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    • 9. 发明授权
    • Stack of equal layer neo-chips containing encapsulated IC chips of
different sizes
    • 堆叠的包含不同尺寸的封装的IC芯片的等层新型芯片
    • US6072234A
    • 2000-06-06
    • US316740
    • 1999-05-21
    • Andrew N. CamienJames S. Yamaguchi
    • Andrew N. CamienJames S. Yamaguchi
    • H01L23/29H01L25/10H01L23/02
    • H01L24/96H01L23/293H01L24/97H01L25/10H01L25/105H01L25/16H01L2224/04105H01L2224/20H01L2225/1011H01L2924/01005H01L2924/01013H01L2924/01033H01L2924/01075H01L2924/01078H01L2924/01082H01L2924/10253H01L2924/14H01L2924/3511
    • Neo-chips suitable for stacking in 3D multi-layer electronic modules are formed by embedding (encapsulating ) IC chips in epoxy material which provides sufficient layer rigidity after curing. The encapsulated chips are formed by placing separate IC chips, usually "known good" die, in a neo-wafer, which is subjected to certain process steps, and then diced to form neo-chips. The following benefits are obtained: (1) The starting IC chips (die) intended for stacking may have different sizes, and serve different electronic purposes. After they are encapsulated in same-size neo-chips, they can be efficiently stacked using well-developed processing steps; (2) The individual chips for stacking can be purchased as "known good" die. This means than an essentially unlimited choice of die is available to the stacking entity, and that the die are pretested when they are ready for stacking; (3) A given layer can contain a plurality of individual die; and (4) The die encapsulating material is dielectric, so that no special steps are required to prepare the access plane of the stack for metalization. Heretofore, this preparation of the access plane has required either the etch-back plus passivation process, or the passivation plus trench-formation process.
    • 适用于3D多层电子模块堆叠的新芯片通过将环氧树脂材料嵌入(封装)IC芯片形成,其在固化后提供足够的层刚度。 封装的芯片通过将单独的IC芯片(通常是“已知的”)芯片放置在经受一定工艺步骤的新晶片中,然后切割形成新芯片来形成。 获得以下好处:(1)用于堆叠的起始IC芯片(芯片)可能具有不同的尺寸,并且用于不同的电子目的。 在封装相同尺寸的新芯片之后,可以使用发达的加工步骤有效地堆叠; (2)堆叠的各个芯片可以作为“已知的”模具购买。 这意味着比堆叠实体可用的基本上无限制的模具选择,并且当它们准备堆叠时,模具被预先测试; (3)给定的层可以包含多个单独的模具; 和(4)芯片封装材料是电介质的,因此不需要特殊的步骤来制备用于金属化的叠层的存取平面。 到目前为止,存取平面的这种制备需要回蚀加钝化处理或钝化加沟槽形成工艺。