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    • 3. 发明授权
    • Ion beam milling system and method for electron microscopy specimen preparation
    • 离子束研磨系统和电子显微镜样品制备方法
    • US06914244B2
    • 2005-07-05
    • US10859845
    • 2004-06-03
    • Reza Alani
    • Reza Alani
    • G01N1/28G01N1/32H01J37/20H01J37/305H01L21/00
    • G01N1/32H01J37/3053H01J2237/31745
    • An ion beam milling system and method for electron microscopy specimen preparation is provided and is useful for the preparation for analysis by either TEM or SEM of semiconductors, metals, alloys, ceramics, and other inorganic materials. In one embodiment, a system and process are provided for the preparation of specimens for analysis by transmission electron microscopy including a specimen processing chamber, at least two ion beam generators, and a specimen support or holder. An ion beam masking member is secured to a surface of the specimen and the specimen is milled. Preferably, the system also includes the ability to view the progress of the milling operation and may include an imaging device such as a light microscope which permits monitoring of the area of interest on a specimen as the specimen is milled.
    • 提供离子束研磨系统和电子显微镜样品制备方法,可用于半导体,金属,合金,陶瓷和其他无机材料的TEM或SEM分析准备。 在一个实施例中,提供了一种系统和方法,用于制备用于通过透射电子显微镜进行分析的样品,所述透射电子显微镜包括样品处理室,至少两个离子束发生器和样品支架或支架。 将离子束遮蔽部件固定在试样的表面,并将试样研磨。 优选地,该系统还包括查看铣削操作的进展的能力,并且可以包括诸如光学显微镜的成像装置,其允许在样品被研磨时监测样品上的感兴趣区域。