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1. 发明申请

US20070026667A1 Composition for forming etching stopper layer 审中-公开
标题翻译：用于形成蚀刻阻挡层的组合物
公开(公告)号：US20070026667A1
公开(公告)日：2007-02-01
申请号：US10574556
申请日：2004-09-09
申请人： Yuji Tashiro , Hiroyuki Aoki , Tomonori Ishikawa
发明人： Yuji Tashiro , Hiroyuki Aoki , Tomonori Ishikawa
IPC分类号： H01L21/4763
CPC分类号： H01L21/02126 , C08G77/52 , C09D183/14 , H01L21/31116 , H01L21/3121 , H01L21/7681 , H01L21/76829 , H01L21/76835
摘要： An object of the present invention is to provide a composition for formation of etching stopper layer, which can simultaneously realize dry etching selectivity and low permittivity, and a production process of a semiconductor device using the same. This object can be attained by a composition for formation of etching stopper layer, comprising a silicon-containing polymer, the silicon-containing polymer contained in the composition comprising a disilylbenzene structure, and a production process of a semiconductor device comprising forming an etching stopper layer using the composition.
摘要翻译：本发明的目的在于提供一种能够同时实现干蚀刻选择性和低介电常数的蚀刻停止层的形成用组合物及使用其的半导体装置的制造方法。该目的可以通过用于形成蚀刻停止层的组合物来实现，该组合物包括含硅聚合物，包含二甲硅烷基苯结构的组合物中所含的含硅聚合物，以及半导体器件的制造方法，包括形成蚀刻停止层使用组合。

2. 发明申请

US20080102211A1 Polysilazane-Treating Solvent and Method for Treating Polysilazane by Using Such Solvent 审中-公开
标题翻译：聚硅氮烷处理溶剂及使用这种溶剂处理聚硅氮烷的方法
公开(公告)号：US20080102211A1
公开(公告)日：2008-05-01
申请号：US11795100
申请日：2006-02-01
申请人： Hideki Matsuo , Masaaki Ichiyama , Tomonori Ishikawa , Hiroyuki Aoki , Bruce Kiker , Joseph Oberlander
发明人： Hideki Matsuo , Masaaki Ichiyama , Tomonori Ishikawa , Hiroyuki Aoki , Bruce Kiker , Joseph Oberlander
IPC分类号： B05D3/10 , C07C13/20 , C07C13/19 , C07D493/08 , C07C15/02
CPC分类号： H01L21/02087 , C09D7/20 , C09D183/16 , C11D7/24 , C11D7/26 , C11D7/50 , H01L21/02222
摘要： The present invention provides a polysilazane-treating solvent which has excellent dissolving power and stability, has no influence on a substrate as an underlying layer and the properties of a polysilazane, is excellent in shape of cut edge, and further has high safety to the human body. The treating solvent comprises a solvent selected from the group consisting of tetralin, p-menthane, p-cymene, α-pinene, 1,8-cineol, and mixtures thereof, and a polysilazane treatment method using the same. This solvent may further comprise a solvent selected from the group consisting of aliphatic hydrocarbons, alicyclic hydrocarbons, and mixtures thereof.
摘要翻译：本发明提供了具有优异的溶解力和稳定性的聚硅氮烷处理溶剂，对作为下层的基材没有影响，聚硅氮烷的性质，切边的形状优异，对人的安全性更高身体。处理溶剂包括选自四氢化萘，对薄荷烷，对甲基异丙基苯，α-蒎烯，1,8-桉树脑及其混合物的溶剂，以及使用该溶剂的聚硅氮烷处理方法。该溶剂还可以包含选自脂族烃，脂环族烃及其混合物的溶剂。

3. 发明授权

US08501394B2 Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern 有权
标题翻译：超细图形掩模，其制造方法以及使用该掩模形成超细图案的方法
公开(公告)号：US08501394B2
公开(公告)日：2013-08-06
申请号：US12864529
申请日：2009-01-27
申请人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
发明人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
IPC分类号： G03F7/26
CPC分类号： H01L21/0337 , C09D183/14 , C09D183/16 , G03F7/40 , H01L21/0274 , H01L21/0338 , H01L21/31144 , Y10T428/24479
摘要： There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity.The method comprises the steps of forming a first convex pattern, on a film to be treated, forming a spacer formed of a silazane-containing resin composition on the side wall of the convexes constituting the first convex pattern, and forming a superfine pattern using as a mask the spacer or a resin layer disposed around the spacer. The spacer is formed by curing an evenly coated resin composition only in its part around the first convex pattern. According to this method for pattern formation, unlike the conventional method, a superfine pattern can be formed.
摘要翻译：提供了一种形成超细图案的方法，其可以简单地产生具有高质量生产率的超细图案。该方法包括以下步骤：在待处理的膜上形成第一凸起图案，在构成第一凸起图案的凸起的侧壁上形成由含硅氮烷的树脂组合物形成的间隔物，并使用如下方式形成超细图案掩模隔离物或设置在间隔物周围的树脂层。间隔物通过仅在其第一凸起图案周围的部分固化均匀涂覆的树脂组合物而形成。根据这种图案形成方法，与传统方法不同，可以形成超细纹图案。

4. 发明授权

US08121666B2 Image observation apparatus 有权
标题翻译：图像观察装置
公开(公告)号：US08121666B2
公开(公告)日：2012-02-21
申请号：US11190615
申请日：2005-07-27
申请人： Satoshi Otsuka , Takashi Fukaya , Junichi Nozawa , Tomonori Ishikawa
发明人： Satoshi Otsuka , Takashi Fukaya , Junichi Nozawa , Tomonori Ishikawa
IPC分类号： A61B5/05 , F16M1/00 , F16M13/00
CPC分类号： F16M11/28 , A61B90/37 , A61B90/50 , A61B2090/372 , F16M11/10 , F16M11/2014 , F16M11/2021 , F16M11/2092 , F16M11/42 , F16M2200/048 , G02B7/001 , G02B27/0149
摘要： An image observation apparatus comprising an image display unit for displaying an observation image and a supporting mechanism for supporting the image display unit movably and adjustably in the directions of three, substantially perpendicular axes. Since the supporting mechanism of this image observation apparatus can move and adjust the image display unit in three orthogonal axial directions, an operator need not select a plurality of articulates for operating them when he/she wants to move the image display unit to a desired axial direction. Further, one of the three axes can be a rotational axis for turnably supporting the image display unit around the operator. According to this configuration, the image display unit can be independently moved and adjusted in three axial directions, while the observation angle of the observer with respect to the display face of the image display unit is kept constant.
摘要翻译：一种图像观察装置，包括用于显示观察图像的图像显示单元和用于以三个基本上垂直的轴线可移动地和可调节地支撑图像显示单元的支撑机构。由于该图像观察装置的支撑机构能够在三个正交的轴向方向上移动和调整图像显示单元，所以当他/她想要将图像显示单元移动到期望的轴向时，操作者不需要选择多个用于操作它们的关节方向。此外，三个轴中的一个可以是用于可转动地支撑操作者周围的图像显示单元的旋转轴。根据该结构，图像显示单元可以在三个轴向独立地移动和调整，而观察者相对于图像显示单元的显示面的观察角度保持恒定。

5. 发明申请

US20100308015A1 SUPERFINE-PATTERNED MASK, METHOD FOR PRODUCTION THEREOF, AND METHOD EMPLOYING THE SAME FOR FORMING SUPERFINE-PATTERN 有权
标题翻译：超级图案掩模，其生产方法和使用其形成超级图案的方法
公开(公告)号：US20100308015A1
公开(公告)日：2010-12-09
申请号：US12864529
申请日：2009-01-27
申请人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
发明人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
IPC分类号： C23F1/00 , B32B3/30 , B05D3/10
CPC分类号： H01L21/0337 , C09D183/14 , C09D183/16 , G03F7/40 , H01L21/0274 , H01L21/0338 , H01L21/31144 , Y10T428/24479
摘要： There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity.The method comprises the steps of forming a first convex pattern, on a film to be treated, forming a spacer formed of a silazane-containing resin composition on the side wall of the convexes constituting the first convex pattern, and forming a superfine pattern using as a mask the spacer or a resin layer disposed around the spacer. The spacer is formed by curing an evenly coated resin composition only in its part around the first convex pattern. According to this method for pattern formation, unlike the conventional method, a superfine pattern can be formed.
摘要翻译：提供了一种形成超细图案的方法，其可以简单地产生具有高质量生产率的超细图案。该方法包括以下步骤：在待处理的膜上形成第一凸起图案，在构成第一凸起图案的凸起的侧壁上形成由含硅氮烷的树脂组合物形成的间隔物，并使用如下方式形成超细图案掩模隔离物或设置在间隔物周围的树脂层。间隔物通过仅在其第一凸起图案周围的部分固化均匀涂覆的树脂组合物而形成。根据这种图案形成方法，与传统方法不同，可以形成超细纹图案。

6. 发明申请

US20070123055A1 Insulating material 审中-公开
标题翻译：绝缘材料
公开(公告)号：US20070123055A1
公开(公告)日：2007-05-31
申请号：US11605512
申请日：2006-11-28
申请人： Tomonori Ishikawa , Akio Sugiura
发明人： Tomonori Ishikawa , Akio Sugiura
IPC分类号： H01L23/58 , H01L21/31
CPC分类号： H01B3/40 , C08K5/17 , C08K5/19 , C08K9/04
摘要： Disclosed is an insulating material containing an epoxy resin, a curing agent and a nano-filling material having an aspect ratio of not more than 40 at a thickness of not more than 2 nm. The nano-filling material comprises an organized clay dispersed in the epoxy resin. The organized clay is produced from a clay mineral having a layered structure by organically treating the clay mineral with organic secondary, tertiary or quaternary ammonium ions having a nitrogen atom bonded with two, three or four organic modifying groups. The organic modifying group preferably has not more than 30 carbon atoms. At least one modifying group among the organic modifying groups has two or more carbon atoms. The insulating material can exhibit an excellent insulating property without causing substantial loss of the characteristics inherent to the resin.
摘要翻译：公开了一种绝缘材料，其包含厚度不大于2nm的长宽比不大于40的环氧树脂，固化剂和纳米填充材料。纳米填充材料包括分散在环氧树脂中的有机粘土。有机粘土由具有层状结构的粘土矿物制成，通过有机二氧化锆，有机二次，叔或季铵离子的有机处理，其中氮原子与两个，三个或四个有机改性基团结合。有机修饰基团优选具有不超过30个碳原子。有机修饰基中的至少一个修饰基团具有两个或更多个碳原子。绝缘材料可以表现出优异的绝缘性能，而不会引起树脂固有的特性的显着损失。

7. 发明申请

US20070058249A1 Medical stereo observation system 有权
标题翻译：医疗立体观察系统
公开(公告)号：US20070058249A1
公开(公告)日：2007-03-15
申请号：US11517714
申请日：2006-09-08
申请人： Kenji Hirose , Tomonori Ishikawa , Kazuo Morita
发明人： Kenji Hirose , Tomonori Ishikawa , Kazuo Morita
IPC分类号： G02B27/22
CPC分类号： G02B27/2228 , A61B1/00193 , A61B90/20 , G02B21/22 , H04N13/239 , H04N13/30 , H04N13/31 , H04N13/332 , H04N13/344 , H04N13/363
摘要： A medical stereo observation system includes a stereo imaging unit producing a first image for a left eye and a second image for a right eye that mutually have parallax and a stereo display unit capable of displaying stereoscopically the images produced by the stereo imaging unit. The stereo imaging unit has a first imaging optical system producing the first image for the left eye and a second imaging optical system producing the second image for the right eye, and focal positions of these imaging optical systems are located far away from the intersection of optical axes of the imaging optical systems, viewed from the stereo imaging unit. Whereby, a large-depth space can be comfortably observed in a wide range and a viewer can observe an observation object without bringing about a feeling of fatigue.
摘要翻译：医疗立体观察系统包括立体成像单元，其产生用于左眼的第一图像和相互具有视差的右眼第二图像，以及立体显示单元，其能够立体地显示立体成像单元产生的图像。立体成像单元具有产生左眼第一图像的第一成像光学系统和产生右眼第二图像的第二成像光学系统，并且这些成像光学系统的焦点位置远离光学交叉点从立体成像单元观察成像光学系统的轴线。因此，可以在宽范围内舒适地观察到大深度的空间，并且观察者可以观察观察对象而不产生疲劳感。

8. 发明授权

US5748366A Surgical microscope 失效
标题翻译：手术显微镜
公开(公告)号：US5748366A
公开(公告)日：1998-05-05
申请号：US578386
申请日：1995-12-26
申请人： Koji Yasunaga , Hiroshi Fujiwara , Masami Hamada , Takashi Fukaya , Masahiko Kinukawa , Tomonori Ishikawa , Masanori Kaneda , Takeshi Okada
发明人： Koji Yasunaga , Hiroshi Fujiwara , Masami Hamada , Takashi Fukaya , Masahiko Kinukawa , Tomonori Ishikawa , Masanori Kaneda , Takeshi Okada
IPC分类号： A61B19/00 , G02B21/00 , G02B21/06 , G02B21/26 , G02B21/36
CPC分类号： G02B21/0012 , A61B90/20
摘要： To provide a surgical microscope comprising a microscope collimator for enabling the operator to easily recognize the swivel center of the microscope body regardless of what position the microscope body moves for easy setting of the swivel center point of the microscope body, a surgical microscope pivotally supporting a microscope body having, an observation optical system with one point on an observation optical axis of the microscope body as the swivel center. The surgical microscope comprises index projectors as swivel center visible indicators being capable of recognizing the swivel center. This configuration enables the operator to easily recognize the swivel center of the microscope body for easy setting of the swivel center point of the microscope body. Also, to provide a surgical microscope which does not disturb an operator who handles the microscope or performs an operation and also enables the operator to easily observe at every angle from every direction for improving operability, the surgical microscope is capable of changing an observation angle and an observation direction with a gaze point P on an observation optical axis a of a microscope body having an observation optical system as a rotation center. A base unit that can be moved in X, Y, and Z directions is disposed at a position relative to the microscope body and a swivel base rotatable with the gaze point P as a rotation center is installed above the base unit.
摘要翻译：为了提供一种包括显微镜准直器的手术显微镜，用于使操作者能够容易地识别显微镜主体的旋转中心，而不管显微镜主体移动什么位置以便容易地设置显微镜体的旋转中心点，手术显微镜可枢转地支撑显微镜本体具有作为旋转中心的在显微镜主体的观察光轴上具有一个点的观察光学系统。手术显微镜包括索引投影仪，作为能够识别旋转中心的旋转中心可见指示器。这种结构使得操作者能够容易地识别显微镜主体的旋转中心，以便容易地设置显微镜主体的旋转中心点。此外，为了提供不干扰处理显微镜或进行操作的操作者的外科手术显微镜，并且还使得操作者能够从各个方向容易地观察每个方向以改善可操作性，因此手术显微镜能够改变观察角度在具有观察光学系统作为旋转中心的显微镜主体的观察光轴a上具有注视点P的观察方向。可以在X，Y和Z方向上移动的基座设置在相对于显微镜主体的位置，并且以基准单元的上方作为旋转中心的目视点P可旋转的旋转基座。

9. 发明授权

US5118637A Method of fabricating HEMT device with selective etching of gallium arsenide antimonide 失效
标题翻译：用选择性消除阿魏酸钠抗体制备HEMT装置的方法
公开(公告)号：US5118637A
公开(公告)日：1992-06-02
申请号：US643375
申请日：1991-01-22
申请人： Tomonori Ishikawa
发明人： Tomonori Ishikawa
IPC分类号： H01L29/812 , H01L21/306 , H01L21/335 , H01L21/338 , H01L21/8252 , H01L29/205 , H01L29/778
CPC分类号： H01L29/66462 , H01L21/30621 , H01L21/8252 , H01L29/205 , H01L29/7783
摘要： A semiconductor device having a heterojunction and utilizing a two-dimensional electron gas formed at said the heterojunction comprises a substrate of a semi-insulating material, a first semiconductor layer of undoped indium gallium arsenide formed on the substrate, a second semiconductor layer of n-type indium aluminium arsenide formed on the first semiconductor layer and defining the heterojunction between the first semiconductor layer and the second semiconductor layer, the second semiconductor layer including an exposed region defining an exposed top surface, a third semiconductor layer of n-type gallium arsenide antimonide formed on the second semiconductor layer and having a window defined therein so as to expose the top surface of the exposed top surface region, a gate electrode formed in self-alignment with the window and in contact with the exposed top surface region of the second semiconductor layer, and ohmic electrodes formed on the cap layer in ohmic contact therewith.

10. 发明授权

US4871245A Surgical microscope 失效
标题翻译：手术显微镜
公开(公告)号：US4871245A
公开(公告)日：1989-10-03
申请号：US112440
申请日：1987-10-26
申请人： Tomonori Ishikawa , Takashi Fukaya , Toshiyuki Tsunoda , Hiroshi Fujiwara
发明人： Tomonori Ishikawa , Takashi Fukaya , Toshiyuki Tsunoda , Hiroshi Fujiwara
IPC分类号： A61B19/00 , G02B21/08 , G02B21/12 , G02B21/36
CPC分类号： G02B21/082 , G02B21/12 , G02B21/361
摘要： A surgical microscope arranging, so as to be insertable into and removable from an illuminating optical path for observation, a semi-transparent mirror capable of introducing illuminating light for photographing in a coaxial relation into illuminating light for observation or a totally reflecting mirror having such size as not to entirely interrupt the illuminating light for observation, in order to make it possible that compact size and low cost are attained, the amounts of illuminating light for observation and photographing are sufficiently secured, both the illuminating light are conducted along a common optical axis, and the illuminating light for observation is not interrupted even for a moment in photographing.
摘要翻译：一种手术显微镜布置成可插入到用于观察的照明光路中并且可以从照明光路中移除的半透明镜，能够将用于以同轴关系拍摄的照明光引入用于观察的照明光或具有这种尺寸的全反射镜为了不完全中断观察用的照明光，为了使得可以实现小型化和低成本，用于观察和拍摄的照明光的量被充分确保，照明光都沿共同的光轴并且用于观察的照明光即使在摄影时刻也不会中断。

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