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    • 1. 发明申请
    • POWER COMBINER/DIVIDER
    • 动力组合机/分岔机
    • US20140225679A1
    • 2014-08-14
    • US14347387
    • 2013-01-09
    • Nihon Koshuha Co., Ltd.
    • Kibatsu ShinoharaYutaka Arizumi
    • H01P5/18
    • H01P5/12H01P5/183
    • A power combiner/divider W1 which includes: a body portion in which a cavity is formed; a center coaxial connector which is formed on an approximately center portion of the body portion; a plurality of peripheral coaxial connectors 14 which are arranged concentrically about the center coaxial connector 11 and are formed on the body portion; a radial line which is formed in the cavity formed in the body portion; a center coaxial line which has one end thereof connected to the center coaxial connector and the other end thereof connected to a center portion of the radial line; and a peripheral coaxial line which has one end thereof connected to the peripheral coaxial connector and the other end thereof connected to an outer peripheral portion of the radial line, an impedance conversion part is provided to the radial line in one or plural stages.
    • 一种功率合成器/分压器W1,其包括:形成空腔的主体部分; 中心同轴连接器,其形成在所述主体部分的大致中心部分上; 多个外围同轴连接器14,其围绕中心同轴连接器11同心地布置并形成在主体部分上; 形成在形成在主体部分中的空腔中的径向线; 中心同轴线,其一端连接到中心同轴连接器,另一端连接到径向线的中心部分; 以及外周同轴线,其一端与周边同轴连接器连接,另一端与径向线的外周部连接,阻抗转换部以一级或多级提供给径向线。
    • 4. 发明授权
    • Apparatus for plasma processing
    • 等离子体处理装置
    • US06910440B2
    • 2005-06-28
    • US09979719
    • 2001-01-18
    • Nobuo IshiiYasuyoshi YasakaKibatsu Shinohara
    • Nobuo IshiiYasuyoshi YasakaKibatsu Shinohara
    • H01J37/32C23C16/00H05H1/00
    • A plasma processing apparatus that generates a uniform plasma, thus allowing uniform processing of large-diameter wafers. The cylindrical apparatus includes a wafer mounting table, a silica plate providing an airtight seal, a microwave supplier for propagating a microwave in TE11 mode, and a cylindrical waveguide connected at one end to the microwave supplier. A radial waveguide box is connected between the other end of the cylindrical waveguide and the silica plate. The radial waveguide box extends radially outward from the cylindrical waveguide, forming a flange and defining an interior waveguide space. A disc-shaped slot antenna is located at the lower end of the radial waveguide box, above the silica plate. A circularly-polarized wave converter disposed in the cylindrical waveguide rotates the TE11-mode microwave about the axis of the cylindrical waveguide, and sends the rotating microwave to the radial waveguide box.
    • 一种等离子体处理装置,其产生均匀的等离子体,从而允许大直径晶片的均匀加工。 圆筒形装置包括晶片安装台,提供气密密封的石英板,用于以TE11模式传播微波的微波供应器,以及一端连接到微波供应器的圆柱形波导。 径向波导盒连接在圆柱形波导的另一端和石英板之间。 径向波导盒从圆柱形波导径向向外延伸,形成凸缘并限定内部波导空间。 盘状槽天线位于径向波导盒的下端,位于石英板上方。 设置在圆筒形波导管内的圆偏振波转换器围绕圆柱形波导的轴线旋转TE11模式微波,并将旋转的微波发送到径向波导盒。
    • 5. 发明授权
    • Plasma processing apparatus
    • 等离子体处理装置
    • US6043608A
    • 2000-03-28
    • US962390
    • 1997-10-31
    • Seiji SamukawaYukito NakagawaHisaaki SatoTsutomu TsukadaKibatsu ShinoharaYasuo Niimura
    • Seiji SamukawaYukito NakagawaHisaaki SatoTsutomu TsukadaKibatsu ShinoharaYasuo Niimura
    • H05H1/46C23F4/00H01J37/32H01L21/205H01L21/302H01L21/3065H05B37/00
    • H01J37/32082
    • This invention discloses a plasma processing apparatus for carrying out a process onto a substrate utilizing a plasma generated by supplying RF energy with a plasma generation gas. This apparatus comprises a vacuum chamber having a pumping system, a substrate holder for placing the substrate to be processed in the vacuum chamber, a gas introduction means for introducing the plasma generation gas into a plasma generation space, an energy supply means for supplying the RF energy with the plasma generation gas. The antenna has multiple antenna elements provided symmetrically to the center on the axis of the substrate and an end shorting member shorting each end of the antenna elements so that an RF current path symmetrical to the center is applied. Multiple circuits resonant at a frequency of the RF energy are formed symmetrically of the antenna elements and the end shorting member. Length obtained by adding total length of neighboring two of the antenna elements and length of the RF current path between ends of neighboring two of the antenna elements corresponds to one second of wavelength of the RF energy.
    • 本发明公开了一种等离子体处理装置,其使用通过向等离子体发生气体提供RF能量而产生的等离子体,在基板上进行处理。 该设备包括具有泵送系统的真空室,用于将要处理的基板放置在真空室中的基板保持器,用于将等离子体产生气体引入等离子体产生空间的气体引入装置,用于提供RF 能量与等离子体产生气体。 天线具有对称地设置在基板的轴线上的中心的多个天线元件和端部短路构件,使天线元件的每一端短路,从而施加与中心对称的RF电流路径。 在RF能量的频率处共振的多个电路对称地形成在天线元件和端部短路部件上。 通过相邻两个天线元件的总长度相加而获得的长度和相邻两个天线元件的端部之间的RF电流路径的长度对应于RF能量的波长的一秒。
    • 6. 发明授权
    • Power combiner/divider of a radial line type impedance matched between a center connector and peripheral outer connectors
    • 在中心连接器和外围外部连接器之间匹配的径向线型阻抗的功率组合器/分压器
    • US09419323B2
    • 2016-08-16
    • US14347387
    • 2013-01-09
    • Nihon Koshuha Co., Ltd.
    • Kibatsu ShinoharaYutaka Arizumi
    • H01P5/12H01P5/18
    • H01P5/12H01P5/183
    • A power combiner/divider W1 which includes: a body portion in which a cavity is formed; a center coaxial connector which is formed on an approximately center portion of the body portion; a plurality of peripheral coaxial connectors 14 which are arranged concentrically about the center coaxial connector 11 and are formed on the body portion; a radial line which is formed in the cavity formed in the body portion; a center coaxial line which has one end thereof connected to the center coaxial connector and the other end thereof connected to a center portion of the radial line; and a peripheral coaxial line which has one end thereof connected to the peripheral coaxial connector and the other end thereof connected to an outer peripheral portion of the radial line, an impedance conversion part is provided to the radial line in one or plural stages.
    • 一种功率合成器/分压器W1,其包括:形成空腔的主体部分; 中心同轴连接器,其形成在所述主体部分的大致中心部分上; 多个外围同轴连接器14,其围绕中心同轴连接器11同心地布置并形成在主体部分上; 形成在形成在主体部分中的空腔中的径向线; 中心同轴线,其一端连接到中心同轴连接器,另一端连接到径向线的中心部分; 以及外周同轴线,其一端与周边同轴连接器连接,另一端与径向线的外周部连接,阻抗转换部以一级或多级提供给径向线。
    • 7. 发明授权
    • Plasma processor and plasma processing method
    • 等离子处理器和等离子体处理方法
    • US07186314B2
    • 2007-03-06
    • US10543857
    • 2004-01-26
    • Nobuo IshiiKibatsu Shinohara
    • Nobuo IshiiKibatsu Shinohara
    • C23F1/00H01L21/306
    • H01J37/32211H01J37/32192H01P5/1022
    • A plasma processor includes a table on which a target object is to be placed, a vessel which accommodates the table and in which a plasma is to be generated by a high-frequency electromagnetic field, a high-frequency oscillator (30) which generates a high-frequency electromagnetic field, and a reference oscillator (34) which is lower in output power than the high-frequency oscillator (30) and stable in oscillation frequency. A reference signal generated by the reference oscillator (34) is injected into the high-frequency oscillator (30) to fix an oscillation frequency of the high-frequency oscillator (30) at a frequency of a reference signal. Therefore, accurate load matching is performed to improve an energy efficiency when an automatic matching device provided between the high-frequency oscillator (30) and vessel is designed based on the frequency of the reference signal.
    • 等离子体处理器包括:待放置目标物体的台,容纳台的容器,高频电磁场要产生等离子体;高频振荡器, 高频电磁场以及输出功率比高频振荡器(30)低的基准振荡器(34),振荡频率稳定。 由基准振荡器(34)产生的参考信号被注入到高频振荡器(30)中,以将高频振荡器(30)的振荡频率固定在参考信号的频率上。 因此,当基于参考信号的频率设计在高频振荡器(30)和容器之间提供的自动匹配装置时,执行精确的负载匹配以提高能量效率。
    • 8. 发明授权
    • Automatic load matching circuit for microwaves using multi-element
matching device
    • 使用多元件匹配装置的微波自动负载匹配电路
    • US5041803A
    • 1991-08-20
    • US497001
    • 1990-03-21
    • Kibatsu ShinoharaHiroshi Hasunuma
    • Kibatsu ShinoharaHiroshi Hasunuma
    • H01P1/00H01P5/04H03H7/40
    • H03H7/40
    • An automatic load-matching circuit for microwaves, disposed on a transmission line between a signal source and a load. Signal detection means for detecting a travelling wave component and a reflected wave component and for producing outputs corresponding to the absolute value of reflection coefficient .GAMMA., the cosine products .vertline..GAMMA..vertline. cos .theta., and the sine product .vertline..GAMMA..vertline. sin .theta. for controlling an automatic matching means, which includes three matching elements, each having an adjustable short-circuit length, disposed on the transmission line with a separation of odd number multiples of 1/8 of a wavelength along the transmission line. The first and third matching elements are connected such that in response to a change in the short-circulating length of one of the first and third matching elements, the short-circuiting length of the other of the first and third matching elements changes in a corresponding opposite manner. The first and third matching elements are both driven by either the cosine product output or the sine product output, and the second matching element is driven with the one of the cosine and sine product outputs which is not driving the first and third matching elements.
    • 一种用于微波的自动负载匹配电路,设置在信号源和负载之间的传输线上。 用于检测行波分量和反射波分量并产生与反射系数GAMMA,余弦乘积| GAMMA |cosθ和正弦乘积| GAMMA |sinθ的绝对值相对应的输出的信号检测装置,用于控制自动 匹配装置,其包括三个匹配元件,每个匹配元件具有可调节的短路长度,沿着传输线设置在传输线上,其中奇数倍数为1/8的奇数倍。 第一和第三匹配元件被连接成使得响应于第一和第三匹配元件中的一个的短循环长度的变化,第一和第三匹配元件中的另一个的短路长度在相应的 相反的方式。 第一和第三匹配元件都由余弦乘积输出或正弦乘积输出驱动,第二匹配元件由没有驱动第一和第三匹配元件的余弦和正弦乘积输出之一驱动。
    • 10. 发明授权
    • Magnetron oscillator
    • 磁控管振荡器
    • US07545226B2
    • 2009-06-09
    • US10572532
    • 2005-09-15
    • Kibatsu Shinohara
    • Kibatsu Shinohara
    • H03B9/10H03L7/24
    • H03B9/10H01J23/34H01J37/32192H01J37/32201H05H1/46
    • A magnetron (2), a launcher (4) which extracts the output power of the magnetron (2), an impedance generator (5) having one terminal connected to the output terminal of the launcher (4), and a reference signal supplier (6) connected to the other terminal of the impedance generator (5) are included. The reference signal supplier (6) supplies, to the magnetron (2), a reference signal lower in electric power and stabler in frequency than the output from the magnetron (2). The oscillation frequency of the magnetron (2) is locked to the frequency of the reference signal by injection of the reference signal. The impedance generator (5) can reduce the change width of the oscillation frequency of the magnetron (2) by adjusting the load impedance of the magnetron (2). This implements a magnetron oscillator (1) which has high frequency stability and does not fluctuate the frequency even when the output power is changed.
    • 磁控管(2),提取磁控管(2)的输出功率的发射器(4),具有连接到发射器(4)的输出端子的一个端子的阻抗发生器(5)和参考信号供应器 包括连接到阻抗发生器(5)的另一端的6)。 参考信号供应器(6)向磁控管(2)提供电力较低的参考信号并且频率比来自磁控管(2)的输出更稳定。 通过注入参考信号,磁控管(2)的振荡频率被锁定到参考信号的频率上。 阻抗发生器(5)可以通过调整磁控管(2)的负载阻抗来减小磁控管(2)的振荡频率的变化宽度。 这实现了具有高频稳定性的磁控管振荡器(1),即使当输出功率改变时也不会使频率波动。