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    • 3. 发明授权
    • Method of texturing surface of substrate for recording medium
    • 用于记录介质的基材表面纹理化方法
    • US06468600B1
    • 2002-10-22
    • US10067013
    • 2002-02-04
    • Susumu YoshidaYuichiro ItaiYoshiharu KasamatsuToshiro Takahashi
    • Susumu YoshidaYuichiro ItaiYoshiharu KasamatsuToshiro Takahashi
    • B05D306
    • G11B5/8404
    • A method of texturing includes the process of enhancing the hydrophilicity on the surface of a substrate for a recording medium. A texture is then formed on the surface of the substrate with an aqueous slurry in which abrasive grains are dispersed. The surface of the substrate is expected to exhibit an enhanced property of wetness to the aqueous slurry. The aqueous slurry easily spreads over and contacts the surface of the substrate even from the initial stage of the process. The abrasive grains in the aqueous slurry are allowed to uniformly spread over the surface of the substrate. Establishment of the texture can be started on the surface of the substrate at an earlier stage of the process. Even with the abrasive grains of a smaller grain size, a fine and uniform texture of a predetermined surface roughness can be established on the surface of the substrate within a shortened period. Increase in the operating period of abrasion can remarkably be suppressed irrespective of the reduced size of the abrasive grains.
    • 纹理化方法包括提高用于记录介质的基材表面上的亲水性的方法。 然后在其中分散磨料颗粒的水性浆料在基材的表面上形成织构。 预期基材的表面具有增强的水性浆液的润湿性能。 即使从工艺的初始阶段,含水浆料也容易扩散并接触基材的表面。 允许含水浆料中的磨料颗粒均匀地铺展在基材的表面上。 可以在该方法的较早阶段在衬底的表面上开始纹理的建立。 即使具有较小晶粒尺寸的磨粒,可以在缩短的时间内在衬底的表面上形成预定表面粗糙度的精细且均匀的织构。 无论磨粒的尺寸减小,磨损操作周期的增加都可以被显着抑制。