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    • 7. 发明授权
    • Wafer through silicon via forming method and equipment therefor
    • 通过其形成方法和设备通过硅晶片
    • US08202744B2
    • 2012-06-19
    • US12512813
    • 2009-07-30
    • Jung Hwan ChunGyu Han Kim
    • Jung Hwan ChunGyu Han Kim
    • H01L21/00
    • H01L21/76898
    • Provided are a wafer through silicon via (TSV) forming method and equipment therefor. The wafer TSV forming method includes the operations of arranging a wafer having a front surface having a circuit area patterned thereon; recognizing locations of bond pads in the circuit area of the front surface of the wafer by using an image recognition camera, and converting the recognition of the locations into bond pad location information with respect to a back surface of the wafer; flipping the wafer; forming etching holes with middle depth in the back surface of the wafer by using a laser in a manner to match the locations of the bond pads by using the bond pad location information from the image recognition camera; and performing a plasma isotropic etching on the back surface having formed therein the etching holes with middle depth, thereby forming TSVs penetrating the bond pads.
    • 提供了一种晶片通过硅通孔(TSV)的形成方法及其设备。 晶片TSV形成方法包括布置具有其上形成有电路区域的正面的晶片的操作; 通过使用图像识别照相机识别晶片正面的电路区域中的接合焊盘的位置,并且将位置的识别转换为相对于晶片的背面的接合焊盘位置信息; 翻转晶片; 通过使用激光以通过使用来自图像识别照相机的接合焊盘位置信息来匹配接合焊盘的位置的方式在晶片的后表面中形成具有中间深度的蚀刻孔; 并且在其中形成有具有中间深度的蚀刻孔的背表面上进行等离子体各向同性蚀刻,从而形成贯穿接合焊盘的TSV。