会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明申请
    • REDUCED-EDGE RADIATION-TOLERANT NON-VOLATILE TRANSISTOR MEMORY CELLS
    • 降低辐射耐受非挥发性晶体管存储器细胞
    • US20100044768A1
    • 2010-02-25
    • US12196978
    • 2008-08-22
    • Michael SaddFethi DhaouiJohn McCollumRichard Chan
    • Michael SaddFethi DhaouiJohn McCollumRichard Chan
    • H01L29/788H01L21/336
    • H01L27/11519H01L27/11521H01L27/11565H01L27/11568H01L29/66825H01L29/66833
    • An edgeless one-transistor flash memory array includes transistors that have two polysilicon gate layers that overlay an active region. The bottom polysilicon gate layer is electrically isolated. The memory is configured such that current passes from drain to source under the bottom polysilicon layer, such that it does not approach a field oxide region. An edgeless two-transistor programmable memory includes memory cells that have two active devices. Two polysilicon gate layers overlay two active regions and are shared between the two active devices. One of the devices is used to program and erase the cell while the other used as a programmable switch in a programmable logic device. The bottom polysilicon gate layer is electrically isolated. The memory is configured such that current passes from drain to source under the bottom polysilicon layer, such that it does not approach a field oxide region.
    • 无边形单晶体管闪存阵列包括具有覆盖有源区域的两个多晶硅栅极层的晶体管。 底部多晶硅栅极层被电隔离。 存储器被配置为使得电流在底部多晶硅层下方从漏极流到源极,使得其不接近场氧化物区域。 无刃双晶体管可编程存储器包括具有两个有源器件的存储器单元。 两个多晶硅栅极层覆盖两个有源区,并在两个有源器件之间共享。 其中一个器件用于编程和擦除单元,而另一个用作可编程逻辑器件中的可编程开关。 底部多晶硅栅极层被电隔离。 存储器被配置为使得电流在底部多晶硅层下方从漏极流到源极,使得其不接近场氧化物区域。
    • 5. 发明授权
    • Reduced-edge radiation-tolerant non-volatile transistor memory cells
    • 降低辐射耐受性的非易失性晶体管存储单元
    • US07906805B2
    • 2011-03-15
    • US12196978
    • 2008-08-22
    • Michael SaddFethi DhaouiJohn McCollumRichard Chan
    • Michael SaddFethi DhaouiJohn McCollumRichard Chan
    • H01L29/788
    • H01L27/11519H01L27/11521H01L27/11565H01L27/11568H01L29/66825H01L29/66833
    • An edgeless one-transistor flash memory array includes transistors that have two polysilicon gate layers that overlay an active region. The bottom polysilicon gate layer is electrically isolated. The memory is configured such that current passes from drain to source under the bottom polysilicon layer, such that it does not approach a field oxide region. An edgeless two-transistor programmable memory includes memory cells that have two active devices. Two polysilicon gate layers overlay two active regions and are shared between the two active devices. One of the devices is used to program and erase the cell while the other used as a programmable switch in a programmable logic device. The bottom polysilicon gate layer is electrically isolated. The memory is configured such that current passes from drain to source under the bottom polysilicon layer, such that it does not approach a field oxide region.
    • 无边形单晶体管闪存阵列包括具有覆盖有源区域的两个多晶硅栅极层的晶体管。 底部多晶硅栅极层被电隔离。 存储器被配置为使得电流在底部多晶硅层下方从漏极流到源极,使得其不接近场氧化物区域。 无刃双晶体管可编程存储器包括具有两个有源器件的存储器单元。 两个多晶硅栅极层覆盖两个有源区,并在两个有源器件之间共享。 其中一个器件用于编程和擦除单元,而另一个用作可编程逻辑器件中的可编程开关。 底部多晶硅栅极层被电隔离。 存储器被配置为使得电流在底部多晶硅层下方从漏极流到源极,使得其不接近场氧化物区域。
    • 9. 发明授权
    • Split gate memory cell for programmable circuit device
    • 用于可编程电路器件的分离存储单元
    • US07692972B1
    • 2010-04-06
    • US12177680
    • 2008-07-22
    • Michael SaddFethi DhaouiGeorge WangJohn McCollum
    • Michael SaddFethi DhaouiGeorge WangJohn McCollum
    • G11C16/04
    • G11C16/0425G11C16/0441G11C16/0458G11C16/0466G11C16/0475
    • A split-gate memory cell, includes an n-channel split-gate non-volatile memory transistor having a source, a drain, a select gate over a thin oxide, and a control gate over a non-volatile gate material and separated from the select gate by a gap. A p-channel pull-up transistor has a drain coupled to the drain of the split-gate non-volatile memory transistor, a source coupled to a bit line, and a gate. A switch transistor has first and second source/drain diffusions, and a gate coupled to the drains of the split-gate non-volatile memory transistor and the p-channel pull-up transistor. An inverter has an input coupled to the second source/drain diffusion of the switch transistor, and an output. A p-channel level-restoring transistor has a source coupled to a supply potential, a drain coupled to the first source/drain diffusion of the switch transistor and a gate coupled to the output of the inverter.
    • 分离栅极存储单元包括具有源极,漏极,薄氧化物上的选择栅极和非易失性栅极材料上的控制栅极的n沟道分离栅极非易失性存储器晶体管,并且与 选择一个缺口的门。 p沟道上拉晶体管具有耦合到分离栅极非易失性存储晶体管的漏极的漏极,耦合到位线的源极和栅极。 开关晶体管具有第一和第二源极/漏极扩散,以及耦合到分离栅极非易失性存储晶体管和p沟道上拉晶体管的漏极的栅极。 反相器具有耦合到开关晶体管的第二源/漏扩散的输入端和输出端。 p沟道电平恢复晶体管具有耦合到电源电位的源极,耦合到开关晶体管的第一源极/漏极扩散器的漏极和耦合到反相器的输出端的栅极。