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    • 2. 发明申请
    • Substrate Cleaning System, Substrate Cleaning Method, Subtrate Cleaning Program, and Program Recording Medium
    • 基板清洁系统,基板清洁方法,分切清洁程序和程序记录介质
    • US20090260655A1
    • 2009-10-22
    • US11992164
    • 2006-09-20
    • Yuji Takimoto
    • Yuji Takimoto
    • B08B7/04
    • H01L21/67046B08B1/04B08B3/00G02F1/1303G02F2001/1316H01L21/6704H01L21/67051H01L21/67253
    • A substrate cleaning system according to the present invention comprises cleaning devices, and a controller for controlling the driving of the cleaning devices in accordance with driving recipes predetermined. The controller prioritizes the cleaning devices, calculates, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, a time in which the two cleaning devices can interfere with each other, and sets the calculated time as a waiting time. The cleaning device having the higher priority is made to start cleaning a substrate from a predetermined cleaning-starting position, while the cleaning device having the lower priority is kept waiting in a predetermined waiting position. When or after the waiting time has elapsed since the cleaning device having the higher priority started cleaning, the cleaning device having the lower priority is made to move from the waiting position and start cleaning the substrate.
    • 根据本发明的基板清洁系统包括清洁装置和用于根据预定的驱动配方控制清洁装置的驱动的控制器。 控制器根据具有较高优先级的清洁装置的驱动配方和具有较低优先级的清洁装置的驱动方式,两个清洁装置可能相互干扰的时间,基于清洁装置的优先级来计算 ,并将计算出的时间设置为等待时间。 具有较高优先级的清洁装置用于从预定的清洁开始位置开始清洁基板,同时具有较低优先级的清洁装置在预定的等待位置中保持等待。 当从优先级高的清洁装置开始清洗之后经过等待时间或之后,将优先权较低的清洁装置从等待位置移动并开始清洁基板。
    • 5. 发明授权
    • Substrate cleaning system, substrate cleaning method, subtrate cleaning program, and program recording medium
    • 基板清洁系统,基板清洗方法,减渣清洗程序和程序记录介质
    • US08043436B2
    • 2011-10-25
    • US11992164
    • 2006-09-20
    • Yuji Takimoto
    • Yuji Takimoto
    • B08B7/04
    • H01L21/67046B08B1/04B08B3/00G02F1/1303G02F2001/1316H01L21/6704H01L21/67051H01L21/67253
    • A substrate cleaning system according to the present invention comprises cleaning devices, and a controller for controlling the driving of the cleaning devices in accordance with driving recipes predetermined. The controller prioritizes the cleaning devices, calculates, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, a time in which the two cleaning devices can interfere with each other, and sets the calculated time as a waiting time. The cleaning device having the higher priority is made to start cleaning a substrate from a predetermined cleaning-starting position, while the cleaning device having the lower priority is kept waiting in a predetermined waiting position. When or after the waiting time has elapsed since the cleaning device having the higher priority started cleaning, the cleaning device having the lower priority is made to move from the waiting position and start cleaning the substrate.
    • 根据本发明的基板清洁系统包括清洁装置和用于根据预定的驱动配方控制清洁装置的驱动的控制器。 控制器根据具有较高优先级的清洁装置的驱动配方和具有较低优先级的清洁装置的驱动方式,两个清洁装置可能相互干扰的时间,基于清洁装置的优先级来计算 ,并将计算出的时间设置为等待时间。 具有较高优先级的清洁装置用于从预定的清洁开始位置开始清洁基板,同时具有较低优先级的清洁装置在预定的等待位置中保持等待。 当从优先级高的清洁装置开始清洗之后经过等待时间或之后,将优先权较低的清洁装置从等待位置移动并开始清洁基板。
    • 7. 发明授权
    • Mechanical seal member
    • 机械密封件
    • US06716528B1
    • 2004-04-06
    • US09786347
    • 2001-03-29
    • Takashi MatsumotoToshiomi FukudaShin-ichi OzakiYuji Takimoto
    • Takashi MatsumotoToshiomi FukudaShin-ichi OzakiYuji Takimoto
    • B32B900
    • F16J15/3496C04B41/009C04B41/5059Y10T428/30C04B41/4539C04B41/4556C04B41/5096C04B35/52
    • A mechanical seal member formed by applying slurry, in which boron carbide powder and silicon powder are mixed and dispersed onto the entire surface of a carbon material having an average pore radius of at least 1.0 &mgr;m and formed into a hollow tubular or cylindrical product shape and firing the resultant product to form a carbon-silicon carbide composite material extending from the entire surface toward the interior of the product shape and a thin coating, 3 to 30 &mgr;m thick, consisting mainly of silicon carbide and boron carbide and spread on the surface of the composite material. The carbon-silicon carbide composite material is formed uniformly from the surface to the center, because the member is small in size with a section, parallel to the center axis, of up to 7×7 mm. A siliconization ratio on the surface of the composite material is 30 to 55% in area ratio. A carbon base material density is at least 1.7 g/cm3 and after siliconization 2.0 to 2.5 g/cm3. A mechanical seal member may be produced by impregnating metal or resin into pores of this carbon-silicon composite material.
    • 一种机械密封构件,其通过将碳化硼粉末和硅粉末混合并分散在平均孔半径为至少1.0μm的碳材料的整个表面上并形成为中空的管状或圆柱形产品形状并且 焙烧所得产物以形成从产品形状的整个表面向内部延伸的碳 - 碳化硅复合材料,以及主要由碳化硅和碳化硼组成的3至30μm厚的薄涂层,并在 复合材料。 碳 - 碳化硅复合材料由表面到中心均匀地形成,因为该部件的尺寸小,平行于中心轴线的截面为7×7mm。 复合材料表面的硅化率为面积比为30〜55%。 碳基材料密度为至少1.7g / cm 3,硅化后为2.0〜2.5g / cm 3。 可以通过将金属或树脂浸渍到该碳 - 硅复合材料的孔中来制造机械密封构件。