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    • 10. 发明申请
    • CONFIGURATION OF CONTACTING ZONES IN VAPOR-LIQUID CONTACTING APPARATUSES
    • 气液接触设备中接触区的配置
    • US20120304538A1
    • 2012-12-06
    • US13584869
    • 2012-08-14
    • Zhanping Xu
    • Zhanping Xu
    • C01B3/32
    • B01D53/1406B01D2252/20405B01D2252/2041B01D2256/245B01D2257/304B01D2257/504
    • Vapor-liquid contacting apparatuses comprising a primary contacting zone and a secondary contacting zone are disclosed. A representative secondary contacting zone is a secondary absorption zone, such as a finishing zone for subsequent contacting of the vapor effluent from the primary contacting zone to further remove impurities and achieve a desired purity of purified gas exiting the secondary absorption zone. The secondary contacting zone is disposed below the primary contacting zone, such that the secondary contacting zone, which must operate efficiently in removing generally trace amounts of remaining impurities, is more protected from movement than the more elevated, primary or initial contacting stages for bulk impurity removal. The apparatuses are therefore especially beneficial in offshore applications where they are subjected to rocking.
    • 公开了包括一次接触区和二次接触区的气液接触设备。 代表性的二次接触区域是次级吸收区域,例如用于随后使来自初级接触区域的蒸汽流出物接触的精整区域,以进一步除去杂质并获得离开次级吸收区域的净化气体所需的纯度。 次级接触区域设置在初级接触区域的下方,使得必须有效地除去一般痕量的剩余杂质的次级接触区域比大体积杂质的升高的初级或初始接触阶段更受保护以免移动 删除。 因此,这些装置在经受摇摆的海上应用中特别有益。