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热词
    • 6. 发明授权
    • Master hologram and micropattern replication method
    • 主要霍普金斯和微波复制方法
    • US5059499A
    • 1991-10-22
    • US202579
    • 1988-06-03
    • Michael Teitel
    • Michael Teitel
    • G03C1/496G03H1/02
    • G03H1/028G03C1/496G03H1/0244G03H2001/026G03H2001/0264G03H2001/0296G03H2240/21G03H2240/24G03H2260/63G03H2270/13Y10S430/143Y10S430/146
    • A hologram is directly recorded in a sensitized metal substrate. The hologram may be an amplitude hologram, or may be treated to produce a phase relief hologram which may be stamped into a plastic material for reproduction, be archivally stored, or used as a master for electroforming a second durable surface relief hologram for use as an embossing master. A suitable material is prepared from a polished silver plate exposed to halogen vapors. After exposure, the plate is developed and fixed, and the surface is differentially etched to form a surface relief suitable for hologram embossing. Daguerreotype processes are modified to make surface amplitude holograms and phase holograms. By etching through a metal film a semiconductor mask is obtained. By depositing a silver film directly on a wafer, masks are made with very high feature definition.
    • 将全息图直接记录在敏化金属基板中。 全息图可以是振幅全息图,或者可以被处理以产生相位补偿全息图,其可以冲压成用于再现的塑料材料,被存档或用作电铸成形第二耐用表面浮雕全息图的母版,以用作 压花大师。 从暴露于卤素蒸气的抛光银板制备合适的材料。 曝光后,将显影板固定,并对表面进行差异蚀刻以形成适于全息压印的表面浮雕。 修饰Daguerreotype工艺以制作表面振幅全息图和相位全息图。 通过蚀刻金属膜,获得半导体掩模。 通过将银膜直接沉积在晶片上,以非常高的特征定义制成掩模。