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    • 1. 发明授权
    • Method of making shallow well MOSFET structure
    • 浅井MOSFET结构的制作方法
    • US6107127A
    • 2000-08-22
    • US145513
    • 1998-09-02
    • Christopher B. Kocon
    • Christopher B. Kocon
    • H01L29/78H01L21/336H01L29/08H01L21/8238
    • H01L29/66712H01L29/7802H01L29/0847
    • To form a shallow well MOSFET, an epitaxial layer is subjected to a blanket implant of impurities, so as to form a very shallow well region that defines a PN junction with the epitaxial layer. A field oxide layer is selectively formed on a portion of the shallow well region, and a gate insulator layer is formed on the exposed portion of the shallow well region contiguous with the field insulator layer. A polycrystalline silicon spacer-gate layer is non-selectively deposited on the field insulator layer and the gate insulator layer, forming a multiple thickness implant mask. The resulting structure is subjected to one or more high energy impurity implants, to overdose and thereby convert a portion of the shallow well region to the conductivity of the epitaxial layer. This extends the PN junction up to the surface of the well region beneath the gate insulator layer, thereby defining the length of the channel between the side edge of the field oxide layer and the extended PN junction. A polysilicon planarization layer is then non-selectively formed on the spacer layer, followed by a planarization etch, to define the thickness of the gate layer. The field insulator layer is then stripped, and source and drain regions are formed. What results is a shallow well insulated gate field effect semiconductor device having decreased resistance and current pinching in the channel neck region, relative to that of a conventional process, thereby providing increased power handling capability and efficiency.
    • 为了形成浅阱MOSFET,对外延层进行杂质的覆盖注入,以形成限定与外延层的PN结的非常浅的阱区。 在浅阱区域的一部分选择性地形成场氧化物层,并且在与场绝缘体层相邻的浅阱区域的露出部分上形成栅极绝缘体层。 多晶硅间隔栅极层被非选择性地沉积在场绝缘体层和栅极绝缘体层上,形成多个厚度的注入掩模。 所得到的结构经受一个或多个高能杂质植入物,以过量,从而将浅井区的一部分转化为外延层的导电性。 这将PN结延伸到栅极绝缘体层下面的阱区的表面,从而限定了场氧化物层的侧边缘和延伸的PN结之间的沟道的长度。 然后在间隔层上非选择性地形成多晶硅平坦化层,随后进行平坦化蚀刻,以限定栅极层的厚度。 然后剥离场绝缘体层,形成源区和漏区。 相对于常规工艺,通道颈部区域具有降低的电阻和电流夹紧的浅阱绝缘栅场效应半导体器件的结果是什么,从而提供更高的功率处理能力和效率。
    • 6. 发明授权
    • Direct access test unit for central office
    • 中央办公室直接访问测试单元
    • US4841560A
    • 1989-06-20
    • US109164
    • 1987-10-16
    • Aaron ChanBen PierceLeslie Shafto
    • Aaron ChanBen PierceLeslie Shafto
    • H04M3/30H04M3/487
    • H04M3/30H04M3/487
    • A direct access test unit for enabling a craftsperson at a telephone facility remote with respect to a central office to test subscriber lines comprises a first access port coupled to an access line circuit, by way of which the remote telephone facility communicates with the telephone office in the course of testing subscriber lines, and a second access port coupled to a test trunk circuit by way of which a subscriber line is to be tested by the test unit. Coupled between the first and second access ports is a processor-controlled subscriber line test/interface arrangement which is responsive to (tone) dial signals, generated by the remote telephone facility, and representative of a command to conduct a test of a selected one of a plurality of subscriber line circuits that are accessible by the test unit from the second access port, including the line circuit to which said remote telephone facility is connected, for accessing the subscriber line circuit via the second access port and conducting tests of the subscriber line circuit by way of the test trunk circuit. Stored within the memory of the processor which controls the operation of the test unit are voice message menus, each in a respectively different language (e.g. English, Spanish) the contents of which are controllably accessed and synthesized for transmission to the craftsperson via the first access port. The voice messages include instructions for guiding the craftsperson in the course of carrying out a test of a selected subscriber line.
    • 直接访问测试单元,用于使远程相对于中心局的电话设备的技工能够测试用户线路包括耦合到接入线路电路的第一接入端口,远程电话设备通过该接入线路与电话局进行通信 测试用户线路的过程,以及耦合到测试中继电路的第二接入端口,通过该测试中继电路将由测试单元测试用户线路。 耦合在第一和第二接入端口之间的是处理器控制的用户线测试/接口布置,其响应于由远程电话设备产生的(音调)拨号信号,并且代表对所选择的一个接入端口进行测试的命令 多个用户线电路,可由测试单元从第二接入端口接入,包括所述远程电话设备所连接的线路电路,用于经由第二接入端口接入用户线电路,并进行用户线的测试 通过测试中继电路的电路。 存储在控制测试单元的操作的处理器的存储器内的是语音消息菜单,每个语言消息菜单分别以不同的语言(例如英语,西班牙语)进行,其内容被可控地访问和合成,以便经由第一访问传送给技工 港口。 语音消息包括在对所选择的用户线进行测试的过程中引导技工的指令。
    • 7. 发明授权
    • Mesh-configured rf antenna formed of knit graphite fibers
    • 由针织石墨纤维形成的网状配置射频天线
    • US4812854A
    • 1989-03-14
    • US046144
    • 1987-05-05
    • Bobby J. BoanMartin Schwam
    • Bobby J. BoanMartin Schwam
    • H01Q1/36H01Q15/16
    • H01Q15/16H01Q1/368
    • An antenna reflector material for electromagnetic waves is comprised of knitted strands of fine diameter graphite filaments, which have been individually coated with a stress absorbing layer (e.g. a thin metallic or dielectric cladding). Because of the stress absorbing coating, the graphite fibers, which, by themselves, are inherently brittle and unable to tolerate substantial changes to their bend radius profiles, are able to be successfully knitted into a tricot mesh configuration and thereby yield an antenna surface material that possesses a near-zero coefficient of thermal expansion and a sufficiently low in-plane mechanical stiffness. After the tricot knit graphite mesh material has been formed, the cladding layer may be removed (e.g. by heat or chemically dissolved), without affecting the mechanical properties of the graphite strands of the tricot knit. The intended displacement capability of the loops of graphite strands within the knit mesh structure are retained, so that thermal inputs do not alter the performance characteristics of the graphite mesh antenna.
    • 用于电磁波的天线反射器材料由单独涂覆有应力吸收层(例如薄金属或电介质包层)的细直径石墨细丝的针织线组成。 由于应力吸收涂层,石墨纤维本身就是脆性的并且不能耐受它们的弯曲半径分布的实质性变化,所以能够被成功编织成经编网状结构,从而产生天线表面材料, 具有接近零的热膨胀系数和足够低的平面内机械刚度。 在已经形成经编针织石墨网状材料之后,可以将包覆层除去(例如通过加热或化学溶解),而不会影响经编针织物的石墨丝束的机械性能。 保持针织网状结构内的石墨线圈的预期位移能力,使得热输入不改变石墨网状天线的性能特征。
    • 8. 发明授权
    • Equiphase refractive antenna lens
    • 等折射天线镜
    • US4804970A
    • 1989-02-14
    • US730997
    • 1985-05-06
    • John R. Todd
    • John R. Todd
    • H01Q15/08H01Q19/06
    • H01Q15/08
    • A dielectric antenna lens for planar wavefront/focal point conversion is configured of a series of concentric rings, each of which is contoured from a rear face to inclined termination edges that are delimited by the functional performance of the lens and which assist in the manufacture of the lens. In addition, the bottom edge of each ring, rather than terminate at a cylindrical side wall of an adjacent ring, terminates at a flattened region between itself and the adjacent ring. This flattened region effectively eliminates the acute angle wedge between rings and, together with the inclined termination edges of the rings, serves to enable the lens to be easily manufactured, as by injection molding, with the flattened land portions and inclined termination edges making possible removal of the lens from the injection mold.As a further aspect of the present invention there is provided a multiple wavelength conversion arrangement employing the dielectric lens in combination with a wavelength selective (e.g. dichroic) filter, enabling the lens to be used as part of a compact microwave transceiver unit operating at a plurality of different frequencies.
    • 用于平面波前/焦点转换的电介质天线透镜由一系列同心环构成,每个同心环从后表面到由透镜的功能性能界定的倾斜终端边缘轮廓,并且有助于制造 镜头。 另外,每个环的底部边缘,而不是终止于相邻环的圆柱形侧壁,终止于其本身与相邻环之间的平坦区域。 该扁平化区域有效地消除了环之间的锐角楔形,并且与环的倾斜端接边缘一起用于使透镜容易地通过注射成型制造,其中平坦的接合部分和倾斜的端接边缘使得可能的移除 的镜头从注射模具。 作为本发明的另一方面,提供了一种使用该介质透镜与波长选择性(例如二向色)滤光器组合的多波长转换装置,使得该透镜可用作在多个操作的紧凑型微波收发器单元的一部分 的不同频率。
    • 9. 发明授权
    • Silicon source feed process
    • 硅源进料工艺
    • US3901182A
    • 1975-08-26
    • US25474872
    • 1972-05-18
    • HARRIS CORP
    • CHIANG PING-WANG
    • C23C16/24C23C16/448C30B25/02C23C13/08
    • C23C16/4487C23C16/24C23C16/4482C30B25/02C30B29/06Y10S118/90Y10T137/6579
    • A process is disclosed for chemical vapor deposition (CVD) of silicon onto a substrate. In the process hydrogen gas is bubbled through a suitable liquid source of silicon, such as SiCl4 or SiHCl3, to evaporate liquid therefrom and to carry the vapor in a gas stream. A constant temperature reflex condenser is used to control the concentration of the gas stream. The said bubbler is maintained at room temperature and the said condenser is maintained at a temperature which is the lowest in the entire CVD system, and below the lowest possible temperature of the liquid source attributable to heat loss through vaporization. The effluent gas stream of the condenser is at a substantially constant temperature, and the concentration of vapor in the gas stream is thus held substantially constant through the deposition process of the silicon onto the substrate.
    • 公开了一种用于硅衬底上的化学气相沉积(CVD)的方法。 在此过程中,氢气通过合适的硅液体源(如SiCl4或SiHCl3)鼓泡,从而蒸发出液体,并将气体携带在气流中。 使用恒温反射冷凝器来控制气流的浓度。 所述起泡器保持在室温,并且所述冷凝器保持在整个CVD系统中最低的温度,并且低于归因于通过蒸发的热损失的液体源的最低可能温度。 冷凝器的废气流处于基本上恒定的温度,因此气流中的蒸气浓度通过硅沉积到衬底上而保持基本恒定。