专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06894295B2 Electron beam proximity exposure apparatus and mask unit therefor 失效
标题翻译：电子束接近曝光装置及其掩模单元
公开(公告)号：US06894295B2
公开(公告)日：2005-05-17
申请号：US09732928
申请日：2000-12-11
申请人： Nobuo Shimazu , Takao Utsumi
发明人： Nobuo Shimazu , Takao Utsumi
IPC分类号： G21K5/04 , G03F1/16 , G03F7/20 , H01J37/305 , H01J37/317 , H01L21/027 , H01J37/20
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0458 , H01J2237/31788
摘要： In an electron beam proximity exposure apparatus comprising an electron beam source, which emits a collimated electron beam, a mask substrate on which a plurality of masks with apertures are formed, a mask moving mechanism, which moves the mask substrate, and a stage, which holds and moves an object, the mask moving mechanism moves the mask substrate so that one of the plurality of masks is arranged on a path of the electron beam in proximity to a surface of the object, and a pattern corresponding to the aperture of the one of the plurality of masks is exposed on the surface of the object with the electron beam having passed through the aperture. Thus, the frequency of taking the mask out of the apparatus to exchange the mask is reduced, so that the throughput of the apparatus is improved.
摘要翻译：在包括发射准直电子束的电子束源的电子束接近曝光装置中，形成有多个具有孔的掩模的掩模基板，移动掩模基板的掩模移动机构和台阶保持和移动物体，掩模移动机构移动掩模基板，使得多个掩模中的一个掩模布置在接近物体表面的电子束的路径上，并且与该一个的孔的对应的图案的多个掩模在电子束已通过孔的情况下暴露在物体的表面上。因此，将掩模从装置中取出以交换掩模的频率减小，从而提高了装置的吞吐量。

2. 发明申请

US20040004195A1 MASK INSPECTING APPARATUS 失效
标题翻译：屏蔽检查装置
公开(公告)号：US20040004195A1
公开(公告)日：2004-01-08
申请号：US10188335
申请日：2002-07-03
申请人： LEEPL Corporation
发明人： Takao Utsumi
IPC分类号： H01J037/304
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/24592 , H01J2237/31776 , H01J2237/31788 , H01J2237/31794
摘要： The mask inspecting apparatus is incorporated into an electron beam proximity exposure apparatus in which a mask is arranged in proximity to a wafer, and a mask pattern formed on the mask is transferred onto a resist layer on the wafer by scanning the mask with an electron beam. The mask inspecting apparatus comprises a scanning electron microscope (SEM) arranged on a wafer stage, and a stage drive device which shifts the wafer stage so that an electron detector of the SEM can receive electrons originating from the electron beam transmitting through the mask pattern of the mask in an inspection of the mask. The SEM thereby captures an image of the mask pattern on the lower face of the mask. Thus, the mask inspection can be performed using an electron beam intended for use in proximity exposure in the electron beam proximity exposure apparatus.
摘要翻译：掩模检查装置被结合到电子束接近曝光装置中，其中掩模布置在晶片附近，并且通过用电子束扫描掩模将形成在掩模上的掩模图案转移到晶片上的抗蚀剂层上。掩模检查装置包括布置在晶片台上的扫描电子显微镜（SEM）和移动晶片台的载物台驱动装置，使得SEM的电子检测器可以接收源自通过掩模图案发射的电子束的电子面具在检查面具。 SEM从而在掩模的下表面上捕获掩模图案的图像。因此，可以使用旨在用于电子束接近曝光装置中的接近曝光的电子束来进行掩模检查。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式