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    • 5. 发明授权
    • Method of decontaminating a contaminated fluid by using photocatalytic
particles
    • 通过使用光催化颗粒去污染污染的流体的方法
    • US5294315A
    • 1994-03-15
    • US944198
    • 1992-10-09
    • Gerald CooperMatthew A. Ratcliff
    • Gerald CooperMatthew A. Ratcliff
    • A62D3/00A62D3/15A62D3/17A62D3/176A62D101/24A62D101/43B01J8/02B01J19/12B01J35/00B01J35/06C02F1/32C02F1/72C07B63/00
    • A62D3/15A62D3/17A62D3/176B01J19/122B01J19/123B01J35/00B01J35/06B01J8/02C02F1/725A62D2101/24A62D2101/43A62D2203/10B01J2208/00433C02F1/32C02F2305/10
    • A system for decontaminating the contaminated fluid by using photocatalytic particles. The system includes a reactor tank for holding the contaminated fluid and the photocatalytic particles suspended in the contaminated fluid to form a slurry. Light irradiates the surface of the slurry, thereby activating the photocatalytic properties of the particles. The system also includes stirring blades for continuously agitating the irradiated fluid surface and for maintaining the particles in a suspended state within the fluid. The system also includes a cross flow filter for segregating the fluid (after decomposition) from the semiconductor powder. The cross flow filter is occasionally back flushed to remove any semiconductor powder that might have caked on the filter. The semiconductor powder may be recirculated back to the tank for reuse, or may be stored for future use. A series of such systems may be used to gradually decompose a chemical in the fluid. Preferably, the fluid is pretreated to remove certain metal ions which interfere with the photocatalytic process. Such pretreatment may be accomplished by dispersing semiconductor particles within the fluid, which adsorb ions or photodeposit the metal as the free metal or its insoluble oxide or hydroxide, and then removing the semiconductor particles together with the adsorbed metal ions/oxides/hydroxide/free metal from the fluid. A method of decontaminating a contaminated fluid is also disclosed.
    • 通过使用光催化颗粒去污染污染的液体的系统。 该系统包括用于保持污染流体的反应器罐和悬浮在污染流体中的光催化颗粒以形成浆料。 光照射浆料的表面,从而激活颗粒的光催化性能。 该系统还包括用于连续搅拌照射的流体表面并用于将颗粒保持在流体内悬浮状态的搅拌叶片。 该系统还包括用于将流体(分解后)与半导体粉末隔离的交叉流过滤器。 交叉流过滤器偶尔会反冲洗,以除去可能在过滤器上结块的任何半导体粉末。 半导体粉末可以再循环回到罐中重新使用,或者可以存储以供将来使用。 可以使用一系列这样的系统来逐渐分解流体中的化学物质。 优选地,预处理流体以除去干扰光催化过程的某些金属离子。 这样的预处理可以通过将半导体颗粒分散在流体中来实现,该吸附离子或作为游离金属或其不溶性氧化物或氢氧化物沉积金属,然后与吸附的金属离子/氧化物/氢氧化物/游离金属一起去除半导体颗粒 从流体。 还公开了污染污染物去污的方法。