专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20220035091A1 MULTI-WAVEGUIDE LIGHT FIELD DISPLAY 有权
公开(公告)号：US20220035091A1
公开(公告)日：2022-02-03
申请号：US17451366
申请日：2021-10-19
申请人： Molecular Imprints, Inc.
发明人： Frank Y. Xu , Michael Nevin Miller , Kang Luo , Vikramjit Singh , Michael Klug
IPC分类号： F21V8/00
摘要： A multi-waveguide optical structure, including multiple waveguides stacked to intercept light passing sequentially through each waveguide, each waveguide associated with a differing color and a differing depth of plane, each waveguide including: a first adhesive layer, a substrate having a first index of refraction, and a patterned layer positioned such that the first adhesive layer is between the patterned layer and the substrate, the first adhesive layer providing adhesion between the patterned layer and the substrate, the patterned layer having a second index of refraction less than the first index of refraction, the patterned layer defining a diffraction grating, wherein a field of view associated with the waveguide is based on the first and the second indices of refraction.

2. 发明授权

US10379438B2 Configuring optical layers in imprint lithography processes 有权
公开(公告)号：US10379438B2
公开(公告)日：2019-08-13
申请号：US15885294
申请日：2018-01-31
申请人： Molecular Imprints, Inc.
发明人： Vikramjit Singh , Michael N. Miller , Frank Y. Xu , Christopher Fleckenstein
IPC分类号： G02F1/1339 , G03F7/16 , G03F7/00 , G02B5/18
摘要： An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.

3. 发明授权

US09323143B2 Controlling template surface composition in nano-imprint lithography 有权
标题翻译：在纳米压印光刻中控制模板表面组成
公开(公告)号：US09323143B2
公开(公告)日：2016-04-26
申请号：US12364979
申请日：2009-02-03
申请人： Frank Y. Xu , Weijun Liu
发明人： Frank Y. Xu , Weijun Liu
IPC分类号： B82Y10/00 , B82Y40/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24802
摘要： A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.
摘要翻译：纳米压印光刻工艺包括在基本无机纳米压印光刻模板的表面上形成多个羟基，加热模板，并使模板表面上预选择的羟基百分数与单体官能的非氟化合物，以在纳米压印光刻模板的表面上形成单层涂层。涂布的模板可以与设置在纳米压印光刻基材上的可聚合组合物接触，并且可聚合组合物固化以形成图案化层。将涂覆的模板与图案化层分离。

4. 发明授权

US09164375B2 Dual zone template chuck 有权
标题翻译：双区模板卡盘
公开(公告)号：US09164375B2
公开(公告)日：2015-10-20
申请号：US12817787
申请日：2010-06-17
申请人： Mahadevan Ganapathisubramanian , Byung-Jin Choi
发明人： Mahadevan Ganapathisubramanian , Byung-Jin Choi
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T279/17
摘要： A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle.
摘要翻译：模板卡盘包括多个区域以提供1）优化的压印弯曲以提供高曲率并在基板的中间半径处提供接触和/或2）具有增加的自由跨度区域和高裂纹角度的分离弯曲区域。

5. 发明授权

US09070803B2 Nanostructured solar cell 有权
公开(公告)号：US09070803B2
公开(公告)日：2015-06-30
申请号：US13105422
申请日：2011-05-11
申请人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号： H01L31/00 , H01L31/0352 , B82Y20/00 , H01L31/0224 , H01L31/0236 , H01L31/0376 , H01L31/0392 , H01L31/075 , H01L31/076 , H01L31/20 , H01L31/0463
CPC分类号： H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要： Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.

6. 发明授权

US08968620B2 Safe separation for nano imprinting 有权
标题翻译：纳米压印安全分离
公开(公告)号：US08968620B2
公开(公告)日：2015-03-03
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C45/76 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译：通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db））和/或材料刚度的选择。

7. 发明授权

US08913230B2 Chucking system with recessed support feature 有权
标题翻译：带凹槽支撑功能的卡盘系统
公开(公告)号：US08913230B2
公开(公告)日：2014-12-16
申请号：US12828498
申请日：2010-07-01
申请人： Mahadevan GanapathiSubramanian , Mario Johannes Meissl , Avinash Panga , Byung-Jin Choi
发明人： Mahadevan GanapathiSubramanian , Mario Johannes Meissl , Avinash Panga , Byung-Jin Choi
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/7035 , B25B11/005 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/703 , G03F7/70375
摘要： In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
摘要翻译：在压印光刻系统中，模板卡盘上的凹进的支撑件可以改变定位在其上的模板的形状，从而在纳米压印光刻工艺中最小化和/或消除模板的外边缘的过早向下偏移。

8. 发明授权

US08891080B2 Contaminate detection and substrate cleaning 有权
标题翻译：污染检测和基材清洗
公开(公告)号：US08891080B2
公开(公告)日：2014-11-18
申请号：US13178268
申请日：2011-07-07
申请人： Niyaz Khusnatdinov , Dwayne L. LaBrake
发明人： Niyaz Khusnatdinov , Dwayne L. LaBrake
IPC分类号： G01N21/00 , G01N21/956 , G01N21/94 , G01N21/47
CPC分类号： G01N21/94 , G01N21/00 , G01N21/47 , G01N21/956 , Y10S977/887
摘要： Detection of periodically repeating nanovoids is indicative of levels of substrate contamination and may aid in reduction of contaminants on substrates. Systems and methods for detecting nanovoids, in addition to, systems and methods for cleaning and/or maintaining cleanliness of substrates are described.
摘要翻译：周期性重复的纳米种类的检测指示底物污染的水平，并且有助于减少底物上的污染物。描述了用于检测纳米空间的系统和方法，以及用于清洁和/或维持基板清洁的系统和方法。

9. 发明申请

US20140319727A1 PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES 审中-公开
标题翻译：非形式形状纳米结构的构图
公开(公告)号：US20140319727A1
公开(公告)日：2014-10-30
申请号：US14247874
申请日：2014-04-08
申请人： Molecular Imprints, Inc. , Board of Regents, The University of Texas System
发明人： Sidlgata V. Sreenivasan , Vikramjit Singh , Frank Y. Xu , Byung-Jin Choi
IPC分类号： B29C59/02
CPC分类号： B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
摘要： Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
摘要翻译：描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。该方法可以用于直接图案化衬底和/或创建压印光刻模板或模具，其可以随后用于将纳米形图案直接复制到其它衬底中，例如形成功能性或牺牲抗蚀剂以形成功能纳米颗粒。

10. 发明授权

US08802747B2 Nanoimprint lithography processes for forming nanoparticles 有权
标题翻译：用于形成纳米颗粒的纳米压印光刻工艺
公开(公告)号：US08802747B2
公开(公告)日：2014-08-12
申请号：US13017259
申请日：2011-01-31
申请人： Frank Y. Xu , Sidlgata V. Sreenivasan , Shuqiang Yang
发明人： Frank Y. Xu , Sidlgata V. Sreenivasan , Shuqiang Yang
IPC分类号： B29D11/00 , C08F20/06 , B23P15/00 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.
摘要翻译：用于形成纳米颗粒的光刻方法包括在多层基板上图案化牺牲材料。在一些情况下，将图案转移到多层基板的可移除层或其中，并且将功能材料设置在多层基板的可移除层上并固化。然后去除功能材料的至少一部分以暴露可移除层的突起，并且功能材料的柱从可除去的层释放以产生纳米颗粒。在其他情况下，多层基板包括功能材料，并且图案被转移到多层基板的可移除层中或其中。去除牺牲层，并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式