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    • 3. 发明申请
    • PIEZOELECTRIC DEVICES INCLUDING FREQUENCY-ADJUSTMENT UNITS
    • 压电设备,包括频率调整单元
    • US20110291524A1
    • 2011-12-01
    • US13117495
    • 2011-05-27
    • Yuichi KawaseToshiaki Motegi
    • Yuichi KawaseToshiaki Motegi
    • H01L41/053
    • H03H9/21H03H9/0595H03H9/1021H03H9/1035H03H2003/0428H03H2003/0492
    • Piezoelectric devices are disclosed that allow outside-in adjustment of vibration frequency produced by the devices. I.e., the vibration frequency can be increased or reduced. An exemplary piezoelectric device includes a tuning-fork type piezoelectric vibrating piece mounted inside a package. The vibrating piece has a base fabricated of a piezoelectric material, a pair of vibrating arms extending parallel from the base in a predetermined direction, and a frequency-adjustment unit situated on the distal ends of the vibrating arms. The package includes first metal films disposed on the inner main surface of the package at a location where a beam from an external laser can be irradiated. The frequency adjustment unit includes a transparent region that extends in a predetermined direction for allowing the laser beam, passing through the lid of the package, to be incident on second metal films by passing through the transparent regions. The laser beam also can be incident on first metal films without also being incident on the second metal films, by passing through the lid but not through the transparent regions.
    • 公开了允许外部调节由器件产生的振动频率的压电器件。 即,可以增加或减少振动频率。 示例性的压电装置包括安装在封装内的音叉式压电振动片。 振动片具有由压电材料制成的基座,一对沿预定方向从基座平行延伸的振动臂以及位于振动臂的远端上的频率调节单元。 该封装包括在外部激光束可以被照射的位置处设置在封装的内部主表面上的第一金属膜。 频率调整单元包括沿预定方向延伸的透明区域,以允许穿过封装的盖子的激光束通过透明区域入射到第二金属膜上。 激光束也可以入射到第一金属膜上,而不会入射到第二金属膜上,通过盖而不通过透明区域。
    • 4. 发明授权
    • Piezoelectric devices including frequency-adjustment units
    • 压电器件包括频率调节单元
    • US08604677B2
    • 2013-12-10
    • US13117495
    • 2011-05-27
    • Yuichi KawaseToshiaki Motegi
    • Yuichi KawaseToshiaki Motegi
    • H03H9/21
    • H03H9/21H03H9/0595H03H9/1021H03H9/1035H03H2003/0428H03H2003/0492
    • The piezoelectric devices allow outside-in adjustment of their vibration frequency. An exemplary piezoelectric device includes a tuning-fork type piezoelectric vibrating piece mounted inside a package. The vibrating piece has a base fabricated of a piezoelectric material, a pair of vibrating arms extending parallel from the base in a predetermined direction, and a frequency-adjustment unit situated on the distal ends of the vibrating arms. The package includes first metal films on the inner main surface thereof where an external laser beam can be irradiated. The frequency-adjustment unit includes a transparent region extending in a predetermined direction, allowing the laser beam, passing through the lid of the package, to be incident on second metal films by passing through the transparent regions. The laser beam also can be incident on first metal films without also being incident on the second metal films, by passing through the lid but not through the transparent regions.
    • 压电器件允许外部调整其振动频率。 示例性的压电装置包括安装在封装内的音叉式压电振动片。 振动片具有由压电材料制成的基座,一对沿预定方向从基座平行延伸的振动臂以及位于振动臂的远端上的频率调节单元。 该封装在其主表面上包括可以照射外部激光束的第一金属膜。 频率调整单元包括沿预定方向延伸的透明区域,允许穿过封装的盖子的激光束通过透明区域入射到第二金属膜上。 激光束也可以入射到第一金属膜上,而不会入射到第二金属膜上,通过盖而不通过透明区域。
    • 5. 发明申请
    • Charged-Particle Beam Lithographic Apparatus and Lithographic Method Therefor
    • 带电粒子光刻机及其平版印刷方法
    • US20120061593A1
    • 2012-03-15
    • US13229986
    • 2011-09-12
    • Yuichi Kawase
    • Yuichi Kawase
    • G21K5/10
    • H01J37/3174B82Y10/00B82Y40/00
    • A charged-particle beam lithographic method is implemented by irradiating resist applied on a material surface with successive shots of a variably shaped charged-particle beam. A table is drawn up which indicates the relations of the distances of each shot of interest to adjacent shots to corresponding amounts of correction applied to sides of the shot of interest taking account of the influence of forward scattering. Corrective shot data is found from the table by translating the sides of the shot of interest located opposite to the adjacent shots. Corrective values for a proximity effect produced under the influence of backward scattering are calculated based on the corrective shot data. The shots of the beam are carried out based on the corrective shot data and on the corrective values.
    • 带电粒子光刻法通过用可变形的带电粒子束的连续射击照射施加在材料表面上的抗蚀剂来实现。 考虑到前向散射的影响,绘制了表格,其中表示每个感兴趣的照片的距离与相邻镜头的距离与应用于感兴趣镜头的两侧的相应的修正量的关系。 通过翻译与相邻镜头相对的感兴趣的镜头的侧面,从表中找到纠正镜头数据。 基于校正拍摄数据计算在后向散射影响下产生的邻近效应的校正值。 光束的拍摄是根据校正拍摄数据和校正值进行的。
    • 6. 发明申请
    • Method and System for Charged-Particle Beam Lithography
    • 带电粒子光刻法的方法与系统
    • US20090032739A1
    • 2009-02-05
    • US12182471
    • 2008-07-30
    • Yuichi Kawase
    • Yuichi Kawase
    • G21K5/10
    • H01J37/3174B82Y10/00B82Y40/00
    • Charged-particle beam lithography method and system. The lithography system has a map creation unit and a lithographic data creation unit. The map creation unit creates a proximity effect correction amount map from pattern data supplied from a pattern data file, pattern layout information, a foggy error correction amount map, loading effect correction amount maps, a process error correction amount map, a transfer error correction amount map, proximity effect correction parameters, and a proximity effect correction map. The lithographic data creation unit creates lithographic data based on the pattern data from the pattern data file, creates shot time data based on the proximity effect correction amount map from the map creation unit, and attaches the created shot time data to the lithographic data.
    • 带电粒子光刻法及系统。 光刻系统具有地图创建单元和光刻数据创建单元。 地图创建单元从图案数据文件,图案布局信息,雾化纠错量图,加载效果校正量图,处理误差校正量图,传送误差校正量 地图,邻近效应校正参数和邻近效应校正图。 光刻数据生成单元根据来自图案数据文件的图案数据,生成基于来自地图制作单元的邻近效果校正量图的拍摄时间数据的平版印刷数据,并将生成的拍摄时间数据附加到光刻数据。
    • 7. 发明授权
    • Method of pattern delineation
    • 图案划分方法
    • US07820362B2
    • 2010-10-26
    • US12030625
    • 2008-02-13
    • Yuichi Kawase
    • Yuichi Kawase
    • G03C5/00G03F9/00
    • H01J37/3174B82Y10/00B82Y40/00Y10S430/143
    • A method of delineating a lithographic pattern on a material. A pattern to be delineated is divided according to first and second fields by first and second methods of division. Pattern segments contained in the first fields are divided in the X-direction, and data about the resulting pattern subsegments is obtained. Pattern segments contained in the second fields are divided in the Y-direction, and data about the resulting pattern subsegments is obtained. The two methods are so carried out that a pattern segment located across a field boundary during implementation of one of the two methods of division is located around the center of a field during implementation of the other method. In each field, the pattern segments obtained by the X division and Y division, respectively, are overlapped and written with a half of the dose normally used.
    • 描绘材料上的平版印刷图案的方法。 通过第一和第二种划分方法,根据第一和第二场划分描绘的图案。 包含在第一场中的模式段在X方向上被划分,并且获得关于所得到的模式子段的数据。 包含在第二场中的图案段在Y方向上被划分,并且获得关于所得到的图案子段的数据。 这两种方法被实施为在实现两种划分方法之一期间位于场边界之间的模式段在实现另一方法期间位于场的中心周围。 在每个场中,通过X分割和Y分割获得的图案片段分别与正常使用的剂量的一半重叠和写入。
    • 8. 发明申请
    • Method of Pattern Delineation
    • 模式划分方法
    • US20080193881A1
    • 2008-08-14
    • US12030625
    • 2008-02-13
    • Yuichi Kawase
    • Yuichi Kawase
    • G03F7/20
    • H01J37/3174B82Y10/00B82Y40/00Y10S430/143
    • A method of delineating a lithographic pattern on a material. A pattern to be delineated is divided according to first and second fields by first and second methods of division. Pattern segments contained in the first fields are divided in the X-direction, and data about the resulting pattern subsegments is obtained. Pattern segments contained in the second fields are divided in the Y-direction, and data about the resulting pattern subsegments is obtained. The two methods are so carried out that a pattern segment located across a field boundary during implementation of one of the two methods of division is located around the center of a field during implementation of the other method. In each field, the pattern segments obtained by the X division and Y division, respectively, are overlapped and written with a half of the dose normally used.
    • 描绘材料上的平版印刷图案的方法。 通过第一和第二种划分方法,根据第一和第二场划分描绘的图案。 包含在第一场中的模式段在X方向上被划分,并且获得关于所得到的模式子段的数据。 包含在第二场中的图案段在Y方向上被划分,并且获得关于所得到的图案子段的数据。 这两种方法被实施为在实现两种划分方法之一期间位于场边界之间的模式段在实现另一方法期间位于场的中心周围。 在每个场中,通过X分割和Y分割获得的图案片段分别与正常使用的剂量的一半重叠和写入。