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1. 发明授权

US07582868B2 Method of nano thin film thickness measurement by auger electron spectroscopy 有权
标题翻译：通过螺旋电子能谱法测量纳米薄膜厚度的方法
公开(公告)号：US07582868B2
公开(公告)日：2009-09-01
申请号：US11192199
申请日：2005-07-27
申请人： Zhi Cheng Jiang , Shan Dan Li , Yuen Kwan Kam , Yi Wei Liu
发明人： Zhi Cheng Jiang , Shan Dan Li , Yuen Kwan Kam , Yi Wei Liu
IPC分类号： G01N23/00
CPC分类号： G01B15/02 , G01N23/2276
摘要： A system and method for measuring the thickness of an ultra-thin multi-layer film on a substrate is disclosed. A physical model of an ultra-thin multilayer structure and Auger electron emission from the nano-multilayer structure is built. A mathematical model for the Auger Electron Spectroscopy (AES) measurement of the multilayer thin film thickness is derived according to the physical model. Auger electron spectroscopy (AES) is first performed on a series of calibration samples. The results are entered into the mathematical model to determine the parameters in the mathematical equation. The parameters may be calibrated by the correlation measurements of the alternate techniques. AES analysis is performed on the ultra-thin multi-layer film structure. The results are entered into the mathematical model and the thickness is calculated.
摘要翻译：公开了一种用于测量衬底上的超薄多层膜的厚度的系统和方法。建立了超薄多层结构的物理模型和纳米多层结构的俄歇电子发射。根据物理模型推导了多层薄膜厚度的俄歇电子能谱（AES）测量数学模型。首先在一系列校准样品上进行俄歇电子能谱（AES）。将结果输入到数学模型中以确定数学方程中的参数。可以通过替代技术的相关性测量来校准参数。对超薄多层膜结构进行AES分析。将结果输入到数学模型中，并计算厚度。

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