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1. 发明授权

US06746315B2 Ball spinner and polish apparatus 失效
标题翻译：球旋转器和抛光装置
公开(公告)号：US06746315B2
公开(公告)日：2004-06-08
申请号：US10188189
申请日：2002-07-02
申请人： Edward O. Klukos
发明人： Edward O. Klukos
IPC分类号： B24B2102
CPC分类号： A63D5/10 , B24B11/02
摘要： An apparatus is provided for polishing balls that comprises a cradle that is supported for rotation about a first axis. The cradle is shaped to support a spherical object and includes a ball spinner positioned and adapted to spin the spherical object in the cradle about a second axis that is oriented at an angle to the first axis. The apparatus also comprises a first drive operably connected to the cradle for rotating the cradle about the first axis at a first speed of rotation, and a second drive connected to the ball spinner to spin the spherical object about the second axis at a second speed of rotation. Also provided is a method for polishing spherical objects, comprising the steps of: a) providing a cradle apparatus having at least two wheels for supporting and spinning a spherical object; b) providing a first drive and a second drive; c) providing a polishing apparatus having a tape holder and a tape support; d) rotating the wheels in the same direction about a first axis using the first drive; e) rotating the wheels in the same direction about a second axis using a second drive; and f) pressing the tape against the spherical object while the spherical object is spinning.
摘要翻译：提供了一种用于抛光球的装置，其包括被支撑用于围绕第一轴线旋转的支架。托架被成形为支撑球形物体并且包括球形旋转器，其定位并适于围绕围绕第一轴线成一角度定向的第二轴线旋转托架中的球形物体。该装置还包括可操作地连接到支架的第一驱动器，用于以第一旋转速度围绕第一轴线旋转托架，以及连接到球旋转器的第二驱动器，以第二速度的第二速度旋转球形物体回转。还提供了一种用于抛光球形物体的方法，包括以下步骤：a）提供具有至少两个用于支撑和旋转球形物体的轮的托架装置; b）提供第一驱动器和第二驱动器; c）提供具有带支架和带支架的抛光装置; d）使用第一驱动器绕相对于第一轴的相同方向旋转车轮; e）使用第二驱动器绕相对于第二轴的相同方向旋转车轮; 以及f）当球形物体旋转时，将带压在球形物体上。

2. 发明授权

US06743085B2 Rotating back up abrasive disc assembly 失效
标题翻译：旋转后备研磨盘组件
公开(公告)号：US06743085B2
公开(公告)日：2004-06-01
申请号：US09991513
申请日：2001-11-20
申请人： Peter J. Fritz , Robert G. Saunier , Aleck Block
发明人： Peter J. Fritz , Robert G. Saunier , Aleck Block
IPC分类号： B24B2102
CPC分类号： B24B23/02 , B24B45/006
摘要： A holder for an abrasive disc allows for a quick manual change of the abrasive disc. The holder including an uncoupling mechanism that in turn includes a handle comprising a pin and an adjacent hub comprising a partial annular channel. The handle and hub have a limited rotational engagement wherein the pin travels in the channel. When an operator desires to replace an abrasive disc, the operator grasps the handle with one hand and rotates the disc, face plate, and hub, together as a unit, with the other hand. This counter-rotation breaks the tight attachment of the disc on the shaft of the finishing tool, so that disc can be easily unthreaded from the shaft.
摘要翻译：用于研磨盘的支架允许快速手动地更换研磨盘。所述保持器包括非耦合机构，所述非耦合机构又包括包括销的手柄和包括部分环形通道的相邻轮毂。手柄和轮毂具有有限的旋转接合，其中销在通道中行进。当操作者希望更换磨盘时，操作员用一只手抓住把手，另一只手将盘，面板和轮毂一起作为一个单元旋转。这种反向旋转破坏了圆盘在精加工工具的轴上的紧密连接，使得圆盘可以容易地从轴上脱开。

3. 发明授权

US06398630B1 Planarizing machine containing web-format polishing pad and web-format polishing pads 有权
标题翻译：平版机包含网状抛光垫和网格式抛光垫
公开(公告)号：US06398630B1
公开(公告)日：2002-06-04
申请号：US09594398
申请日：2000-06-15
申请人： David W. Carlson
发明人： David W. Carlson
IPC分类号： B24B2102
CPC分类号： B24B37/24 , B24B37/20 , B24B37/245 , B24B37/26 , B24D3/28 , B24D18/009
摘要： A web-format polishing pad for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies, and methods for making and using such a web-format pad. In one aspect of the invention, a web-format polishing pad for planarizing a microelectronic substrate is made by slicing a cylindrical body of pad material along a cutting line that is at least substantially parallel to a longitudinal centerline of the body and at a radial depth inward from an exterior surface of the body. For example, a web of pad material can be sliced from the body by rotating the cylindrical body about the longitudinal centerline and pressing a cutting element against the rotating cylindrical body along the cutting line. The cutting element can be a knife with a sharp edge positioned at the cutting line and a face extending along a tangent of the cylindrical body. The cutting element can be moved radially inwardly as the body rotates to continuously peel a seamless web of pad material having a desired thickness from the cylindrical pad body. The web of pad material accordingly may be used on a web-format planarizing machine for planarizing microelectronic substrate assemblies.
摘要翻译：用于微电子基板组件的机械和/或化学机械平面化的网格式抛光垫，以及用于制造和使用这种网格格式垫的方法。在本发明的一个方面，用于平坦化微电子衬底的网状抛光垫是通过沿着至少基本上平行于主体的纵向中心线的切割线切割衬垫材料的圆柱体并且在径向深度从身体的外表面向内。例如，可以通过围绕纵向中心线旋转圆柱体并沿着切割线将切割元件压靠在旋转的圆柱体上来从主体切片。切割元件可以是具有定位在切割线处的锋利边缘的刀，以及沿着圆柱体的切线延伸的面。当主体旋转时，切割元件可以径向向内移动，以从圆柱形衬垫主体连续地剥离具有期望厚度的衬垫材料的无缝网。因此，衬垫材料的网可以用于网格式平面化机器上，用于平坦化微电子衬底组件。

4. 发明授权

US06220946B1 Active polishing of rotatable article surfaces 失效
标题翻译：可旋转物品表面的主动抛光
公开(公告)号：US06220946B1
公开(公告)日：2001-04-24
申请号：US09240311
申请日：1999-01-29
申请人： Philip D. Arnold
发明人： Philip D. Arnold
IPC分类号： B24B2102
CPC分类号： B24B5/42 , B24B19/12 , B24B21/02 , B24B27/0084
摘要： A belt polishing machine has a moving endless abrasive coated polishing belt that wraps around and travels over a substantial portion of a circumferential surface of a rotatable workpiece for finishing the surface. A drive pulley drives the polishing belt in a continuous path at a desired surface speed over the circumferential surface of the workpiece while the workpiece is being rotated at a desired rotational speed. Guide pulleys direct the polishing belt around and into engagement with a substantial portion of the circumferential surface and may supply tension to the polishing belt during finishing operations. Separate tensioning pulleys may be provided. A coolant feed applies coolant against the polishing belt for separating and carrying away removed material from the belt and cleaning the abrasive for a subsequent pass. A backup shoe may be provided to selectively apply additional pressure through the belt upon portions of the polished surfaces to improve cylindricity. In-process gaging of the surfaces during the polishing process may also be provided.
摘要翻译：带式抛光机具有移动的环形研磨涂层抛光带，其包裹并在可旋转工件的圆周表面的大部分上行进以完成表面。当工件以期望的转速旋转时，驱动滑轮以期望的表面速度在工件的圆周表面上以连续的路径驱动抛光带。引导滑轮将抛光带引导到周边表面的大部分并与其结合，并且可以在整理操作期间向抛光带提供张力。可以提供单独的张紧滑轮。冷却剂进料将冷却剂施加到抛光带上，用于从带中分离和携带去除的材料并清洁磨料以用于随后的通过。可以提供备用鞋，以选择性地在抛光表面的一部分上通过带施加附加压力以改善圆柱度。还可以提供在抛光过程中表面的过程测量。

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