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1. 发明授权

US09824860B2 Charged particle beam exposure apparatus and method of manufacturing semiconductor device 有权
公开(公告)号：US09824860B2
公开(公告)日：2017-11-21
申请号：US14502709
申请日：2014-09-30
申请人： ADVANTEST CORPORATION
发明人： Akio Yamada
IPC分类号： H01J37/317 , H01J37/20 , H01L21/268 , H01J37/304 , G21K5/10 , H01J37/30
CPC分类号： H01J37/3174 , G21K5/10 , H01J37/20 , H01J37/3007 , H01J37/3045 , H01J2237/0435 , H01J2237/1502 , H01J2237/202 , H01J2237/303 , H01L21/268
摘要： The invention relates to a charged particle beam exposure apparatus configured to expose cut patterns or via patterns on a substrate having a plurality of line patterns 81a arranged on an upper surface of the substrate at a constant pitch by irradiating the substrate with a plurality of charged particle beams B1 to Bn while moving a one-dimensional array beam A1 in an X direction parallel to the line patterns 81a, the one-dimensional array beam A1 being a beam in which the charged particle beams B1 to Bn are arranged in an Y direction orthogonal to the line patterns 81a.

2. 发明授权

US09478396B2 Charged particle beam exposure apparatus 有权
标题翻译：带电粒子束曝光装置
公开(公告)号：US09478396B2
公开(公告)日：2016-10-25
申请号：US14562095
申请日：2014-12-05
申请人： ADVANTEST CORPORATION
发明人： Shinichi Hamaguchi , Masaki Kurokawa , Shinji Sugatani , Akio Yamada
IPC分类号： H01J37/317 , H01J37/30
CPC分类号： H01J37/3177 , H01J37/3007 , H01J2237/0435 , H01J2237/0453
摘要： Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.
摘要翻译：提供如下配置的带电粒子束曝光装置。从电子枪发射的电子束由不对称的照明光学系统变形以具有细长的部分。然后将电子束施加到具有布置成一行的多个孔的束形成孔板，从而产生多个电子束。通过在半导体衬底上沿垂直于线图案的方向移动舞台装置，并且通过使用第二装置与舞台装置的移动同步地打开或关闭多个电子束来对预定图案进行曝光挡板和最终孔板。

3. 发明授权

US09116434B2 Electron beam exposure method 有权
公开(公告)号：US09116434B2
公开(公告)日：2015-08-25
申请号：US14056651
申请日：2013-10-17
申请人： ADVANTEST CORPORATION
发明人： Shinichi Hamaguchi , Masaki Kurokawa , Masahiro Takizawa
IPC分类号： G03F1/20 , G03F7/20 , H01J37/317 , G03F1/50
CPC分类号： G03F7/2037 , G03F1/20 , G03F1/50 , G03F7/2063 , H01J37/3174 , H01J37/3175 , H01J2237/31776
摘要： An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

4. 发明授权

US08859993B2 Sample holder of electron beam exposure apparatus and electron beam exposure method using the same 有权
标题翻译：电子束曝光装置的样品架和使用其的电子束曝光方法
公开(公告)号：US08859993B2
公开(公告)日：2014-10-14
申请号：US13967970
申请日：2013-08-15
申请人： Advantest Corporation
发明人： Hirofumi Hayakawa , Akiyoshi Tsuda
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2007 , H01L21/6833 , H01L21/68728
摘要： A sample holder to be disposed between an electrostatic chuck and a sample smaller than the upper surface of the electrostatic chuck is provided, the sample holder including: a base plate formed in the same size as the upper surface of the electrostatic chuck; a sample placement portion located on the upper surface of the base plate, and designed to place the sample thereon; and a circumferential portion being a portion of the upper surface of the base plate other than the sample placement portion, and having a conductive material exposed to the outside.
摘要翻译：设置在静电卡盘和小于静电卡盘的上表面的样本之间的样品保持器，所述样品保持器包括：形成为与所述静电卡盘的上表面相同尺寸的基板; 位于所述基板的上表面上并被设计成将样品放置在其上的样品放置部分; 以及作为除了样品放置部以外的基板的上表面的一部分的周向部，并且具有暴露于外部的导电材料。

5. 发明授权

US08618970B2 DA conversion device and electron beam exposure system using the same 有权
标题翻译： DA转换装置和使用其的电子束曝光系统
公开(公告)号：US08618970B2
公开(公告)日：2013-12-31
申请号：US13682311
申请日：2012-11-20
申请人： Advantest Corporation , Hitachi Information & Communication Engineering, Ltd.
发明人： Takamasa Sato , Ryozo Yoshino , Atsushi Higashino
IPC分类号： H03M1/66 , H03K19/0175
CPC分类号： H03M1/66 , H01J3/26 , H01J37/24 , H01J37/3174 , H01J2237/1504
摘要： A DA conversion device includes a current output type DA converter, a high-speed operational amplifier operating at a low voltage and configured to generate a voltage corresponding to an output current from the DA converter, and a buffer amplifier connected to an output terminal of the high-speed operational amplifier and operating at a high voltage. The device also includes positive and negative floating power supplies separated from a power supply system and provided as power supplies for driving the DA converter and the high-speed operational amplifier. A midpoint between potentials at the floating power supplies is connected to an output terminal of the buffer amplifier to cause the DA converter and the high-speed operational amplifier to operate mainly based on an output voltage from the buffer amplifier.
摘要翻译： DA转换装置包括电流输出型DA转换器，低电压运行的高速运算放大器，其被配置为产生与来自DA转换器的输出电流相对应的电压;以及缓冲放大器，连接到所述DA转换器的输出端子高速运算放大器，工作在高电压。该装置还包括与电源系统分离的正和负浮动电源，并且作为用于驱动DA转换器和高速运算放大器的电源提供。浮动电源的电位之间的中点连接到缓冲放大器的输出端子，使得DA转换器和高速运算放大器主要基于来自缓冲放大器的输出电压来运行。

6. 发明授权

US08604431B2 Pattern-height measuring apparatus and pattern-height measuring method 有权
标题翻译：图案高度测量装置和图案高度测量方法
公开(公告)号：US08604431B2
公开(公告)日：2013-12-10
申请号：US13407521
申请日：2012-02-28
申请人： Tsutomu Murakawa , Hidemitsu Hakii , Isao Yonekura
发明人： Tsutomu Murakawa , Hidemitsu Hakii , Isao Yonekura
IPC分类号： H01J37/26 , H01J37/28 , H01J37/24 , G01N23/225
CPC分类号： H01J37/26 , G01B15/00 , G01B2210/56 , G01N23/225 , H01J37/222 , H01J37/24 , H01J37/28 , H01J2237/24578
摘要： An electron beam is irradiated on an observation region of a sample surface. An image (SEM image) is acquired based on a detection signal of secondary electrons from a detector disposed obliquely above the observation region. A length of a shadow of a pattern appearing in the image is detected. Then, a height H of the pattern is calculated by a formula H=L×tan θ on the basis of the detected length L of the shadow and an apparent angle θ of the detector to the sample surface obtained in advance. An intensity distribution of the secondary electrons on a line orthogonal to an edge of the pattern is extracted, and the length L of the shadow of the pattern is obtained as a distance between two points where a recess portion of the intensity distribution intersects a predetermined threshold.
摘要翻译：电子束被照射在样品表面的观察区域上。基于从观察区域倾斜地设置的检测器的二次电子的检测信号获取图像（SEM图像）。检测图像中出现的图案的阴影的长度。然后，基于检测到的阴影长度L和预先获得的检测器对样品表面的视角θ，通过公式H = L×tanθ计算图案的高度H. 提取与图案边缘正交的线上的二次电子的强度分布，并且获得图案阴影的长度L作为强度分布的凹部与预定阈值相交的两个点之间的距离。

7. 发明授权

US08390201B2 Multi-column electron beam exposure apparatus and magnetic field generation device 有权
标题翻译：多列电子束曝光装置及磁场发生装置
公开(公告)号：US08390201B2
公开(公告)日：2013-03-05
申请号：US12928899
申请日：2010-12-22
申请人： Hiroshi Yasuda , Yoshihisa Ooae , Takeshi Haraguchi
发明人： Hiroshi Yasuda , Yoshihisa Ooae , Takeshi Haraguchi
IPC分类号： H01J25/50
CPC分类号： H01J37/143 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3174 , H01J2237/0635 , H01J2237/14
摘要： A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, the two annular permanent magnets being magnetized in an optical axis direction and symmetrical about the optical axis, where the electromagnetic coils adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, where the electron beam converging unit is disposed in each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.
摘要翻译：多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体沿光轴方向被磁化并且围绕光轴对称，其中电磁线圈调节环形磁场永久磁铁以及设置有圆孔的基板，分别在列单元中使用的电子束通过其中电子束会聚单元设置在每个圆形孔中。两个环形永久磁铁可以在光轴方向上彼此上下配置，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。

8. 发明授权

US08223045B2 D/A converter and electron beam exposure apparatus 有权
标题翻译： D / A转换器和电子束曝光装置
公开(公告)号：US08223045B2
公开(公告)日：2012-07-17
申请号：US12800568
申请日：2010-05-18
申请人： Hidefumi Yabara
发明人： Hidefumi Yabara
IPC分类号： H03M1/06
CPC分类号： H03M1/1052 , H03M1/687
摘要： A D/A converter includes a D/A converter base part having a first D/A converter unit performing D/A conversion of high order bits and a second D/A converter unit performing D/A conversion of low order bits and including an auxiliary bit assigned an identical weight to a least significant bit, a correction D/A converter part, an error detection processing section generating a digital code supplied to a correction D/A converter unit in the correction D/A converter part, and a control section. The control section compares one bit current source with another bit current source in a lower order than the one bit current source, and corrects a value of the one bit current source by causing to supply the digital code to the correction D/A converter unit when the value of the one bit current source changes.
摘要翻译： AD / A转换器包括具有执行高阶比特D / A转换的第一D / A转换器单元的D / A转换器基座部分和执行低位比特的D / A转换的第二D / A转换器单元，并且包括辅助比特分配与最低有效位相同的权重，校正D / A转换器部分，产生提供给校正D / A转换器部分中的校正D / A转换器单元的数字代码的错误检测处理部分，以及控制部分。控制部分将一位电流源与另一位电流源以比一位电流源低的顺序进行比较，并通过使数字代码提供给校正D / A转换器单元来校正一位电流源的值，一位电流源的值发生变化。

9. 发明授权

US08115520B2 Driver circuit 失效
标题翻译：驱动电路
公开(公告)号：US08115520B2
公开(公告)日：2012-02-14
申请号：US12583450
申请日：2009-08-20
申请人： Naoki Matsumoto , Takashi Sekino
发明人： Naoki Matsumoto , Takashi Sekino
IPC分类号： H03K3/00
CPC分类号： H03K19/0175 , G01R31/31924 , H04L25/03343
摘要： A driver circuit includes a main driver which receives an input signal and outputs a first signal corresponding to the input signal, a sub driver which receives the input signal and outputs a non-inverted signal and an inverted signal corresponding to the input signal, a differentiating circuit including resistors and a variable capacity condenser, which outputs signals by differentiating the non-inverted signal and the inverted signal, respectively, and an addition unit which outputs a high frequency emphasized signal given by adding the output signal of the main driver and the signal given by differentiating the non-inverted signal, or a low frequency emphasized signal given by adding the output signal of the main driver and the signal given by differentiating the inverted signal.
摘要翻译：驱动电路包括主驱动器，其接收输入信号并输出对应于输入信号的第一信号;子驱动器，其接收输入信号并输出与输入信号相对应的非反相信号和反相信号;微分电路包括电阻器和可变容量电容器，其分别通过区分非反相信号和反相信号来输出信号;以及加法单元，其输出通过将主驱动器和信号的输出信号相加而给出的高频重点信号通过差分非反相信号给出，或者通过将主驱动器的输出信号和由反相信号进行微分而给出的信号相加给出的低频强调信号。

10. 发明授权

US07990177B2 Driver circuit for producing signal simulating transmission loss 失效
标题翻译：用于产生模拟传输损耗的信号的驱动电路
公开(公告)号：US07990177B2
公开(公告)日：2011-08-02
申请号：US12584456
申请日：2009-09-04
申请人： Naoki Matsumoto , Takashi Sekino , Takayuki Nakamura
发明人： Naoki Matsumoto , Takashi Sekino , Takayuki Nakamura
IPC分类号： H03K19/0175
CPC分类号： H03K19/01806 , G01R31/318357 , H04B3/144 , H04B3/40 , H04L25/0286
摘要： In a driver circuit 10 for outputting a simulated signal simulating an input signal subjected to transmission loss, corresponding to the input signal, the driver circuit 10 comprises: a main driver 18 which receives the input signal and outputs an output signal corresponding to the input signal; a sub driver 20 which receives the input signal and outputs an output signal given by inverting the input signal; a high frequency emphasizing circuit 22 which receives the input signal of the sub driver 20 and outputs an output signal having the high frequency of the input signal of the sub driver 20 emphasized; and an addition unit 24 which outputs the simulated signal given by adding the output signal of the main driver 18 and the output signal of the high frequency emphasizing circuit 22.
摘要翻译：在驱动电路10中，驱动电路10输出与模拟输入信号相对应的输入信号的仿真信号，驱动电路10包括：主驱动器18，其接收输入信号并输出与输入信号对应的输出信号 ; 子驱动器20，其接收输入信号并输出通过反相输入信号给出的输出信号; 接收子驱动器20的输入信号并输出具有副驱动器20的输入信号的高频的输出信号的高频加重电路22; 以及加法单元24，其输出通过将主驱动器18的输出信号和高频加重电路22的输出信号相加而给出的模拟信号。

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