variable effects when viewed from varying points of view and is made up of a microstructured layer having image icon elements that have at least one pigmented material. The microstructured layer is arranged relative to an arrangement of focusing elements such that at least portions of the image icon elements are observable through at least portions of the arrangement of focusing elements, thereby providing at least one synthetic image that demonstrates a color-transition effect as points of view from which the optical security device is viewed are changed. In one particular embodiment, the optical security device comprises (i) an arrangement of image icon elements having a first contrasting material pattern and a second contrasting material pattern; (ii) a fixed arrangement of focusing elements disposed relative to the arrangement of image icon elements such that the image icon elements project a synthetic image when viewed through the focusing elements, and having a first fixed org-pattern (as defined herein) that is mismatched from the at least one of the patterns of the first and second contrasting materials; where the synthetic image is a projection of both the first and second contrasting material when viewed from at least one angle.

6. 发明授权

US10583682B2 Security structure 有权
公开(公告)号：US10583682B2
公开(公告)日：2020-03-10
申请号：US14415011
申请日：2013-07-12
申请人： ARJOWIGGINS SECURITY
发明人： Philippe Dietemann
IPC分类号： B42D25/373 , B42D25/328 , B42D25/405 , B42D25/445
摘要： The present disclosure relates to a security structure including a non-opaque, preferably transparent, substrate. The substrate supports metal elements forming a revealing pattern. The metal is thin enough for the metal to be non-opaque. A lacquer is placed at least partially, preferably exactly, on top of the metal elements. The lacquer may be in contact with the metal elements.

7. 发明申请

US20190291498A1 METHODS OF MANUFACTURING AN IMAGE PATTERN FOR A SECURITY DEVICE 审中-公开
公开(公告)号：US20190291498A1
公开(公告)日：2019-09-26
申请号：US16310354
申请日：2017-05-17
申请人： DE LA RUE INTERNATIONAL LIMITED
发明人： Adam LISTER
IPC分类号： B42D25/445 , B42D25/45 , B42D25/24 , B42D25/29 , B42D25/324 , B42D25/342 , B42D25/373 , B42D25/41
摘要： A method of manufacturing an image pattern for a security device is disclosed. The method comprises: (a) providing a metallised substrate comprising a substrate material having a first metal layer thereon on a first surface of the substrate material, the first metal layer being soluble in a first etchant substance; (b) applying a first resist layer to the first metal layer, the first resist layer comprising a resist material; (c) bringing the first resist layer into contact with a relief structure comprising a support carrying one or more protrusions thereon, the one or more protrusions each extending away from the support to a distal tip, whereupon at least one of the protrusion(s) extends into the first resist layer; (d) while the first resist layer and the relief structure are in contact, controlling the metallised substrate and/or the relief structure to achieve relative movement between the metallised substrate and at least the tip of the at least one of the protrusion(s) along a movement direction, such that the at least one of the protrusion(s) extending into the first resist layer expels a corresponding at least one portion of the resist material from a corresponding at least one region of the metallised substrate; (e) separating the first resist layer from the relief structure such that the at least one of the protrusion(s) is removed from the first resist layer, leaving the resist material remaining on the metallised substrate outside the at least one region, thereby forming a pattern of one or more first pattern elements in which the resist material is present and one or more second pattern elements, corresponding to the at least one region, in which the resist material is substantially absent; and (f) applying the first etchant substance to the metallised substrate whereupon the second pattern elements of the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image pattern.

8. 发明授权

US10252562B2 Security elements and methods of their manufacture 有权
公开(公告)号：US10252562B2
公开(公告)日：2019-04-09
申请号：US15111691
申请日：2015-01-15
申请人： De La Rue International Limited
发明人： Brian William Holmes
IPC分类号： B42D25/328 , B42D25/324 , B42D25/355 , B42D25/364 , B42D25/445 , B42D25/378 , B41M3/14 , B42D25/369
摘要： A security element including substrate on which is disposed: in first area, a first optically variable device including a diffractive or reflective relief structure and reflection enhancing material following contours of relief structure; and, in second area, a second optically variable device including an iridescent amplitude interference material. First optically variable device is constituted by a plurality of sub-areas arranged in cyclically repeating sequence along predetermined direction of the security element, the plurality of sub-areas collectively forming first area. Relief parameters of diffractive or reflective relief structure vary from one sub-area to next within each repeat cycle whereby, at any viewing angle, each sub-area within any repeat cycle exhibits different diffractive color or reflected intensity from those of other sub-areas within same repeat cycle, so, when device is tilted, different diffractive colors or reflected intensities appear to move from one sub-area to next within each repeat cycle along predetermined direction.

9. 发明申请

US20180326775A1 Process for Producing a Multilayer Body, and Multilayer Body 审中-公开
公开(公告)号：US20180326775A1
公开(公告)日：2018-11-15
申请号：US15949565
申请日：2018-04-10
申请人： OVD Kinegram AG , Leonhard Kurz Stiftung & Co.KG
发明人： Rene Staub , Ludwig Brehm , Juri Attner , Michael Hoffmann , Peter Seeholzer
IPC分类号： B42D25/328 , B42D25/445 , B42D25/45 , B42D25/36 , B42D25/425 , B41M7/00
CPC分类号： B42D25/328 , B41M7/0045 , B42D25/36 , B42D25/425 , B42D25/445 , B42D25/45
摘要： In a process for producing a multilayer body, an HRI layer made of a material having a high refractive index is applied to at least part of the surface area of a substrate. At least one partial region of the HRI layer is then physically removed from the substrate again by treatment with an alkaline solution. Additionally specified is a multilayer body that can be obtained by such a process.

10. 发明授权

US10029505B2 Method for producing a multilayer element, and multilayer element 有权
公开(公告)号：US10029505B2
公开(公告)日：2018-07-24
申请号：US14900646
申请日：2014-06-26
申请人： LEONHARD KURZ Stiftung & Co. KG
发明人： Ludwig Brehm , Tibor Mannsfeld , Juri Attner , Thorsten Schaller
IPC分类号： B42D25/30 , B42D25/41 , B42D25/351 , B42D25/42 , B42D25/45 , B42D25/324 , B42D25/328 , B42D25/387 , B42D25/445 , B42D25/378 , B42D25/373 , B42D25/405 , B05D7/00
摘要： The invention relates to a method for producing a multilayer body (100, 200, 300, 400), as well as a multilayer body (100, 200, 300, 400) produced thereby. A single- or multi-layered first decorative ply (3) is applied to a carrier ply with a first (11) and a second (12) side. A metal layer (5) is applied to the side of the first decorative ply (3) facing away from the carrier ply and structured such that the metal layer (5) is provided with a first layer thickness in one or more first zones (8) and is provided with a second layer thickness different from the first layer thickness in one or more second zones (9), wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply (7) is applied to the side of the metal layer (5) facing away from the first decorative ply (3) and structured using the metal layer (5) as mask such that the first (3) or second (7) decorative ply is at least partially removed in the first (8) or second (9) zones.

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