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1. 发明申请

US20130016318A1 PROCESS FOR PRODUCING LIQUID CRYSTAL ELEMENT, AND LIQUID CRYSTAL ELEMENT 失效
标题翻译：生产液晶元件和液晶元件的方法
公开(公告)号：US20130016318A1
公开(公告)日：2013-01-17
申请号：US13608347
申请日：2012-09-10
申请人： Yuji Yamamoto , Yuriko Kaida , Ryohei Koguchi , Hiroshi Sakamoto
发明人： Yuji Yamamoto , Yuriko Kaida , Ryohei Koguchi , Hiroshi Sakamoto
IPC分类号： G02F1/13
CPC分类号： G02F1/133711 , G02B5/3016 , G02F1/1333 , G02F1/133365 , G02F1/13378
摘要： In a process for producing a liquid crystal element comprising an alignment-treated substrate and a layer of polymer liquid crystal having a pattern, mesogenic groups in cross-linkable polymer liquid crystal are aligned, and the cross-linkable polymer liquid crystal is cross-linked while the mold is pressed against the layer of cross-linkable polymer liquid crystal, at a temperature higher than the glass transition temperature of the cross-linkable polymer liquid crystal and lower than the clearing point temperature of the cross-linkable polymer liquid crystal.
摘要翻译：在制造包含取向处理基板和具有图案的聚合物液晶层的液晶元件的制造方法中，可交联聚合物液晶中的介晶基团排列，可交联聚合物液晶交联同时在高于可交联聚合物液晶的玻璃化转变温度的温度下将模具压在可交联聚合物液晶层上并低于可交联聚合物液晶的透明点温度。

2. 发明授权

US08711300B2 Process for producing liquid crystal element, and liquid crystal element 失效
标题翻译：液晶元件的制造方法以及液晶元件
公开(公告)号：US08711300B2
公开(公告)日：2014-04-29
申请号：US13608347
申请日：2012-09-10
申请人： Yuji Yamamoto , Yuriko Kaida , Ryohei Koguchi , Hiroshi Sakamoto
发明人： Yuji Yamamoto , Yuriko Kaida , Ryohei Koguchi , Hiroshi Sakamoto
IPC分类号： G02F1/1333 , G02F1/1337
CPC分类号： G02F1/133711 , G02B5/3016 , G02F1/1333 , G02F1/133365 , G02F1/13378
摘要： In a process for producing a liquid crystal element comprising an alignment-treated substrate and a layer of polymer liquid crystal having a pattern, mesogenic groups in cross-linkable polymer liquid crystal are aligned, and the cross-linkable polymer liquid crystal is cross-linked while the mold is pressed against the layer of cross-linkable polymer liquid crystal, at a temperature higher than the glass transition temperature of the cross-linkable polymer liquid crystal and lower than the clearing point temperature of the cross-linkable polymer liquid crystal.
摘要翻译：在制造包含取向处理基板和具有图案的聚合物液晶层的液晶元件的制造方法中，可交联聚合物液晶中的介晶基团排列，可交联聚合物液晶交联同时在高于可交联聚合物液晶的玻璃化转变温度的温度下将模具压在可交联聚合物液晶层上，并且低于可交联聚合物液晶的透明点温度。

3. 发明申请

US20060097225A1 Optical recording material 审中-公开
标题翻译：光学记录材料
公开(公告)号：US20060097225A1
公开(公告)日：2006-05-11
申请号：US11315361
申请日：2005-12-23
申请人： Yuji Yamamoto , Yuriko Kaida , Motoshi Ono , Hiroshi Sakamoto , Hiromi Sakurai
发明人： Yuji Yamamoto , Yuriko Kaida , Motoshi Ono , Hiroshi Sakamoto , Hiromi Sakurai
IPC分类号： C09K19/52 , C09K19/32 , G02F1/13 , G11B7/24
CPC分类号： C09K19/3491 , C09K19/3441 , G11B7/25
摘要： A novel photochromic liquid crystal comprising a diarylethene compound having both photochromic properties and liquid crystallinity. This compound is a photochromic diarylethene compound having a mesogen group in each of the two aryl groups. The photochromic liquid crystal provides a large change in birefringence by photoisomerization or phase transition, and has high durability against repeated changes in birefringence. A side-chain polymer liquid crystal containing the above photochromic liquid crystal is useful as an optical recording material. Such an optical recording material is capable of performing light modulation by irradiation with light near Tc thereof, and is applicable to photo operator devices, optical memories, and the like. Further, the optical recording material is useful as a material for a recording layer of an optical recording medium such as an optical disk or an optical memory card.
摘要翻译：一种新型的光致变色液晶，其包含具有光致变色特性和液晶性的二芳基乙烯化合物。该化合物是在两个芳基各自具有介晶基团的光致变色二芳基烯化合物。光致变色液晶通过光异构化或相变提供双折射的大的变化，并且对双折射的反复变化具有高的耐久性。含有上述光致变色液晶的侧链聚合物液晶可用作光学记录材料。这种光记录材料能够通过在其Tc附近的光照射进行光调制，并且可应用于照相操作装置，光存储器等。此外，光记录材料可用作光记录介质如光盘或光存储卡的记录层的材料。

4. 发明授权

US08623161B2 Process for producing article having fine concavo-convex structure on its surface and process for producing wire-grid polarizer 有权
标题翻译：其表面具有微细凹凸结构的制品的制造方法以及线栅偏振片的制造方法
公开(公告)号：US08623161B2
公开(公告)日：2014-01-07
申请号：US13341039
申请日：2011-12-30
申请人： Yuriko Kaida , Hiroshi Sakamoto
发明人： Yuriko Kaida , Hiroshi Sakamoto
IPC分类号： B29C65/48 , B29D11/00
CPC分类号： G02B5/3058 , B29D11/00644 , B29D11/0073 , B82Y10/00 , B82Y40/00 , G02F2001/133548 , G03F7/0002 , G03F7/027 , G03F7/038
摘要： Processes for producing an article having a fine concavo-convex structure on the surface of a transparent substrate and a wire-grid polarizer, with high quality with high productivity, with which a concavo-convex layer having a large area can easily be achieved. The process comprises a step (I) of forming an interlayer (A) on the surface of a substrate film, a step (II) of forming a concavo-convex layer (B) having a fine concavo-convex structure on its surface, on the surface of the interlayer (A) by imprinting technology, and a step (IV) of separating a laminate comprising the interlayer (A) and the concavo-convex layer (B) from the substrate film and laminating the laminate to the surface of a transparent substrate so that the interlayer (A) faces the transparent substrate side. Further, a process for producing a wire-grid polarizer employing the production process.
摘要翻译：在透明基板的表面上制造具有微细凹凸结构的物品和线栅偏振器的方法，其具有高质量且高生产率，可以容易地实现具有大面积的凹凸层。该方法包括在基材膜的表面上形成中间层（A）的步骤（I），在其表面上形成具有微细凹凸结构的凹凸层（B）的工序（II）通过压印技术的中间层（A）的表面，以及从基材膜分离包含中间层（A）和凹凸层（B）的层压体的步骤（IV），并将层压体层压到透明基板，使得中间层（A）面向透明基板侧。此外，采用该制造方法制造线栅型偏振器的方法。

5. 发明申请

US20120168065A1 PROCESS FOR PRODUCING ARTICLE HAVING FINE CONCAVO-CONVEX STRUCTURE ON ITS SURFACE AND PROCESS FOR PRODUCING WIRE-GRID POLARIZER 有权
标题翻译：用于生产具有微细凹凸结构的物品在其表面上的制造方法和用于生产电网偏振器的方法
公开(公告)号：US20120168065A1
公开(公告)日：2012-07-05
申请号：US13341039
申请日：2011-12-30
申请人： Yuriko Kaida , Hiroshi Sakamoto
发明人： Yuriko Kaida , Hiroshi Sakamoto
IPC分类号： B29C65/48 , B29D11/00
CPC分类号： G02B5/3058 , B29D11/00644 , B29D11/0073 , B82Y10/00 , B82Y40/00 , G02F2001/133548 , G03F7/0002 , G03F7/027 , G03F7/038
摘要： Processes for producing an article having a fine concavo-convex structure on the surface of a transparent substrate and a wire-grid polarizer, with high quality with high productivity, with which a concavo-convex layer having a large area can easily be achieved. The process comprises a step (I) of forming an interlayer (A) on the surface of a substrate film, a step (II) of forming a concavo-convex layer (B) having a fine concavo-convex structure on its surface, on the surface of the interlayer (A) by imprinting technology, and a step (IV) of separating a laminate comprising the interlayer (A) and the concavo-convex layer (B) from the substrate film and laminating the laminate to the surface of a transparent substrate so that the interlayer (A) faces the transparent substrate side. Further, a process for producing a wire-grid polarizer employing the production process.
摘要翻译：在透明基板的表面上制造具有微细凹凸结构的物品和线栅偏振器的方法，其具有高质量且高生产率，可以容易地实现具有大面积的凹凸层。该方法包括在基材膜的表面上形成中间层（A）的步骤（I），在其表面上形成具有微细凹凸结构的凹凸层（B）的工序（II）通过压印技术的中间层（A）的表面，以及从基材膜分离包含中间层（A）和凹凸层（B）的层压体的步骤（IV），并将层压体层压到透明基板，使得中间层（A）面向透明基板侧。此外，采用该制造方法制造线栅型偏振器的方法。

6. 发明申请

US20110084424A1 MOLD FOR NANOIMPRINTING, ITS PRODUCTION PROCESS, AND PROCESSES FOR PRODUCING MOLDED RESIN HAVING FINE CONCAVO-CONVEX STRUCTURE ON ITS SURFACE AND WIRE-GRID POLARIZER 审中-公开
标题翻译：用于纳米生产的模具及其生产工艺，以及在其表面和丝网偏振器上生产具有微细凹凸结构的模制树脂的工艺
公开(公告)号：US20110084424A1
公开(公告)日：2011-04-14
申请号：US12960071
申请日：2010-12-03
申请人： Yuriko Kaida , Hiroshi Sakamoto , Takahira Miyagi , Kosuke Takayama , Eiji Shidoji
发明人： Yuriko Kaida , Hiroshi Sakamoto , Takahira Miyagi , Kosuke Takayama , Eiji Shidoji
IPC分类号： B29C59/02 , B82Y30/00
CPC分类号： G03F7/0002 , B29C33/424 , B29C33/56 , B82Y10/00 , B82Y40/00
摘要： To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo-convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity.A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.
摘要翻译：为了提供能够精确地转录低成本，高耐久性的微细凹凸结构的纳米压印用模具，其制造方法以及在表面具有微细凹凸结构的成型树脂的制造方法精密凹凸结构的模具精确转录，并具有线栅偏振器，生产效率高。一种用于纳米压印的模具10在其模具表面上具有精细的凹凸结构，其包括以恒定间距彼此平行地形成的多个凹槽14，该多个凹槽14由其表面上具有精细凹凸的树脂制成凸构造为细凹凸结构的基底，覆盖具有模底12的微细凹凸结构的表面的金属氧化物层16和覆盖金属氧化物层16的表面的剥离层18 ，用来。

7. 发明授权

US08709317B2 Mold for nanoimprinting, its production process, and processes for producing molded resin having fine concavo-convex structure on its surface and wire-grid polarizer 失效
标题翻译：用于纳米压印的模具，其制造方法以及其表面上具有微细凹凸结构的模制树脂和线栅偏振器的工艺
公开(公告)号：US08709317B2
公开(公告)日：2014-04-29
申请号：US13467010
申请日：2012-05-08
申请人： Yuriko Kaida , Hiroshi Sakamoto , Takahira Miyagi , Kosuke Takayama , Eiji Shidoji
发明人： Yuriko Kaida , Hiroshi Sakamoto , Takahira Miyagi , Kosuke Takayama , Eiji Shidoji
IPC分类号： B29C33/38
CPC分类号： G03F7/0002 , B29C33/424 , B29C33/56 , B82Y10/00 , B82Y40/00
摘要： To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo5 convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity. A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a 10 fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.
摘要翻译：本发明提供一种能够精确地转录低成本，高耐久性的微细凹凸结构的纳米压印用模具及其制造方法，其表面具有细微凹凸结构的成型树脂的制造方法模具的凹凸结构精确转录，并且线栅偏振器具有高生产率。一种用于纳米压印的模具10，其在其模具表面上具有细小的凹凸结构，其包括以恒定间距彼此平行地形成的多个凹槽14，其包括由其表面上具有10微米的树脂制成的模具底座12 作为微细凹凸结构的基底的凹凸结构，覆盖具有模座12的微细凹凸结构的表面的金属氧化物层16和覆盖金属氧化物层的表面的剥离层18 16，被使用。

8. 发明申请

US20100259821A1 Photocurable composition, process for producing fine patterned product and optical element 有权
标题翻译：可光固化组合物，精细图案产品和光学元件的制造方法
公开(公告)号：US20100259821A1
公开(公告)日：2010-10-14
申请号：US12659934
申请日：2010-03-25
申请人： Yuriko Kaida , Hiroshi Sakamoto , Hirotsugu Yamamoto
发明人： Yuriko Kaida , Hiroshi Sakamoto , Hirotsugu Yamamoto
IPC分类号： G02B5/30 , C08F2/46 , G02B1/12 , B32B3/30
CPC分类号： C08F2/44 , C08F2/48 , C08F290/06 , C08F292/00 , C09D4/00 , G02B5/3058 , Y10S977/887 , Y10T428/24479
摘要： To provide a photocurable composition with which a fine pattern molded product on which a fine pattern of a mold is highly precisely transferred can efficiently be produced.A photocurable composition comprising 100 parts by mass of a photocurable monomer (A), from 5 to 60 parts by mass of a colloidal silica (B) (solid content) having an average particle size of at most 200 nm, and from 0.1 to 10 parts by mass of a photopolymerization initiator (C), wherein the photocurable monomer (A) comprises a multifunctional monomer (A1) having at least 3 (meth)acryloyloxy groups in one molecule and a bifunctional monomer (A2) having two (meth)acryloyloxy groups in one molecule, at least one compound belonging to the multifunctional monomer (A1) or the bifunctional monomer (A2) has a hydroxy group, and the ratio of the total amount (mol) of hydroxy groups to the total amount (mol) of the multifunctional monomer (A1) and the bifunctional monomer (A2) is at least 10%.
摘要翻译：为了提供一种光固化性组合物，可有效地制造精细图案模制品，精细图案模具高度精确地转印到其上。一种光固化性组合物，其包含100质量份的光固化性单体（A），5〜60质量份的平均粒径为200nm以下的胶态二氧化硅（B）（固体成分）和0.1〜10 质量份的光聚合引发剂（C），其中，光固化性单体（A）含有1分子中具有3个以上（甲基）丙烯酰氧基的多官能单体（A1）和具有两个（甲基）丙烯酰氧基的双官能单体一个分子中的至少一种化合物，至少一种属于多官能单体（A1）或双官能单体（A2）的化合物具有羟基，羟基的总量（mol）与总量（mol）的比例多官能单体（A1）和双官能单体（A2）为至少10％以上。

9. 发明授权

US08445058B2 Process for producing wire-grid polarizer 失效
标题翻译：线栅偏振片生产工艺
公开(公告)号：US08445058B2
公开(公告)日：2013-05-21
申请号：US12900272
申请日：2010-10-07
申请人： Yuriko Kaida , Hiroshi Sakamoto , Takahira Miyagi , Hiromi Sakurai , Yasuhiro Ikeda , Eiji Shidoji , Masako Kawamoto
发明人： Yuriko Kaida , Hiroshi Sakamoto , Takahira Miyagi , Hiromi Sakurai , Yasuhiro Ikeda , Eiji Shidoji , Masako Kawamoto
IPC分类号： B05D5/06
CPC分类号： G02B5/3058 , G02F1/133536 , G02F2001/133548
摘要： Provided is a process for easily producing a wire grid polarizer showing a high polarization separation ability in the visible light region and having an improved transmittance in a short wavelength region.
摘要翻译：本发明提供一种易于制造在可见光区域中具有高极化分离能力并且在短波长区域具有改善的透射率的线栅偏振器的方法。

10. 发明申请

US20120247950A1 MOLD FOR NANOIMPRINTING, ITS PRODUCTION PROCESS, AND PROCESSES FOR PRODUCING MOLDED RESIN HAVING FINE CONCAVO-CONVEX STRUCTURE ON ITS SURFACE AND WIRE-GRID POLARIZER 失效
标题翻译：用于纳米生产的模具及其生产工艺，以及在其表面和丝网偏振器上生产具有微细凹凸结构的模制树脂的工艺
公开(公告)号：US20120247950A1
公开(公告)日：2012-10-04
申请号：US13467010
申请日：2012-05-08
申请人： Yuriko KAIDA , Hiroshi Sakamoto , Takahira Miyagi , Kosuke Takayama , Eiji Shidoji
发明人： Yuriko KAIDA , Hiroshi Sakamoto , Takahira Miyagi , Kosuke Takayama , Eiji Shidoji
IPC分类号： C23C14/34 , B29D11/00 , B29C33/38 , B82Y40/00
CPC分类号： G03F7/0002 , B29C33/424 , B29C33/56 , B82Y10/00 , B82Y40/00
摘要： To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo5 convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity. A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a 10 fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.
摘要翻译：本发明提供一种能够精确地转录低成本，高耐久性的微细凹凸结构的纳米压印用模具及其制造方法，其表面具有细微凹凸结构的成型树脂的制造方法模具的凹凸结构精确转录，并且线栅偏振器具有高生产率。一种用于纳米压印的模具10，其在其模具表面上具有细小的凹凸结构，其包括以恒定间距彼此平行地形成的多个凹槽14，其包括由其表面上具有10微米的树脂制成的模具底座12 作为微细凹凸结构的基底的凹凸结构，覆盖具有模座12的微细凹凸结构的表面的金属氧化物层16和覆盖金属氧化物层的表面的剥离层18 16，被使用。

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