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    • 3. 发明授权
    • Electrophotographic photoreceptor and production method thereof
    • 电子照相感光体及其制备方法
    • US06869740B2
    • 2005-03-22
    • US10307861
    • 2002-12-02
    • Yuriko ShindohHiroko IshibashiKazushige MoritaYoshihide Shimoda
    • Yuriko ShindohHiroko IshibashiKazushige MoritaYoshihide Shimoda
    • G03G5/00G03G5/047G03G5/05G03G5/06
    • G03G5/047G03G5/0614G03G5/0616G03G5/0629
    • An electrophotographic photoreceptor, in which the increase of VL is controlled below 15 V by controlling the content ratio M (ppm) of a charge transporting material CTM2 to a charge transporting material CTM1 within a specific range, wherein the ionization potential Ip(2) of the CTM2 is smaller than the ionization potential Ip(1) of the CTM1 in the constituent of the photosensitive layer, and thereby the electrophotographic photoreceptor has only a little reduction of image concentration. A method for producing an electrophotographic photoreceptor having ΔVL which is controlled below 15 V, wherein, in a case where the ionization potential of the charge transporting material used in the previous run of production is small, ΔVL can be set below 15 V by using, in the next production, a dip coating liquid, which comprises, as a constitutive material, a charge transporting material in which the difference between the ionization potential of the current material and that of the previous material is set below 0.25 eV.
    • 通过将特定范围内的电荷输送材料CTM2的电荷输送材料CTM2的含有比M(ppm)控制在特定范围内,将VL的增加控制在15V以下的电子照相感光体,其特征在于,电离电位Ip(2) CTM2小于感光层的成分中的CTM1的电离电位Ip(1),因此电子照相感光体仅有少量的图像浓度降低。 一种控制在15V以下的具有DeltaVL的电子照相感光体的制造方法,其特征在于,在前次生产中使用的电荷输送材料的电离电位小的情况下,通过使用ΔVV,将ΔVV设定为15V以下, 在下一次生产中,包含作为组成材料的电荷输送材料的浸涂液体,其中当前材料的电离电位与先前材料的电离电位之间的差设定在低于0.25eV。
    • 10. 发明授权
    • Film defect inspection method for a film formed on a substrate
    • 在基板上形成的膜的膜缺陷检查方法
    • US06717677B2
    • 2004-04-06
    • US10244679
    • 2002-09-17
    • Sayaka FujitaYoichi TakesawaYoshihide ShimodaTatsuhiro MoritaRikiya MatsuoMasayuki SakamotoKoichi Toriyama
    • Sayaka FujitaYoichi TakesawaYoshihide ShimodaTatsuhiro MoritaRikiya MatsuoMasayuki SakamotoKoichi Toriyama
    • G01B902
    • G01B11/0675G01N21/8422
    • It is an object of the invention to inspect defects of a film formed on a relatively rough surface of a substrate by the light interference method. A substrate on which a film is formed is irradiated with light of a longer wavelength than the surface roughness Rmax or Rz of the substrate to obtain interference fringes to inspect defects of the film formed on the substrate. Especially, it is preferable that when the surface roughness Rmax or Rz is 0.5 &mgr;m or more, the substrate is irradiated with light of a wavelength beyond a little longer wavelength than the surface roughness Rmax or Rz. The surface of the substrate is subjected to a cutting process. Specifically, it is possible to inspect defects of the electric charge generation layer, electric charge transport layer, or undercoat layer of an electrophotographic photoreceptor. This photoreceptor is mounted in a digital copier or printer. Further, monochromatic light is preferably applied. Alternatively, indirect light of the light reflected from a reflector plate or the light diffused by a diffusing plate is preferably applied.
    • 本发明的目的是通过光干涉法来检测在基底的较粗糙表面上形成的膜的缺陷。 用比基板的表面粗糙度Rmax或Rz更长的波长的光照射其上形成有膜的基板,以获得干涉条纹,以检查在基板上形成的膜的缺陷。 特别地,优选的是,当表面粗糙度Rmax或Rz为0.5μm以上时,用比表面粗糙度Rmax或Rz稍长的波长的光照射基板。 对基板的表面进行切割处理。 具体地,可以检查电子照相感光体的电荷产生层,电荷输送层或底涂层的缺陷。 该感光体安装在数字复印机或打印机中。 此外,优选地应用单色光。 或者,优选地应用从反射板反射的光的间接光或由漫射板漫射的光。